知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

121 条记录 (耗时 0.018 秒)

    Process for atmospheric pressure glow discharge treatment of a photographic support
    3.
    发明授权
    Process for atmospheric pressure glow discharge treatment of a photographic support 失效
    大气压辉光放电处理摄影支架的过程

    公开(公告)号：US06270632B1

    公开(公告)日：2001-08-07

    申请号：US09416227

    申请日：1999-10-12

    申请人： Hindrik Willem de Vries

    发明人： Hindrik Willem de Vries

    IPC分类号： B01J1908

    CPC分类号： G03C1/915 ,  B05D3/142

    摘要： The invention is directed to a process for treating a photographic support in the form of a web, said process comprising providing a first grounded drum shaped electrically conductive electrode and at least one electrically conductive wire electrode of which the diameter varies between 60 and 1500 &mgr;m facing said drum shaped electrode, establishing an AC voltage with a frequency range between 100 Hz to 300 kHz over said electrodes, moving the web at atmospheric pressure along said drum shaped electrode, thereby exposing it to atmospheric pressure glow discharge established between the said drum shaped and wire electrode.

    摘要翻译： 本发明涉及一种用于处理幅材形式的照相支撑体的方法，所述方法包括提供第一接地鼓形导电电极和至少一个导电线电极，其直径在60和1500μm之间变化，面对 所述鼓形电极，在所述电极上建立频率范围为100Hz至300kHz之间的交流电压，沿着所述鼓形电极在大气压下移动幅材，从而将其暴露于所述鼓形和 线电极。

    Apparatus for coating semiconductive material
    8.
    发明授权
    Apparatus for coating semiconductive material 失效
    半导体材料涂层设备

    公开(公告)号：US4489672A

    公开(公告)日：1984-12-25

    申请号：US222333

    申请日：1981-01-05

    申请人： Semyon Kisler

    发明人： Semyon Kisler

    IPC分类号： B05C5/02 ,  B05C9/08 ,  B05C11/02 ,  B05D1/00 ,  B05D1/26 ,  B05D3/12 ,  B05D3/14 ,  G03C1/74 ,  H01L21/56 ,  B05B5/02 ,  B05C5/00

    CPC分类号： G03C1/74 ,  B05D3/14 ,  G03C1/915

    摘要： Excessive heat-generating current levels produced in semiconductive materials by electrostatically assisted coating apparatus employed to, for example, improve the uniformity of a coating applied to such materials are avoided by passing an auxiliary current through said semiconductive materials in the same region and in a direction opposite to that of the current produced by said electrostatically assisted coating apparatus such that the difference between the said current produced by said electrostatically assisted coating apparatus and the said auxiliary current is less than or equal to a predetermined value.

    摘要翻译： 通过静电辅助涂覆设备在半导体材料中产生的过多的发热电流水平，例如通过使辅助电流通过相同区域和方向上的所述半导体材料来避免，例如提高施加到这些材料上的涂层的均匀性 与由所述静电辅助涂覆设备产生的电流相反，使得由所述静电辅助涂覆设备产生的所述电流与所述辅助电流之间的差小于或等于预定值。

    Treating polymeric surfaces
    9.
    发明授权
    Treating polymeric surfaces 失效
    处理聚合物表面

    公开(公告)号：US4072769A

    公开(公告)日：1978-02-07

    申请号：US313029

    申请日：1972-12-07

    申请人： Darrel D. Lidel

    发明人： Darrel D. Lidel

    IPC分类号： B05D3/10 ,  B05D5/08 ,  B29C59/14 ,  G03C1/91 ,  B44D1/04 ,  G03C1/74

    CPC分类号： C08J7/123 ,  B29C59/14 ,  G03C1/915

    摘要： The surface characteristics of polymeric materials are altered by exposure to a reactive gas which has been activated by radio frequency electromagnetic radiations prior to being directed onto the surface. The reactive gas is selected from either the gases which occur naturally with 3-electron bonds, (e.g., NO, NO.sub.2, etc,) or from other gases capable of decomposition in the presence of an electromagnetic field to form (1) activated species which attack the polymer surface to break carbon-hydrogen bonds, forming free radical sites, and (2) free radicals which react with these sites. The process can also be practiced using separate activator and reactive gases, and when the reactive gas selected comprises organic material, the gas stream used to treat the polymeric surface is supplemented by an activator gas comprising the noble gases and nitrogen. The process can be used to change polymeric surface wettability to water or oil, to render polymer films capable of being coated directly with gelatin-containing photosensitive layers with resultant satisfactory adhesion characteristics, etc.