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    VANADIUM OXIDE FILM AND PROCESS FOR PRODUCING SAME
    5.
    发明申请
    VANADIUM OXIDE FILM AND PROCESS FOR PRODUCING SAME 审中-公开

    公开(公告)号：US20170313595A1

    公开(公告)日：2017-11-02

    申请号：US15520339

    申请日：2015-10-26

    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

    Inventor： Tetsuo TSUCHIYA ,  Haruo ISHIZAKI ,  Tomohiko NAKAJIMA ,  Kentaro SHINODA

    IPC: C01G31/02 ,  G01J5/00

    CPC classification number: C01G31/02 ,  C01G31/00 ,  C01G49/00 ,  C01G53/00 ,  G01J5/0003 ,  H01L21/02565 ,  H01L21/02581 ,  H01L21/02628

    Abstract: Provided is a vanadium oxide film which shows substantially no hysteresis of resistivity changes due to temperature rising/falling, has a low resistivity at room temperature, has a large absolute value of the temperature coefficient of resistance, and shows semiconductor-like resistance changes in a wide temperature range. In the vanadium oxide film, a portion of the vanadium has been replaced by aluminum and copper, and the amount of substance of aluminum is 10 mol % based on the sum total of the amount of substance of vanadium, the amount of substance of aluminum, and the amount of substance of copper. This vanadium oxide film has a low resistivity, has a large absolute value of the temperature coefficient of resistance, and shows substantially no hysteresis of resistivity changes due to temperature rising/falling. This vanadium oxide film is produced by applying a mixture solution containing a vanadium organic compound, an aluminum organic compound, and a copper organic compound to a substrate, calcining the substrate at a temperature lower than the temperature at which the substrate decomposes, and irradiating the surface of the substrate onto which the mixture solution has been applied with ultraviolet light.

    Method for removal of metal ions from rice hull
    8.
    发明授权
    Method for removal of metal ions from rice hull 有权
    从稻壳中去除金属离子的方法

    公开(公告)号：US09560867B2

    公开(公告)日：2017-02-07

    申请号：US14477833

    申请日：2014-09-04

    Applicant: Sunshine Kaidi New Energy Group Co., Ltd.

    Inventor： Yilong Chen ,  Yanfeng Zhang ,  Leiming Tao ,  Wenxue Luo ,  Zhilong Wang ,  Zhixiang Luo ,  Yongjie Xue

    IPC: A23L1/00 ,  A23L1/10 ,  C01G49/00 ,  B09B3/00 ,  B09B5/00

    CPC classification number: A23L5/276 ,  A23L5/23 ,  A23L7/115 ,  A23V2002/00 ,  B09B3/00 ,  B09B5/00 ,  C01G49/00

    Abstract: A method for removal of metal ions from rice hulls. The method includes: 1) providing a water storage reactor, and disposing a gas dispersion device at the bottom of the water storage reactor; 2) bagging rice hulls, placing it in the water storage reactor, and pressing down on the bagged rice hulls to be lower than a water surface in the water storage reactor; 3) spraying industrial flue gas into the water storage reactor; controlling the amount of the industrial flue gas such that about 1 g of carbon dioxide is dissolved per 100 g of water, thus generating a carbonic acid solution; 4) allowing the carbonic acid solution to react with metal ions in the rice hulls to yield a precipitate; and 5) washing the rice hulls collected in step 4), washing again with desalinated water, and then squeezing the rice hulls.

    Abstract translation: 从稻壳中去除金属离子的方法。 该方法包括：1）提供储水反应器，并在储水反应堆底部设置气体分散装置; 2）装载米壳，将其放置在储水反应堆中，并将袋装的稻壳按压低于储水反应堆的水面; 3）将工业废气喷入储水反应堆; 控制工业烟气的量，使得每100g水溶解约1g二氧化碳，从而产生碳酸溶液; 4）允许碳酸溶液与稻壳中的金属离子反应产生沉淀物; 和5）洗涤步骤4）中收集的米壳，再次用淡化水洗涤，然后挤压稻壳。

    Method for forming metal fluoride material
    10.
    发明授权
    Method for forming metal fluoride material 有权
    形成金属氟化物材料的方法

    公开(公告)号：US09446966B2

    公开(公告)日：2016-09-20

    申请号：US14221957

    申请日：2014-03-21

    Applicant: QuantumScape Corporation

    Inventor： Jon Shan

    IPC: H01B1/06 ,  C01G49/10 ,  H01M4/58 ,  C01G29/00 ,  C01G37/04 ,  C01G45/06 ,  C01G49/00 ,  C01G53/08 ,  C01B9/08 ,  C01G3/04

    CPC classification number: C01G49/10 ,  C01B9/08 ,  C01G3/04 ,  C01G29/00 ,  C01G37/04 ,  C01G45/06 ,  C01G49/00 ,  C01G53/08 ,  C01P2002/54 ,  C01P2002/72 ,  H01M4/582

    Abstract: The present invention is directed to processing techniques and systems of metal fluoride based material, including but not limited to nickel difluoride, copper difluoride, manganese fluoride, chromium fluoride, bismuth fluoride, iron trifluoride, iron difluoride, iron oxyfluoride, metal doped iron fluorides, e.g., FexM1-xFy (M=metals, which can be Co, Ni, Cu, Cr, Mn, Bi and Ti) materials. An exemplary implementation involves mixing a first compound comprising a metal material, nitrogen, and oxygen to a second compound comprising hydrogen fluoride. The mixed compound is milled to form metal fluoride precursor and a certain byproduct. The byproduct is removed, and the metal fluoride precursor is treated to form iron trifluoride product. There are other embodiments as well.

    Abstract translation: 本发明涉及金属氟化物基材料的处理技术和系统，包括但不限于二氟化镍，二氟化铜，氟化锰，氟化铬，氟化铋，三氟化铁，二氟化铁，氟氧化铁，金属掺杂的氟化铁， 例如FexM1-xFy（M =金属，可以是Co，Ni，Cu，Cr，Mn，Bi和Ti）材料。 示例性实施方案包括将包含金属材料，氮和氧的第一化合物混合到包含氟化氢的第二化合物中。 将混合的化合物研磨以形成金属氟化物前体和某种副产物。 除去副产物，并处理金属氟化物前体以形成三氟化铁产物。 还有其它实施例。

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