Flexible MEMS thin film without manufactured substrate and process for producing the same
    2.
    发明授权
    Flexible MEMS thin film without manufactured substrate and process for producing the same 失效
    柔性MEMS薄膜无制造底材及其制造方法

    公开(公告)号:US07445956B2

    公开(公告)日:2008-11-04

    申请号:US11287427

    申请日:2005-11-28

    Applicant: Wen-Chang Dong

    Inventor: Wen-Chang Dong

    Abstract: A process for producing flexible MEMS thin film without a manufactured substrate applied in a MEMS manufacture specially includes a method of forming a component interface in the middle between a manufactured substrate and a MEMS thin film formed on the manufactured substrate as a basis, which component interface is so easily destroyed by an external force that the MEMS thin film produced by the mentioned process is easily separated from the manufactured substrate, and the separated MEMS thin film due to out of limitation from the manufactured substrate may be further processed in later working process to obtain a MEMS thin film with special structural features has flexibility and particularly has electrical circuits, micro structure, or MEMS components integrated and manufactured into inside or on its both sides.

    Abstract translation: 用于生产柔性MEMS薄膜的方法,其中没有制造衬底应用于MEMS制造中,特别地包括在所制造的衬底和形成在所制造的衬底上的MEMS薄膜之间的中间形成部件界面的方法, 通过外力容易地破坏由所述工艺制造的MEMS薄膜容易与制造的基板分离,并且由制造的基板不受限制地分离的MEMS薄膜可以在后续工作过程中被进一步处理 获得具有特殊结构特征的MEMS薄膜具有柔性,并且特别地具有集成并制造在其内部或两侧的电路,微结构或MEMS部件。

    Process for fabrication of a micromechanical and/or nanomechanical structure comprising a porous surface
    4.
    发明授权
    Process for fabrication of a micromechanical and/or nanomechanical structure comprising a porous surface 有权
    包括多孔表面的微机械和/或纳米机械结构的制造方法

    公开(公告)号:US09527729B2

    公开(公告)日:2016-12-27

    申请号:US14182659

    申请日:2014-02-18

    Inventor: Eric Ollier

    Abstract: Process for fabrication of a micromechanical and/or nanomechanical structure comprising the following steps, starting from an element comprising a support substrate and a sacrificial layer: a) formation of a first layer, at least part of which is porous, b) formation on the first layer of a layer made of one (or several) materials providing the mechanical properties of the structure, called the intermediate layer, c) formation on the intermediate layer of a second layer, at least part of which is porous, d) formation of said structure in the stack composed of the first layer, the intermediate layer and the second layer, e) release of said structure by at least partial removal of the sacrificial layer.

    Abstract translation: 该方法包括形成第一层即硅层(6),其部分是多孔的,并且在第一层上形成层间(16)以确保结构的机械性能。 第二层形成在层间,其中第二层的一部分是多孔的。 该结构形成在第一层,层间和第二层的堆叠中,其中第一和第二层由多孔硅锗制成,并且层间由非多孔硅锗制成。 通过牺牲层(4)的部分抽出来释放结构。

    PROCESS FOR FABRICATION OF A MICROMECHANICAL AND/OR NANOMECHANICAL STRUCTURE COMPRISING A POROUS SURFACE
    5.
    发明申请
    PROCESS FOR FABRICATION OF A MICROMECHANICAL AND/OR NANOMECHANICAL STRUCTURE COMPRISING A POROUS SURFACE 有权
    制造包含多孔表面的微机械和/或纳米结构的方法

    公开(公告)号:US20150274516A1

    公开(公告)日:2015-10-01

    申请号:US14182659

    申请日:2014-02-18

    Inventor: Eric OLLIER

    Abstract: Process for fabrication of a micromechanical and/or nanomechanical structure comprising the following steps, starting from an element comprising a support substrate and a sacrificial layer: a) formation of a first layer, at least part of which is porous, b) formation on the first layer of a layer made of one (or several) materials providing the mechanical properties of the structure, called the intermediate layer, c) formation on the intermediate layer of a second layer, at least part of which is porous, d) formation of said structure in the stack composed of the first layer, the intermediate layer and the second layer, e) release of said structure by at least partial removal of the sacrificial layer.

    Abstract translation: 制造微机械和/或纳米机械结构的方法,包括以下步骤:从包括支撑基底和牺牲层的元件开始:a)形成第一层,其中至少一部分是多孔的,b)在 第一层由一种(或多种)材料制成,提供称为中间层的结构的机械性能,c)在第二层的中间层上形成,其中至少一部分是多孔的,d)形成 由第一层,中间层和第二层构成的堆叠中的所述结构,e)通过至少部分去除牺牲层来释放所述结构。

    METHOD FOR PRODUCING THIN, FREE-STANDING LAYERS OF SOLID STATE MATERIALS WITH STRUCTURED SURFACES
    6.
    发明申请
    METHOD FOR PRODUCING THIN, FREE-STANDING LAYERS OF SOLID STATE MATERIALS WITH STRUCTURED SURFACES 有权
    生产薄膜的方法,具有结构化表面的固体状态材料的自由表面层

    公开(公告)号:US20110259936A1

    公开(公告)日:2011-10-27

    申请号:US13141821

    申请日:2009-12-18

    Abstract: A method of printing comprises the steps of: providing a solid state material having an exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, wherein an exposed surface of the removed layer of solid state material has a surface topology corresponding to the stress pattern.

    Abstract translation: 印刷方法包括以下步骤:提供具有暴露表面的固态材料; 将辅助层施加到暴露的表面以形成复合结构,所述辅助层具有应力图案; 使复合结构受到促进固态材料沿着其深度处的平面断裂的条件; 并且除去辅助层,并且随后移除终止于断裂深度处的固态材料层,其中所述去除的固态材料层的暴露表面具有对应于应力图案的表面拓扑。

    Method for producing thin, free-standing layers of solid state materials with structured surfaces
    8.
    发明授权
    Method for producing thin, free-standing layers of solid state materials with structured surfaces 有权
    用于生产具有结构化表面的薄的,独立的固态材料层的方法

    公开(公告)号:US08877077B2

    公开(公告)日:2014-11-04

    申请号:US13141821

    申请日:2009-12-18

    Abstract: A method of printing comprises the steps of: providing a solid state material having an exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, wherein an exposed surface of the removed layer of solid state material has a surface topology corresponding to the stress pattern.

    Abstract translation: 印刷方法包括以下步骤:提供具有暴露表面的固态材料; 将辅助层施加到暴露的表面以形成复合结构,所述辅助层具有应力图案; 使复合结构受到促进固态材料沿着其深度处的平面断裂的条件; 并且除去辅助层,并且随后移除终止于断裂深度处的固态材料层,其中所述去除的固态材料层的暴露表面具有对应于应力图案的表面拓扑。

    MAGNETIC MICROPARTICLE AND METHOD FOR MANUFACTURING SUCH A MICROPARTICLE
    10.
    发明申请
    MAGNETIC MICROPARTICLE AND METHOD FOR MANUFACTURING SUCH A MICROPARTICLE 有权
    磁性微波和制造这种微波的方法

    公开(公告)号:US20110200434A1

    公开(公告)日:2011-08-18

    申请号:US13060662

    申请日:2010-09-17

    Abstract: A microparticle includes an oblong flexible tail able to propel the microparticle in a solution along a trajectory using beats transverse to the trajectory, the tail including at least one magnetic element such that the magnetic element causes beats of the tail under the action of an external alternating magnetic field non-collinear with the trajectory and a head mechanically connected to a proximal end of the tail. The microparticle includes at least one layer of material formed from one piece and including the tail and the head, the dimensions and/or shape of the head being selected such that the beats of the proximal end of the tail are limited with respect to the beats of the distal end of the tail and such that the head does not perform a complete revolution around an axis parallel to the trajectory under the effect of the external alternating magnetic field.

    Abstract translation: 微粒包括长方形柔性尾部,其能够使用横向于轨迹的搏动沿着轨迹将微粒推进到溶液中,尾部包括至少一个磁性元件,使得磁性元件在外部交替作用下引起尾巴的打击 与轨迹非共线的磁场和机械连接到尾端近端的磁头。 微粒包括至少一层材料,其由一个部件形成并包括尾部和头部,头部的尺寸和/或形状被选择为使得尾部的近端的节拍相对于节拍被限制 并且使得头部在外部交变磁场的作用下不围绕平行于轨迹的轴线执行完整的旋转。

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