DISPENSING UNITS FOR CONTROLLING SUBSTANCE FLOW AND RELATED METHODS

    公开(公告)号:US20180272373A1

    公开(公告)日:2018-09-27

    申请号:US15464597

    申请日:2017-03-21

    Abstract: A dispensing unit (100) for controlling flow of a substance (101) is disclosed. The dispensing unit (100) comprises a nozzle (102) and a plug (110). The nozzle (102) comprises a channel (104) that comprises a first portion (102) and a second portion (192), communicatively coupled with the first portion (190). The first portion (102) of the channel (104) has a symmetry axis (130). The second portion (192) of the channel (104) comprises an outlet (122) that is offset relative to the symmetry axis (130) of the first portion (190) of the channel (104). The dispensing unit (100) further comprises a plug (110) that comprises a wall (112) and a first aperture (116), which penetrates the wall (112) through an outer surface (114) of the wall (112).

    APPLICATION DEVICE
    10.
    发明申请
    APPLICATION DEVICE 审中-公开

    公开(公告)号:US20170106397A1

    公开(公告)日:2017-04-20

    申请号:US15128506

    申请日:2015-02-17

    Abstract: Provided is an application device for applying and spreading an application liquid to and on a predetermined application area of a target surface, which is capable of smearing the application liquid on the application area. The application device (D) includes a brush unit (4) having a brush bristle bundle (41a), and performs a step of causing, while moving a nozzle orifice (32a) of a dispenser (3) along at least a portion of the surface of a rivet (S11) and an area of a wall (Sp) surrounding the base of the rivet (S1), a sealing liquid to be ejected from the nozzle orifice (32a) and to adhere to the portion, and thereafter, a step of spreading the adhering sealing liquid by causing the brush bristle bundle (41a) to slide on the surface of the rivet (S1) and the area of wall (Sp) surrounding the base of the rivet (S1).

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