公开(公告)号：US20240240391A1

公开(公告)日：2024-07-18

申请号：US18153859

申请日：2023-01-12

申请人： Honeywell International Inc.

发明人： Mehrad Mehr ,  Bahram Jadidian

IPC分类号： D06M23/00 ,  B05C13/02 ,  B05C15/00 ,  C23C16/54

CPC分类号： D06M23/00 ,  B05C13/02 ,  B05C15/00 ,  C23C16/545

摘要： The disclosure describes continuous vacuum processing of a fiber tow. Continuous vacuum processing includes passing a fiber tow through a plurality of vacuum chambers and operating at least two vacuum chambers of the plurality of vacuum chambers at a different level of vacuum pressure than each other.

公开(公告)号：US20240238826A1

公开(公告)日：2024-07-18

申请号：US18620821

申请日：2024-03-28

申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

发明人： Zunguang YAN ,  Ye XU ,  Fenggui ZENG ,  Jiajing GAO ,  Renyu CHEN

IPC分类号： B05C5/02 ,  B05C11/10 ,  B05C13/02 ,  H01M50/124

CPC分类号： B05C5/02 ,  B05C11/1039 ,  B05C11/1044 ,  B05C13/02 ,  H01M50/1245

摘要： A flow-coating apparatus is configured to flow-coat a member to be flow-coated with an insulation layer, where the member to be flow-coated includes a first surface and an outer peripheral surface surrounding a periphery of the first surface, the first surface being perpendicular to a vertical direction. The flow-coating apparatus includes a first flow-coating mechanism and a second flow-coating mechanism, where a flow-coating opening of the first flow-coating mechanism faces the first surface and is configured to flow-coat the first surface with the insulation layer; and a flow-coating opening of the second flow-coating mechanism faces the outer peripheral surface and is configured to flow-coat the outer peripheral surface with the insulation layer.

公开(公告)号：US11958071B2

公开(公告)日：2024-04-16

申请号：US17015052

申请日：2020-09-08

申请人： Samsung Electronics Co., Ltd.

发明人： Michael D. Ybarra ,  Elijah L. Rhoades

IPC分类号： B65G7/12 ,  B05C13/02 ,  B23B31/39 ,  H01L21/68

CPC分类号： B05C13/02 ,  B23B31/39 ,  B65G7/12 ,  H01L21/68

摘要： A spin chuck jig includes a handle having first holes, a base having second holes, wherein a number of the second holes and a number of first holes are the same, and bolts each penetrating one of the first holes and one of the second holes so that the handle and the base are attached to a spin chuck to be lifted from a spin process equipment.

公开(公告)号：US11951508B2

公开(公告)日：2024-04-09

申请号：US17639774

申请日：2020-12-18

申请人： LG Energy Solution, Ltd.

发明人： Jong Hwan Choi ,  In Seong Kim ,  Min Cheol Choi

IPC分类号： B05C5/02 ,  B05C13/02 ,  H01M4/04

CPC分类号： B05C5/0254 ,  B05C5/0262 ,  B05C13/02 ,  H01M4/0404

摘要： The present technology relates to an electrode slurry-discharging shim, and a coating die comprising same, the present technology allowing superbly even coating to be assured even when the electrode slurry coating is at a high load level. In one example, the present technology provides a coating shim for electrode slurry discharge according to the present invention having a step portion configured to be formed at an end of an electrode slurry discharge flow path and to increase a width of the discharge flow path, and the step portion is formed at opposite sides in a width direction of the electrode slurry discharge flow path.

公开(公告)号：US20240105476A1

公开(公告)日：2024-03-28

申请号：US17951114

申请日：2022-09-23

申请人： Intel Corporation

发明人： Whitney BRYKS ,  Thomas HEATON ,  Joshua STACEY ,  Dilan SENEVIRATNE ,  Cansu ERGENE

IPC分类号： B05C13/02 ,  B05C5/02 ,  B05D1/26

CPC分类号： B05C13/02 ,  B05C5/02 ,  B05D1/26

摘要： The present disclosure is directed to a coating module including: a coating stage and a plurality of vertical guides configured to perpendicularly extend from the coating stage; a vertical movement mechanism configured to lower a framed panel along the plurality of vertical guides onto the coating stage; an optical alignment tool configured to provide feedback on a lateral alignment between an edge of the coating stage and the framed panel; and a dispensing unit configured to coat a surface of the panel.

公开(公告)号：US20240091804A1

公开(公告)日：2024-03-21

申请号：US18523034

申请日：2023-11-29

申请人： BMIC LLC

发明人： James A. Svec ,  Olan T. Leitch

IPC分类号： B05C1/02 ,  B05C1/00 ,  B05C1/08 ,  B05C1/16 ,  B05C9/06 ,  B05C13/02 ,  B05D1/28 ,  B05D1/34 ,  B05D5/10 ,  C09J7/38 ,  E04D1/34

CPC分类号： B05C1/027 ,  B05C1/003 ,  B05C1/0808 ,  B05C1/083 ,  B05C1/165 ,  B05C9/06 ,  B05C13/02 ,  B05D1/28 ,  B05D1/34 ,  B05D5/10 ,  C09J7/38 ,  E04D1/34 ,  B05C3/20 ,  C09J2301/122 ,  C09J2301/208 ,  E04D2001/3435 ,  E04D2001/3491

摘要： Systems and methods of applying self-seal strips of multiple different adhesives are disclosed. In one embodiment, two spaced apart spoked applicator wheel assemblies are positioned beneath a web of moving shingle stock such that each of the applicator wheels applies dots of different adhesives in an alternating pattern. In other embodiments, a layer of a second adhesive is deposited onto previously applied dots of a first adhesive to form layered adhesive dots with dual properties of both adhesives.

公开(公告)号：US20240091803A1

公开(公告)日：2024-03-21

申请号：US18066293

申请日：2022-12-15

申请人： Sichuan Huili Industry Co., Ltd

发明人： Shicai Xiao ,  Wanling Lan ,  Daiguo Zhao ,  Yan Jiang ,  Daiqun Yuan ,  Jinzhi Bai

IPC分类号： B05B13/02 ,  B05B15/50 ,  B05C9/14 ,  B05C13/02 ,  B05D3/06

CPC分类号： B05B13/0207 ,  B05B15/50 ,  B05C9/14 ,  B05C13/02 ,  B05D3/067

摘要： The present invention discloses a process and device for preparing laser PVC. The device includes an upper transmission roller, a support mechanism, a spraying mechanism, an impurity removal mechanism, and a lower transmission roller; the upper transmission roller is disposed above the lower transmission roller, and the two are configured to implement delivery of a PVC film at a station for preparing a laser layer by spraying; the support mechanism is disposed between the upper transmission roller and the lower transmission roller and is in contact with a back surface of the PVC film, and the spraying mechanism is disposed opposite to the support mechanism; and a curing mechanism is disposed in a fitting manner at the coating position; and the impurity removal mechanism is disposed at a front end of the spraying mechanism.

公开(公告)号：US11935763B2

公开(公告)日：2024-03-19

申请号：US17223115

申请日：2021-04-06

申请人： SCREEN Holdings Co., Ltd.

发明人： Michinori Iwao

IPC分类号： H01L21/67 ,  B05B13/02 ,  B05C13/02 ,  H01L21/304

CPC分类号： H01L21/67051 ,  B05B13/0242 ,  B05C13/02 ,  H01L21/304 ,  H01L21/6708

摘要： A substrate processing apparatus includes: a circulation pipe which defines a circulation passage through which a chemical liquid within a chemical-liquid tank is circulated; a supply pipe which guides the chemical liquid from the circulation pipe to a chemical-liquid nozzle; a supply valve which is switched between an open state in which the chemical liquid flowing through the supply pipe toward the chemical-liquid nozzle is passed and a closed state in which the supply of the chemical liquid from the supply pipe to the chemical-liquid nozzle is stopped; a recovery pipe which guides the chemical liquid from a cup to the chemical-liquid tank; and a branch pipe which guides the chemical liquid within the circulation pipe to the recovery pipe.

公开(公告)号：US20240066548A1

公开(公告)日：2024-02-29

申请号：US18366068

申请日：2023-08-07

申请人： SCREEN Holdings Co., Ltd.

发明人： Shuhei NEMOTO

IPC分类号： B05C11/08 ,  B05C11/10 ,  B05C13/02

CPC分类号： B05C11/08 ,  B05C11/10 ,  B05C13/02

摘要： In an substrate processing apparatus according to the present invention, a chamber is configured so as to cover an internal space with a bottom wall, side walls extending from the periphery of the bottom wall, and a ceiling wall covering the upper end of the side walls. A plurality of base support members stand vertically upward from the bottom wall, and the base member is supported by upper end portions of these base support members. A so-called raised floor structure is formed. Then, the substrate processing part is installed on the upper surface of the base member. By adopting such a layout using the raised floor structure, even if leakage of the processing liquid occurs and the processing liquid is pooled on the bottom wall of the chamber, it is possible to reliably prevent the processing liquid from coming into contact with the substrate processing part.

公开(公告)号：US11887882B2

公开(公告)日：2024-01-30

申请号：US16683699

申请日：2019-11-14

申请人： C. Uyemura & Co., Ltd.

发明人： Daisuke Matsuyama ,  Daisuke Hashimoto ,  Kazuyoshi Nishimoto ,  Tomoji Okuda

IPC分类号： H01L21/68 ,  H01L21/687 ,  H01L21/67 ,  B05C13/02

CPC分类号： H01L21/6875 ,  B05C13/02 ,  H01L21/67057

摘要： An object of the present invention is to provide a holding jig that is used for applying a liquid bath treatment to a planar workpiece, has good cleaning capabilities, and avoids intimate contact of the planar workpiece with a rear member of the holding jig so that the planar workpiece can be easily detached from the holding jig after cleaning. A holding jig is used for applying a liquid bath treatment to a planar workpiece. The holding jig comprises a rear member, and a front member that faces the rear member and has an opening portion. The planar workpiece is disposed between the rear member and the front member, and the rear member has a plurality of projections formed on the surface of the rear member facing the front member.