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    METHOD AND SYSTEM FOR OPTICAL CALLIBRATION DISCS
    1.
    发明申请
    METHOD AND SYSTEM FOR OPTICAL CALLIBRATION DISCS 审中-公开
    光学识别盘的方法和系统

    公开(公告)号：US20130143002A1

    公开(公告)日：2013-06-06

    申请号：US13311302

    申请日：2011-12-05

    Applicant: Nobuo Kurataka ,  Gennady Gauzner ,  Zhaoning Yu

    Inventor： Nobuo Kurataka ,  Gennady Gauzner ,  Zhaoning Yu

    IPC: B32B3/10 ,  C23F1/04 ,  B05D3/06 ,  B05D5/00

    CPC classification number: G11B5/855 ,  B32B1/08 ,  B32B3/30 ,  B32B2551/00 ,  G03F7/0002 ,  Y10T428/24612

    Abstract: A system and method for optical calibration discs includes dispensing a resist layer on a portion of a substrate. A surface of the substrate and a topographically patterned surface of predetermined objects of a template are contacted together, wherein the contacting causes the resist layer between the portion of the substrate and the template to conform to the topographically patterned surface, and the resist layer includes nano-scale voids. The nano-scale voids are reduced by longer spread time, thinner resist, and removal of the residual resist layer together with the voids by using a descum step. The resist layer is hardened into a negative image of the topographically patterned surface, wherein the negative image includes surfaces that are operable to be individually measured by an optical reader. The substrate and the template are separated, wherein the resist layer adheres to the surface of the substrate.

    Abstract translation: 用于光学校准盘的系统和方法包括在基底的一部分上分配抗蚀剂层。 基板的表面和模板的预定物体的地形图形表面接触在一起，其中所述接触使得所述基板的所述部分与所述模板之间的所述抗蚀剂层与所述地形图形表面一致，并且所述抗蚀剂层包括纳米 规模空白。 通过使用除尘步骤，纳米级空隙通过较长的铺展时间，更薄的抗蚀剂和残余抗蚀剂层与空隙一起去除而减少。 抗蚀剂层被硬化成地形图案化表面的负像，其中负像包括可操作以由光学读取器单独测量的表面。 分离基板和模板，其中抗蚀剂层粘附到基板的表面。

    ANALYSIS OF PATTERN FEATURES
    2.
    发明申请
    ANALYSIS OF PATTERN FEATURES 审中-公开
    模式特征分析

    公开(公告)号：US20140014621A1

    公开(公告)日：2014-01-16

    申请号：US13798130

    申请日：2013-03-13

    Applicant: Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

    Inventor： Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

    IPC: B05C21/00

    CPC classification number: G03F7/0002 ,  C09K13/00 ,  G03F7/40 ,  G11B5/746 ,  G11B5/855

    Abstract: The embodiments disclose a method for an electron curing reverse-tone process, including depositing an etch-resistant layer onto a patterned imprinted resist layer fabricated onto a hard mask layer deposited onto a substrate, curing the etch-resistant layer using an electron beam dose during etching processes of imprinted pattern features into the hard mask and into the substrate and using analytical processes to quantify reduced pattern feature placement drift errors and to quantify increased pattern feature size uniformity of imprinted pattern features etched.

    Abstract translation: 实施方案公开了一种用于电子固化反相色调工艺的方法，包括将沉积抗蚀刻层的图案印刷的抗蚀剂层沉积在沉积在基底上的硬掩模层上，使用电子束剂量固化耐蚀刻层 将印刷图案特征蚀刻到硬掩模中并进入基底，并使用分析过程来量化减少的图案特征位移漂移误差并量化蚀刻的印记图案特征的增加的图案特征尺寸均匀性。

    METHOD OF DISK ALIGNMENT USING PRINTED ALIGNMENT MARKS
    3.
    发明申请
    METHOD OF DISK ALIGNMENT USING PRINTED ALIGNMENT MARKS 有权
    使用打印对齐标记进行磁盘对准的方法

    公开(公告)号：US20110128647A1

    公开(公告)日：2011-06-02

    申请号：US12629791

    申请日：2009-12-02

    Applicant: Gennady Gauzner ,  David S. Kuo ,  Justin Jia-Jen Hwu ,  Li-Ping Wang ,  Zhaoning Yu ,  Kim Yang Lee

    Inventor： Gennady Gauzner ,  David S. Kuo ,  Justin Jia-Jen Hwu ,  Li-Ping Wang ,  Zhaoning Yu ,  Kim Yang Lee

    IPC: G11B21/02 ,  G11B5/82 ,  G11B33/00 ,  G11B33/10

    CPC classification number: G11B25/043 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855 ,  Y10T29/49021

    Abstract: Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle.

    Abstract translation: 过程包括将光盘与模板在一个位置对齐，使得来自模板的图案以相对方向被传送到光盘。 相对方向规定，当具有转印图案的光盘最终组装成硬盘驱动器时，盘的主轴孔的内径可以抵靠盘驱动主轴的外径，并且包含数据的图案 碟盘将与盘片驱动主轴的中心同心对齐。 当包含数据的图案与盘驱动器心轴同心对准时，衬底本身被允许为非同心的。 其它方面还包括具有包括PIM和形成在盘表面上的位图形和伺服信息中的一种或多种的偏心构造的盘，基于盘的主轴孔的半径和 在组装过程中将放置光盘的主轴的半径，PIM用于确定光盘与主轴的角度对齐。

    Method of disc alignment using printed alignment marks
    4.
    发明授权
    Method of disc alignment using printed alignment marks 有权
    使用印刷对准标记的盘对准方法

    公开(公告)号：US08792201B2

    公开(公告)日：2014-07-29

    申请号：US12629791

    申请日：2009-12-02

    Applicant: Gennady Gauzner ,  David S. Kuo ,  Justin Jia-Jen Hwu ,  Li-Ping Wang ,  Zhaoning Yu ,  Kim Yang Lee

    Inventor： Gennady Gauzner ,  David S. Kuo ,  Justin Jia-Jen Hwu ,  Li-Ping Wang ,  Zhaoning Yu ,  Kim Yang Lee

    IPC: G11B21/02 ,  G11B5/82 ,  B82Y10/00 ,  G11B5/855 ,  G11B5/74 ,  G11B25/04

    CPC classification number: G11B25/043 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855 ,  Y10T29/49021

    Abstract: Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle.

    Abstract translation: 过程包括将光盘与模板在一个位置对齐，使得来自模板的图案以相对方向被传送到光盘。 相对方向规定，当具有转印图案的光盘最终组装成硬盘驱动器时，盘的主轴孔的内径可以抵靠盘驱动主轴的外径，并且包含数据的图案 碟盘将与盘片驱动主轴的中心同心对齐。 当包含数据的图案与盘驱动器心轴同心对准时，衬底本身被允许为非同心的。 其它方面还包括具有包括PIM和形成在盘表面上的位图形和伺服信息中的一种或多种的偏心构造的盘，基于盘的主轴孔的半径和 在组装过程中将放置光盘的主轴的半径，PIM用于确定光盘与主轴的角度对齐。

    PROFILE CONTROL UTILIZING A RECESSED IMPRINT TEMPLATE
    6.
    发明申请
    PROFILE CONTROL UTILIZING A RECESSED IMPRINT TEMPLATE 审中-公开
    配置文件控制使用一个被压印的模版

    公开(公告)号：US20110027407A1

    公开(公告)日：2011-02-03

    申请号：US12510894

    申请日：2009-07-28

    Applicant: Kim Yang Lee ,  David S. Kuo ,  Zhaoning Yu

    Inventor： Kim Yang Lee ,  David S. Kuo ,  Zhaoning Yu

    IPC: B29C59/00 ,  B44C1/22 ,  C23F1/00 ,  G03F7/20

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L2251/105

    Abstract: An imprint template is provided with a shallower field bordering the patterned region. The shallower field can be formed with additional lithography/etch steps after (or before) the formation of the features in the patterned region. The template is used to establish a thin film pattern with a field thickness that is shallower than the pattern. A shallower field bordering the patterned region alleviates sidewall re-deposition during ion mill. In a planarization/etch-back process, a thinner field helps to achieve a flat top surface by compensating for the thickness variation caused by different filling ratios. Fabrication of the recessed field template comprises a multi-step patterning process. The initial patterns are formed using a convention fabrication process. A second patterning step is used to reduce the height of the field region, which can be applied by coating the “half-finished” template with a suitable resist pattern and patterning the resist using a second lithography step that is aligned to the original pattern. Template material in the field region is then etched with the resist as a mask, forming a template with a recessed field region after the remaining resist is removed. It should be appreciated that the order of these etch steps can be reversed to obtain the same result.

    Abstract translation: 压印模板设置有与图案化区域相邻的较浅的场。 可以在（或之前）在图案化区域中形成特征之后的附加光刻/蚀刻步骤形成较浅的场。 该模板用于建立具有比图案浅的场厚的薄膜图案。 与图案区域相邻的较浅的场减轻离子磨中的侧壁再沉积。 在平坦化/回蚀刻工艺中，通过补偿由不同填充率引起的厚度变化，较薄的场有助于实现平坦的顶表面。 凹陷场模板的制造包括多步图案化工艺。 使用惯例制作工艺形成初始图案。 使用第二图案化步骤来减小场区域的高度，其可以通过用合适的抗蚀剂图案涂覆“半成品”模板并且使用与原始图案对准的第二光刻步骤来图案化抗蚀剂来施加。 然后用抗蚀剂作为掩模蚀刻场区域中的模板材料，在除去剩余的抗蚀剂之后，形成具有凹陷场区域的模板。 应当理解，可以颠倒这些蚀刻步骤的顺序以获得相同的结果。

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