INTEGRATED CIRCUIT PACKAGE SYSTEM WITH POST-PASSIVATION INTERCONNECTION AND INTEGRATION
    4.
    发明申请
    INTEGRATED CIRCUIT PACKAGE SYSTEM WITH POST-PASSIVATION INTERCONNECTION AND INTEGRATION 审中-公开
    集成电路封装系统与后置互连和集成

    公开(公告)号:US20070235878A1

    公开(公告)日:2007-10-11

    申请号:US11278002

    申请日:2006-03-30

    IPC分类号: H01L23/48

    摘要: An integrated circuit package system is provided providing an integrated circuit die having a final metal layer of the semiconductor process used to manufacture the integrated circuit die and a passivation layer provided thereon, depositing a first metal layer on the passivation layer and the final metal layer, forming an analog circuit in the first metal layer, coating a first insulation layer on the first metal layer and the passivation layer, exposing a first pad and a second pad of the first metal layer through the first insulation layer, and connecting a first interconnect on the first pad and a second interconnect on the second pad.

    摘要翻译: 提供一种集成电路封装系统,提供具有用于制造集成电路管芯的半导体工艺的最终金属层和设置在其上的钝化层的集成电路管芯,在钝化层和最终金属层上沉积第一金属层, 在所述第一金属层中形成模拟电路,在所述第一金属层和所述钝化层上涂覆第一绝缘层,通过所述第一绝缘层暴露所述第一金属层的第一焊盘和第二焊盘,以及将第一互连 第一焊盘和第二焊盘上的第二互连。