Self-assembled monolayer and method of making
    2.
    发明授权
    Self-assembled monolayer and method of making 失效
    自组装单层和制作方法

    公开(公告)号:US06846554B2

    公开(公告)日:2005-01-25

    申请号:US10347042

    申请日:2003-01-17

    摘要: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

    摘要翻译: 根据本发明,在基板上具有自组装单层的先前已知的功能材料具有多个组装分子,每个组装分子具有多个结合位置的组装原子(当硅是组装分子时的四个位置),其中键合 完全结合的组装原子(多个与氧原子结合的键合位置)的分数(或分数)在通过液体溶液沉积制备时具有最大值,例如当硅是组装分子时最大为40%,最大表面密度 的组装分子是每平方毫米5硅烷。 注意,结合分数和表面总体数是独立的参数。 本发明的方法是对已知的在基材上制备硅氧烷层的方法的改进,其中代替液相溶液化学,改进是超临界相化学。 本发明具有氧键分数更高,组装分子表面密度更大,反应时间缩短约5分钟至约24小时的优点。

    Method of dehydroxylating a hydroxylated material and method of making a mesoporous film
    3.
    发明授权
    Method of dehydroxylating a hydroxylated material and method of making a mesoporous film 失效
    脱羟基化羟基化材料的方法和制备介孔膜的方法

    公开(公告)号:US06383466B1

    公开(公告)日:2002-05-07

    申请号:US09222569

    申请日:1998-12-28

    IPC分类号: C01B33159

    CPC分类号: C01B37/02 H01L21/31695

    摘要: The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.

    摘要翻译: 本发明是一种将羟基化的二氧化硅表面脱羟基化的方法,其具有将二氧化硅表面分别暴露于硅有机化合物和脱羟基化气体的步骤。 暴露于硅有机化合物可以是液体,气体或溶液相,并且暴露于脱羟基化气体通常处于升高的温度。 在一个实施方案中,脱羟基化程序的改进是重复浸泡和脱羟基化气体暴露。 在另一个实施方案中,改进是使用基本上不含氢的惰性气体。 在另一个实施方案中,本发明是两步脱羟基化方法与制备介孔膜的表面活性剂模板法的组合。

    Self-assembled monolayer and method of making
    4.
    发明授权
    Self-assembled monolayer and method of making 有权
    自组装单层和制作方法

    公开(公告)号:US06733835B2

    公开(公告)日:2004-05-11

    申请号:US10347040

    申请日:2003-01-17

    IPC分类号: B05D300

    摘要: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

    摘要翻译: 根据本发明,在衬底上具有自组装单层的先前已知的功能材料具有多个组装分子,每个组装分子具有多个结合位置的组装原子(当硅是组装分子时的四个位置),其中键合 完全结合的组装原子(多个与氧原子结合的键合位置)的分数(或分数)在通过液体溶液沉积制备时具有最大值,例如当硅是组装分子时最大为40%,最大表面密度 的组装分子是每平方毫米5硅烷。 注意,结合分数和表面总体数是独立的参数。 本发明的方法是对已知的在基材上制备硅氧烷层的方法的改进,其中代替液相溶液化学,改进是超临界相化学。 本发明具有氧键分数更高,组装分子表面密度更大,反应时间缩短约5分钟至约24小时的优点。

    Method and apparatus for ion sequestration and a nanostructured metal phosphate
    10.
    发明授权
    Method and apparatus for ion sequestration and a nanostructured metal phosphate 失效
    用于离子螯合的方法和装置以及纳米结构的金属磷酸盐

    公开(公告)号:US07691637B2

    公开(公告)日:2010-04-06

    申请号:US11195394

    申请日:2005-08-01

    IPC分类号: G01N33/20

    摘要: A nanostructured substance, a process for sequestration of ionic waste, and an ion-sequestration apparatus are disclosed in the specification. The nanostructured substance can comprise a Lewis acid transition metal bound to a phosphate, wherein the phosphate comprises a primary structural component of the substance and the Lewis acid transition metal is a reducing agent. The nanostructured substance has a Brunner-Emmet-Teller (BET) surface area greater than or equal to approximately 100 m2/g, and a distribution coefficient for an analyte, Kd, greater than or equal to approximately 5000 ml/g. The process can comprise contacting a fluid and a nanostructured metal phosphate. The apparatus can comprise a vessel and a nanostructured metal phosphate. The vessel defines a volume wherein a fluid contacts the nanostructured metal phosphate.

    摘要翻译: 在说明书中公开了纳米结构物质,离子废物的螯合方法和离子螯合装置。 纳米结构物质可以包含与磷酸盐结合的路易斯酸过渡金属,其中磷酸盐包括物质的主要结构成分,路易斯酸过渡金属是还原剂。 纳米结构物质具有大于或等于约100m 2 / g的Brunner-Emmet-Teller(BET)表面积,分析物的分布系数Kd大于或等于约5000ml / g。 该方法可以包括使流体和纳米结构的金属磷酸盐接触。 该装置可以包括容器和纳米结构的金属磷酸盐。 容器限定了其中流体接触纳米结构的金属磷酸盐的体积。