公开(公告)号：US09007561B2

公开(公告)日：2015-04-14

申请号：US13543238

申请日：2012-07-06

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

Abstract: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.

Abstract translation: 曝光装置通过光学组件和设置在基板上的液体将光照射到基板上来曝光基板。 曝光装置包括可相对于光学组件移动的舞台组件，舞台组件包括支撑衬底的支撑件，基本上环绕支撑件的第一子区域和基本上环绕第一子区域的第二子区域。 第一子区域包括具有第一特征的第一表面，而第二子区域包括具有不同于第一特征的第二特征的第二表面。

公开(公告)号：US08243253B2

公开(公告)日：2012-08-14

申请号：US12155377

申请日：2008-06-03

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

Abstract translation: 用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。 光学组件被定位成使得在装置上方存在间隙。 浸没流体系统用浸没流体填充间隙。 装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。 装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。

公开(公告)号：US08094379B2

公开(公告)日：2012-01-10

申请号：US12461762

申请日：2009-08-24

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G02B3/12

CPC classification number: G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

Abstract: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap.

Abstract translation: 光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。 在曝光期间，光学元件和基板之间的空间被填充液体。 在光学元件的部件和表面之间形成间隙，曝光光束不通过该光学元件。 液体被供应到间隙。

公开(公告)号：US20110031416A1

公开(公告)日：2011-02-10

申请号：US12923948

申请日：2010-10-15

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G21G5/00 ,  G03B27/52

CPC classification number: G03F7/70341

Abstract: A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.

Abstract translation: 用于制造半导体器件的光刻工具包括晶片台，透镜和液体分配组件，通过该液体分配组件将液体沿着远离所述晶片台的方向引导到设置在晶片台上的半导体晶片的表面和透镜之间 半导体晶片在其边缘。

公开(公告)号：US07688421B2

公开(公告)日：2010-03-30

申请号：US11628942

申请日：2004-12-20

Applicant: Douglas C. Watson ,  W. Thomas Novak

Inventor： Douglas C. Watson ,  W. Thomas Novak

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/32

CPC classification number: G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

Abstract: An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

Abstract translation: 一种浸没式光刻系统，用于补偿由浸液引起的光学位移。 该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。 光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。 提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。 为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。 由变化的压力产生的所产生的力可能导致最终的光学元件变位。 流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。

公开(公告)号：US07443482B2

公开(公告)日：2008-10-28

申请号：US11236759

申请日：2005-09-28

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03C5/00

CPC classification number: G03F7/70341

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

公开(公告)号：US20080239261A1

公开(公告)日：2008-10-02

申请号：US12155377

申请日：2008-06-03

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

Abstract translation: 用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。 光学组件被定位成使得在装置上方存在间隙。 浸没流体系统用浸没流体填充间隙。 装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。 装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。

公开(公告)号：US07414794B2

公开(公告)日：2008-08-19

申请号：US11234279

申请日：2005-09-26

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G02B3/12

CPC classification number: G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract translation: 将自动聚焦单元提供给浸没式光刻设备，其中流体设置在工件的目标表面上，并且图像图案通过流体投影到该目标表面上。 自动对焦单元具有相对设置在目标表面上方的投影透镜等光学元件。 自动对焦光源被布置成以特定角度倾斜地投射光束，使得该光束通过流体并被在光学元件下方的指定反射位置处被工件的目标表面反射。 接收器接收并分析反射光。 校正透镜可以设置在光束的光路上，用于校正光束的传播。

公开(公告)号：US20080192064A1

公开(公告)日：2008-08-14

申请号：US11704404

申请日：2007-02-08

Applicant: Li Hong ,  Maki Suzuki ,  Mark Takita ,  W. Thomas Novak

Inventor： Li Hong ,  Maki Suzuki ,  Mark Takita ,  W. Thomas Novak

IPC: G09G5/00

CPC classification number: H04N5/235 ,  G06T5/002 ,  G06T5/009 ,  G06T5/20 ,  G06T5/40 ,  G06T5/50 ,  G06T2207/10024 ,  G06T2207/20012 ,  G06T2207/20192 ,  H04N5/2355 ,  H04N5/243 ,  H04N2101/00

Abstract: An image apparatus (10) for providing an adjusted image (242) of a scene (236) includes a capturing system (16) and a control system (24). The capturing system (16) captures an underexposed first frame (240) that is defined by a plurality of pixels (240A), including a first pixel and a second pixel. The first frame (240) includes at least one of a first texture region (240S) and a second texture region (240T). The control system (24) can analyze information from the pixels (240A) and determine if the first pixel has captured a portion of the first texture region (240S) or the second texture region (240T). Further, the control system (16) can analyze information from the pixels (240A) and to determine if the second pixel has captured a portion of the first texture region (240S) or the second texture region (240T). With this design, the control system (16) can reduce the noise in the first frame (240) to provide a well exposed adjusted image (242).

Abstract translation: 用于提供场景（236）的调整图像（242）的图像设备（10）包括捕获系统（16）和控制系统（24）。 捕获系统（16）捕获由包括第一像素和第二像素的多个像素（240A）限定的曝光不足的第一帧（240）。 第一框架（240）包括第一纹理区域（240S）和第二纹理区域（240T）中的至少一个。 控制系统（24）可以分析来自像素（240A）的信息，并且确定第一像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 此外，控制系统（16）可以分析来自像素（240A）的信息，并且确定第二像素是否已经捕获了第一纹理区域（240S）或第二纹理区域（240T）的一部分。 利用这种设计，控制系统（16）可以减少第一帧（240）中的噪声，以提供良好曝光的调整图像（242）。

公开(公告)号：US20080175576A1

公开(公告)日：2008-07-24

申请号：US11655501

申请日：2007-01-18

Applicant: Li Hong ,  Mark Takita ,  W. Thomas Novak

Inventor： Li Hong ,  Mark Takita ,  W. Thomas Novak

IPC: G03B13/18

CPC classification number: G03B13/18

Abstract: A camera (210) for providing an adjusted image (214) of a scene (12) includes an apparatus frame (224), an optical assembly (222), a capturing system (226), and a control system (232). The optical assembly (222) is adjustable to alternatively be focused on a first focal area (356A) and a second focal area (356B) that is different than the first focal area (356A). The capturing system (226) captures a first captured image (360A) when the optical assembly (222) is focused at the first focal area (356A) and captures a second captured image (360B) when the optical assembly (222) is focused at the second focal area (356B). The control system (232) provides the adjusted image (214) of the scene (12) based upon the first captured image (360A) and the second captured image (360B). Additionally, the control system (232) can perform object depth extraction of one or more objects (16) (18) (20) in the scene (12). Alternatively, the multiple captured images (360A) (360B) can be adjusted by a separate adjustment system (680).

Abstract translation: 用于提供场景（12）的调整图像（214）的相机（210）包括装置框架（224），光学组件（222），捕获系统（226）和控制系统（232）。 光学组件（222）可调节以可选地聚焦在与第一焦点区域（356A）不同的第一焦点区域（356A）和第二焦点区域（356B）上。 当光学组件（222）被聚焦在第一聚焦区域（356A）时，捕获系统（226）捕获第一捕获图像（360A），并且当光学组件（222））捕获第二捕获图像（360B） 集中在第二个重点领域（356 B）。 控制系统（232）基于第一拍摄图像（360A）和第二拍摄图像（360B）提供场景（12）的调整图像（214）。 此外，控制系统（232）可以对场景（12）中的一个或多个物体（16）（18）（20）进行物体深度提取。 或者，可以通过单独的调整系统（680）来调整多个拍摄图像（360A）（360B）。