Invention Grant
US08243253B2 Lyophobic run-off path to collect liquid for an immersion lithography apparatus 有权
用于浸没式光刻设备的疏液流路以收集液体

Lyophobic run-off path to collect liquid for an immersion lithography apparatus
Abstract:
An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
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