Invention Grant
US08243253B2 Lyophobic run-off path to collect liquid for an immersion lithography apparatus
有权
用于浸没式光刻设备的疏液流路以收集液体
- Patent Title: Lyophobic run-off path to collect liquid for an immersion lithography apparatus
- Patent Title (中): 用于浸没式光刻设备的疏液流路以收集液体
-
Application No.: US12155377Application Date: 2008-06-03
-
Publication No.: US08243253B2Publication Date: 2012-08-14
- Inventor: W. Thomas Novak
- Applicant: W. Thomas Novak
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/52
- IPC: G03B27/52

Abstract:
An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
Public/Granted literature
- US20080239261A1 Run-off path to collect liquid for an immersion lithography apparatus Public/Granted day:2008-10-02
Information query