公开(公告)号：US20120108063A1

公开(公告)日：2012-05-03

申请号：US13323986

申请日：2011-12-13

Applicant: Keiko EMI ,  Junichi SUZUKI ,  Takayuki ABE ,  Tomohiro IIJIMA ,  Jun YASHIMA

Inventor： Keiko EMI ,  Junichi SUZUKI ,  Takayuki ABE ,  Tomohiro IIJIMA ,  Jun YASHIMA

IPC: H01L21/306

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

Abstract translation: 射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便 校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图 在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量 的所述物体。

公开(公告)号：US20070138413A1

公开(公告)日：2007-06-21

申请号：US11563109

申请日：2006-11-24

Applicant: Takayuki ABE ,  Jun Yashima

Inventor： Takayuki ABE ,  Jun Yashima

IPC: G21K5/10

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30472

Abstract: A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

Abstract translation: 带电粒子束写入方法包括照射带电粒子束的镜头，并且使用布置在带电粒子束的光路上的多个偏转器偏转拍摄的带电粒子束以将目标物体写入图案，其中 所述多个偏转器中的任何一个控制在相同的周期内不同于由另一偏转器偏转控制的镜头的镜头的带电粒子束的偏转。

公开(公告)号：US20120104286A1

公开(公告)日：2012-05-03

申请号：US13349002

申请日：2012-01-12

Applicant: Jun YASHIMA ,  Junichi SUZUKI ,  Takayuki ABE

Inventor： Jun YASHIMA ,  Junichi SUZUKI ,  Takayuki ABE

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026

Abstract: A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

公开(公告)号：US20110238897A1

公开(公告)日：2011-09-29

申请号：US13049417

申请日：2011-03-16

Applicant: Takayuki ABE

Inventor： Takayuki ABE

IPC: G06F12/02

CPC classification number: G06F11/3419 ,  G06F11/3037 ,  G06F11/3055 ,  G06F2201/81

Abstract: According to one embodiment, a memory system includes: a nonvolatile semiconductor memory including a plurality of normal blocks and at least one dummy block, each of the normal blocks being a unit of data erasing; a writing control unit that rewrites the dummy block the number of times equal to or larger than a maximum number of times among the numbers of times of rewriting of the normal blocks; a monitor unit that monitors a data erasing time or a data writing time of the dummy block; and a wear-leveling control unit that averages the numbers of times of rewriting of the normal blocks. The memory system determines, based on a monitor result of the monitor unit, possibility of continuation of the rewriting of the normal blocks.

Abstract translation: 根据一个实施例，一种存储系统包括：包括多个正常块和至少一个虚拟块的非易失性半导体存储器，每个正常块是数据擦除单元; 写入控制单元，在所述正常块的重写次数中，重写所述虚拟块的次数等于或大于最大次数; 监视单元，监视所述虚拟块的数据擦除时间或数据写入时间; 以及平均化正常块的重写次数的磨损均衡控制单元。 存储器系统基于监视器单元的监视结果确定继续重写正常块的可能性。

公开(公告)号：US20090091323A1

公开(公告)日：2009-04-09

申请号：US12331005

申请日：2008-12-09

Applicant: Hisako NAGAO ,  Takayuki ABE ,  Tetsuhiko TAKAHASHI ,  Masahiro TAKIZAWA

Inventor： Hisako NAGAO ,  Takayuki ABE ,  Tetsuhiko TAKAHASHI ,  Masahiro TAKIZAWA

IPC: G01R33/565

CPC classification number: A61B5/055 ,  G01R33/56375

Abstract: A magnetic resonance imaging apparatus comprises static magnetic field generating means for generating a static magnetic field in an imaging space, a gradient magnetic field generating means for generating a gradient magnetic field in the imaging space, high-frequency magnetic field generating means for generating a high-frequency magnetic field so as to induce nuclear magnetic resonance in a subject placed in the imaging space, signal receiving means for detecting a nuclear magnetic resonance signal from the subject, signal processing means for reconstructing an image by using the detected nuclear magnetic resonance signal, display means for displaying the image, a table for placing the subject thereon to dispose the subject in the imaging means, and table moving means for moving the table on which the subject is placed.While moving the portions to be imaged of the subject continuously or stepwise in the imaging space and disposing the subject, a whole-body image of a large region of the subject is created.The magnetic resonance imaging apparatus further comprises means for detecting information on the displacement of the subject from a desired position and setting means for setting movement information on the table according to the displacement information.The table moving means moves the table according to the movement information set by the setting means to capture the whole-body image.

Abstract translation: 磁共振成像装置包括用于在成像空间中产生静磁场的静磁场产生装置，用于在成像空间中产生梯度磁场的梯度磁场产生装置，用于产生高电平的高频磁场产生装置 频率磁场，以便在放置在成像空间中的对象中引起核磁共振，用于检测来自对象的核磁共振信号的信号接收装置，用于通过使用检测到的核磁共振信号重建图像的信号处理装置， 用于显示图像的显示装置，用于将被摄体放置在其上以将被摄体置于成像装置中的台子以及用于移动放置被摄体的台的台移动装置。 在成像空间中连续或逐步移动被摄体的成像部分并配置被摄体的同时，创建被检体的大区域的全身图像。 磁共振成像装置还包括用于检测来自所需位置的被摄体的位移的信息的装置和用于根据位移信息设置在桌子上的移动信息的设定装置。 桌子移动装置根据由设置装置设置的移动信息移动桌子以捕获全身图像。

公开(公告)号：US20070292634A1

公开(公告)日：2007-12-20

申请号：US11762879

申请日：2007-06-14

Applicant: Takayuki ABE ,  Yoshiyasu HONMA ,  Tomohiro OKUMURA ,  Keisuke OKADA ,  Kazuto FUKUDA

Inventor： Takayuki ABE ,  Yoshiyasu HONMA ,  Tomohiro OKUMURA ,  Keisuke OKADA ,  Kazuto FUKUDA

IPC: C09K19/00

CPC classification number: H01J11/12 ,  H01J9/242 ,  H01J11/36 ,  H01J2211/361 ,  Y10T428/1059

Abstract: A plasma display panel (PDP) and a method of manufacturing the same suppresses variation in the height of the intersecting barrier walls with a simple method and that prevents cross talk from occurring between the discharge cells. A concave part is formed at a position contacting an intersecting part of a first barrier wall before baking and a second barrier wall before baking orthogonal to the first barrier wall before baking. When such concave part is formed, the values of the surface area per volume of the intersecting part and the surface area per volume of the first barrier wall before baking and the second barrier wall before baking between the intersecting part and the intersecting part adjacent to the intersecting part become substantially equal. As a result, the height of the intersecting part does not become high after baking, a barrier wall of aligned height is obtained, and cross talk does not occur between the discharge cells.

Abstract translation: 等离子体显示面板（PDP）及其制造方法以简单的方法抑制交叉阻挡壁的高度变化，并且防止在放电单元之间发生串扰。 在烘烤之前，在与第一阻挡壁正交的烘烤前的第一阻挡壁的交叉部与第二阻挡壁接触的位置形成凹部， 当形成这样的凹部时，交叉部分的每个体积的表面积和烘烤前的第一阻挡壁的体积的表面积和烘烤前的交叉部分和邻近的交叉部分的交叉部分之间的值 相交部分变得基本相等。 结果，烘烤后交叉部分的高度不变高，获得排列高度的阻挡壁，并且在放电单元之间不发生串扰。

公开(公告)号：US20160083169A1

公开(公告)日：2016-03-24

申请号：US14780883

申请日：2014-03-28

Applicant: Takayuki ABE ,  Mitsuo FURUSAWA

Inventor： Takayuki ABE ,  Mitsuo FURUSAWA

IPC: B65D83/00 ,  A45D40/00 ,  B65D21/08

CPC classification number: B65D83/0055 ,  A45D40/00 ,  B65D21/08 ,  B65D47/0842 ,  B65D49/02

Abstract: A double container includes an outer layer body constituting an outer shell; an inner layer body including an upper opening communicating with a containing space, accommodated in the outer layer body, and deformable to undergo volume reduction; an inside plug including a tubular wall extending toward the containing space, a spherical body serving as a valve body being disposed inside the tubular wall; and a dispensing plug fitted to a mouth portion of the outer layer body and including a dispensing tube connected to the tubular wall. The tubular wall includes an inclined wall having a diameter decreasing toward the containing space and configured to abut against the spherical body over an entire circumference and including a protruding wall protruding from the inclined wall to the containing space. The protruding wall includes a liquid holding member holding a pool of liquid medium of the content formed below the spherical body.

Abstract translation: 双层容器包括构成外壳的外层体; 内层体，其包括容纳在所述外层体中的与容纳空间连通的上开口，并且可变形以进行体积减小; 包括朝向容纳空间延伸的管状壁的内塞，设置在管状壁内的用作阀体的球体; 以及安装在所述外层体的口部上并且包括连接到所述管状壁的分配管的分配塞。 管状壁包括倾斜壁，该倾斜壁的直径朝向容纳空间减小并且构造成在整个圆周上抵靠球形体，并且包括从倾斜壁向容纳空间突出的突出壁。 突出壁包括保持形成在球体下方的内容物的液体介质池的液体保持构件。

公开(公告)号：US20100072403A1

公开(公告)日：2010-03-25

申请号：US12547958

申请日：2009-08-26

Applicant: Takayuki ABE ,  Rikio TOMIYOSHI ,  Hiroshi NOZUE

Inventor： Takayuki ABE ,  Rikio TOMIYOSHI ,  Hiroshi NOZUE

IPC: G21K5/10

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0453

Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unbroken ones of the plurality of columns respectively.

Abstract translation: 使用光刻技术的图案形成装置包括：被配置为允许将目标物体放置在其上的台; 多个列，被配置为通过在相对于所述载物台移动的同时使用带电粒子束在所述目标物体上形成图案; 图案形成规则设定单元，被配置为根据所述多个列中的断开的一个的位置来设置图案形成规则; 区域设定单元，被配置为设置区域，使得所述多个列中的不间断的列分别在所述区域之一中形成图案; 每个控制电路被配置为控制与多个控制电路中的其他控制电路控制的多个列中的其他列不同的多个列中的任一个; 以及图案形成数据处理单元，被配置为对所设置的区域的图案形成数据执行转换处理，以将分别对应的多个列中的不间断的相应数据的转换处理生成的相应数据输出到对应的一个。

公开(公告)号：US20080217554A1

公开(公告)日：2008-09-11

申请号：US12042865

申请日：2008-03-05

Applicant: Takayuki ABE

Inventor： Takayuki ABE

IPC: H01J37/30 ,  H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/09 ,  H01J2237/0453

Abstract: A charged particle beam writing apparatus includes an irradiation part configured to irradiate a charged particle beam; a first shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the charged particle beam; a deflection part configured to deflect the charged particle beam that has passed through the first shaping aperture member; a second shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the deflected charged particle beam; and a stage on which a target workpiece irradiated with the charged particle beam that has passed through the second shaping aperture member is placed.

Abstract translation: 带电粒子束写入装置包括被配置为照射带电粒子束的照射部分; 在阻挡带电粒子束的区域的两侧上具有通过区域的带电粒子束通过的第一成形孔径构件; 偏转部件，其构造成偏转已经穿过第一成形孔部件的带电粒子束; 具有穿过区域的第二成形孔径构件，所述通过区域被带电粒子束穿过阻挡偏转的带电粒子束的区域的两侧; 以及放置已经通过第二成形孔部件的带电粒子束照射的目标工件的台阶。

公开(公告)号：US20100244029A1

公开(公告)日：2010-09-30

申请号：US12730288

申请日：2010-03-24

Applicant: Shunpei YAMAZAKI ,  Takayuki ABE ,  Hideaki SHISHIDO

Inventor： Shunpei YAMAZAKI ,  Takayuki ABE ,  Hideaki SHISHIDO

IPC: H01L29/786

CPC classification number: H01L29/7869 ,  H01L27/1225 ,  H01L27/3248 ,  H01L29/42376 ,  H01L29/42384 ,  H01L29/78606 ,  H01L29/78645 ,  H01L29/78648

Abstract: The threshold voltage is shifted in a negative or positive direction in some cases by an unspecified factor in a manufacturing process of the thin film transistor. If the amount of shift from 0 V is large, driving voltage is increased, which results in an increase in power consumption of a semiconductor device. Thus, a resin layer having good flatness is formed as a first protective insulating film covering the oxide semiconductor layer, and then a second protective insulating film is formed by a sputtering method or a plasma CVD method under a low power condition over the resin layer. Further, in order to adjust the threshold voltage to a desired value, gate electrodes are provided over and below an oxide semiconductor layer.

Abstract translation: 在薄膜晶体管的制造过程中，阈值电压在负方向或正方向上偏移一些未指定因子。 如果从0V的偏移量大，则驱动电压增加，这导致半导体器件的功耗的增加。 因此，形成具有良好平坦度的树脂层作为覆盖氧化物半导体层的第一保护绝缘膜，然后通过溅射法或等离子体CVD法在低功率条件下在树脂层上形成第二保护绝缘膜。 此外，为了将阈值电压调整为期望值，在氧化物半导体层的上方和下方设置栅电极。