POLYCRYSTALLINE-TYPE SOLAR CELL PANEL AND PROCESS FOR PRODUCTION THEREOF
    1.
    发明申请
    POLYCRYSTALLINE-TYPE SOLAR CELL PANEL AND PROCESS FOR PRODUCTION THEREOF 有权
    多晶型太阳能电池板及其制造方法

    公开(公告)号:US20130081694A1

    公开(公告)日:2013-04-04

    申请号:US13635962

    申请日:2011-06-17

    IPC分类号: H01L31/18 H01L31/0368

    摘要: Disclosed is a polycrystalline-type silicon solar cell which can be produced at low cost by forming a polycrystalline silicon film having a PN junction in a simple manner. Specifically, an amorphous silicon film produced by sputtering using a dopant-containing silicon target is polycrystallized with plasma, and a PN junction is formed in the amorphous silicon film, thereby producing a polycrystalline silicon film having a PN junction. The polycrystalline silicon film having a PN junction is used as a silicon substrate for a polycrystalline-type silicon solar cell. Also disclosed is a technique for producing a dopant-containing silicon target from a silicon ingot.

    摘要翻译: 公开了通过以简单的方式形成具有PN结的多晶硅膜,可以以低成本生产的多晶硅系太阳能电池。 具体地,通过使用含掺杂剂的硅靶溅射制造的非晶硅膜通过等离子体多晶化,并且在非晶硅膜中形成PN结,从而制造具有PN结的多晶硅膜。 具有PN结的多晶硅膜用作多晶硅太阳能电池的硅衬底。 还公开了一种从硅锭生产含掺杂剂的硅靶的技术。

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    2.
    发明申请
    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
    等离子体加工设备和等离子体处理方法

    公开(公告)号:US20120325777A1

    公开(公告)日:2012-12-27

    申请号:US13582557

    申请日:2011-05-11

    IPC分类号: H01L21/465 B44C1/22 C23C16/50

    摘要: A base material is placed on a base material placement face of a base material placement table. An inductively coupled plasma torch unit is structured with a cylindrical chamber structured with a cylinder made of an insulating material and provided with a rectangular slit-like plasma jet port, and lids closing opposing ends of the cylinder, a gas jet port that supplies gas into the cylindrical chamber, and a solenoid coil that generates a high frequency electromagnetic field in the cylindrical chamber. By a high frequency power supply supplying a high frequency power to the solenoid coil, plasma is generated in the cylindrical chamber, and the plasma is emitted from the plasma jet port to the base material. While relatively shifting the plasma torch unit and the base material placement table, a base material surface can be subjected to heat treatment.

    摘要翻译: 基材放置在基材放置台的基材放置面上。 电感耦合等离子体焰炬单元构造为具有由绝缘材料构成的圆柱形腔室,该圆柱形腔体由绝缘材料构成,并设置有矩形裂缝状等离子体喷射口,并且盖住气缸的相对端部,气体喷射口将气体供应到 圆柱形腔室和在圆柱形腔室中产生高频电磁场的螺线管线圈。 通过向螺线管线圈提供高频电力的高频电源,在圆筒形室中产生等离子体,等离子体从等离子体喷射口发射到基体材料。 在相对移动等离子体焰炬单元和基材放置台的同时,可以对基材表面进行热处理。

    PLASMA DOPING METHOD AND APPARATUS
    3.
    发明申请
    PLASMA DOPING METHOD AND APPARATUS 审中-公开
    等离子喷涂方法和装置

    公开(公告)号:US20120186519A1

    公开(公告)日:2012-07-26

    申请号:US13358277

    申请日:2012-01-25

    IPC分类号: C23C16/50

    摘要: A plasma doping method and apparatus in which a prescribed gas is introduced into a vacuum container while being exhausted by a turbomolecular pump as an exhaust apparatus. The pressure in the vacuum container is kept at a prescribed value by a pressure regulating valve. High-frequency electric power of 13.56 MHz is supplied to a coil disposed close to a dielectric window which is opposed to a sample electrode, whereby induction-coupled plasma is generated in the vacuum container. Every time a prescribed number of samples have been processed, a dummy sample is subjected to plasma doping and then to heating. The conditions for processing of a sample are controlled so that the measurement value of the surface sheet resistance becomes equal to a prescribed value, whereby the controllability of the impurity concentration can be increased.

    摘要翻译: 一种等离子体掺杂方法和装置,其中将预定气体通过作为排气装置的涡轮分子泵排出而被引入真空容器中。 通过压力调节阀将真空容器内的压力保持在规定值。 将13.56MHz的高频电力供给到与样品电极相对的电介质窗附近设置的线圈,由此在真空容器内产生感应耦合等离子体。 每当处理规定数量的样品时,将虚拟样品进行等离子体掺杂,然后进行加热。 控制处理样品的条件使得表面薄层电阻的测量值等于规定值,从而可以提高杂质浓度的可控性。

    PLASMA DOPING METHOD AND APPARATUS THEREOF
    4.
    发明申请
    PLASMA DOPING METHOD AND APPARATUS THEREOF 有权
    等离子喷涂方法及其设备

    公开(公告)号:US20120115317A1

    公开(公告)日:2012-05-10

    申请号:US13291186

    申请日:2011-11-08

    摘要: In a plasma torch unit, a conductor rod having a spiral shape is disposed inside a quartz pipe having a surface coated with boron glass, and a brass block is disposed on the periphery thereof. While a gas is being supplied into a cylindrical chamber, a high-frequency power is supplied to the conductor rod and a plasma is generated in the cylindrical chamber, so that a base material is irradiated with the plasma.

    摘要翻译: 在等离子体焰炬单元中,具有螺旋形状的导体棒设置在具有硼玻璃的表面的石英管的内部,并且在其周边设置有黄铜块。 当气体被供应到圆柱形腔室中时,向导体杆供应高频电力,并且在圆柱形腔室中产生等离子体,使得等离子体照射基材。

    METHOD FOR PRODUCING PLASMA DISPLAY PANEL
    5.
    发明申请
    METHOD FOR PRODUCING PLASMA DISPLAY PANEL 审中-公开
    生产等离子显示面板的方法

    公开(公告)号:US20110171871A1

    公开(公告)日:2011-07-14

    申请号:US13004361

    申请日:2011-01-11

    IPC分类号: H01J9/20

    CPC分类号: H01J9/38 H01J9/261 H01J11/12

    摘要: A method for producing a plasma display panel includes: (i) providing a front panel and a rear panel, the front panel being a panel wherein an electrode A, a dielectric layer A and a protective layer are formed on a substrate A, and the rear panel being a panel wherein an electrode B, a dielectric layer B, a barrier rib and a phosphor layer are formed on a substrate B; (ii) supplying a glass frit material onto a peripheral region of the substrate A or B to form a glass frit sealing member; (iii) opposing the front and rear panels with each other such that the glass frit sealing member is interposed therebetween; and (iv) heating the opposed front and rear panels to reach a softening point of the glass frit sealing member or a higher temperature than the softening point, while supplying a cleaning gas into a space formed between the opposed front and rear panels. Prior to the heating of step (iv), a gas is introduced into a space formed between the opposed front and rear panels, or a gas is exhausted from a space formed between the opposed front and rear panels.

    摘要翻译: 一种等离子体显示面板的制造方法包括:(i)提供前面板和后面板,前面板是在基板A上形成有电极A,电介质层A和保护层的面板, 后面板是在基板B上形成电极B,电介质层B,隔壁和荧光体层的面板; (ii)将玻璃料材料供应到基板A或B的周边区域上以形成玻璃料密封件; (iii)使所述前面板和所述后面板彼此相对,使得所述玻璃料密封构件插入其间; 以及(iv)将相对的前后板加热到达玻璃料密封件的软化点或比软化点高的温度,同时将清洁气体供应到形成在相对的前板和后板之间的空间中。 在步骤(iv)的加热之前,将气体引入形成在相对的前后面板之间的空间中,或者从形成在相对的前后面板之间的空间排出气体。

    METHOD FOR PRODUCING PLASMA DISPLAY PANEL
    6.
    发明申请
    METHOD FOR PRODUCING PLASMA DISPLAY PANEL 审中-公开
    生产等离子显示面板的方法

    公开(公告)号:US20100291829A1

    公开(公告)日:2010-11-18

    申请号:US12778383

    申请日:2010-05-12

    IPC分类号: H01J9/26

    摘要: A method for producing a plasma display panel, the method comprising: (i) preparing a front panel and a rear panel, the front panel being a panel wherein an electrode A, a dielectric layer A and a protective layer are formed on a substrate A, and the rear panel being a panel wherein an electrode B, a dielectric layer B, a partition wall and a phosphor layer are formed on a substrate B; (ii) applying a glass frit material onto a peripheral region of the substrate A or B to form an annular glass frit sealing portion; (iii) opposing the front and rear panels with each other such that the annular glass frit sealing portion is interposed therebetween; (iv) supplying a dry gas into a space formed between the opposed front and rear panels; and (v) melting the annular glass frit sealing portion to cause the front and rear panels to be sealed wherein, in the step (i), the protective layer of the front panel is made from a metal oxide comprising at least two oxides selected from among magnesium oxide, calcium oxide, strontium oxide and barium oxide, said metal oxide having a peak between the minimum diffraction angle and the maximum diffraction angle which are selected among the diffraction angles given by respective ones of said at least two oxides in a specific orientation plane in X-ray diffraction analysis; and the step (v) is performed together with the step (iv) wherein the dry gas is supplied such that the front and rear panels do not deform until the point in time when a softening point of the annular glass frit sealing portion is reached.

    摘要翻译: 一种等离子体显示面板的制造方法,该方法包括:(i)制备前面板和后面板,前面板是面板,其中在基板A上形成电极A,电介质层A和保护层 并且后面板是在基板B上形成电极B,电介质层B,隔壁和荧光体层的面板; (ii)将玻璃料材料施加到基板A或B的周边区域上以形成环形玻璃料密封部分; (iii)将前后面板彼此相对,使得环形玻璃料密封部分插入其间; (iv)将干燥气体供应到形成在相对的前后面板之间的空间中; 和(v)熔化环形玻璃料密封部分以使前面板和后面板被密封,其中在步骤(i)中,前面板的保护层由金属氧化物制成,该金属氧化物包括至少两种选自 在氧化镁,氧化钙,氧化锶和氧化钡中,所述金属氧化物具有在最小衍射角和最大衍射角之间的峰,所述最小衍射角和最大衍射角在从特定取向的所述至少两种氧化物中的相应的衍射角度 X射线衍射分析; 并且步骤(v)与步骤(iv)一起进行,其中供给干燥气体使得前面板和后面板不变形直到达到环形玻璃料密封部分的软化点的时间点。

    Plasma display panel and process for producing the plasma display panel
    7.
    发明授权
    Plasma display panel and process for producing the plasma display panel 失效
    等离子显示面板和等离子体显示面板的制造工艺

    公开(公告)号:US07690961B2

    公开(公告)日:2010-04-06

    申请号:US11802862

    申请日:2007-05-25

    IPC分类号: H01J9/00

    摘要: A fluorine-containing precoating is formed to cover a phosphor particle by, for example, a physical vapor deposition of a fluoride. Then, a fluorine-containing coating covering the phosphor particle is formed by supplying fluorine into the precoating. This obtained phosphor particle with the coating is applied in the form of a paste to a substrate on each electrode between two adjacent ribs to form a phosphor layer including phosphor particles between the ribs on the substrate. The substrate is positioned with respect to another substrate having electrodes thereon to form discharge spaces between the substrates. The discharge spaces are filled with a discharge gas to produce a plasma display panel.

    摘要翻译: 通过例如氟化物的物理气相沉积,形成含氟预涂层以覆盖磷光体颗粒。 然后,通过向预涂层中供给氟而形成覆盖荧光体颗粒的含氟涂层。 将得到的具有涂层的荧光体颗粒以膏状施加到两个相邻肋之间的每个电极上的基板上,以在基板上的肋之间形成包括磷光体颗粒的荧光体层。 基板相对于其上具有电极的另一基板定位,以在基板之间形成放电空间。 放电空间填充有放电气体以产生等离子体显示面板。

    Plasma processing apparatus and method
    8.
    发明授权
    Plasma processing apparatus and method 失效
    等离子体处理装置及方法

    公开(公告)号:US07686971B2

    公开(公告)日:2010-03-30

    申请号:US11283752

    申请日:2005-11-22

    IPC分类号: B44C1/22 C23C16/00 H01L21/00

    CPC分类号: H01J37/3244

    摘要: A plasma source includes a gas flow channel formed therein and an electrode which is fed with electric power or grounded to be maintained at a controlled electric potential and a surface of the plasma source including an opening portion of a first gas ejecting port can be placed in parallel to a position at which a to-be-processed object can be placed. The plasma source is connected to a first gas supplying device through a gas supplying port 4 and has a multi-layer construction that is constituted from two or more layers. Gas flow channels within the multi-layer construction include buffer spaces and at least one space cross-sectional area parallel to the opening cross-sectional area of the first gas ejecting ports, out of the cross-sectional areas of the buffer spaces, is greater than the opening cross-sectional area of the first gas ejecting ports.

    摘要翻译: 等离子体源包括形成在其中的气体流路和供给电力或接地以保持在受控电位的电极,并且包括第一气体排出口的开口部分的等离子体源的表面可以放置在 平行于可以放置待处理对象的位置。 等离子体源通过气体供给口4与第一气体供给装置连接,具有由两层以上构成的多层结构。 多层结构内的气流通道包括缓冲空间,并且平缓于第一气体喷射口的开口横截面积的至少一个空间横截面积在缓冲空间的横截面积之外更大 比第一气体喷出口的开口横截面积大。

    Method of controlling impurity doping and impurity doping apparatus
    9.
    发明授权
    Method of controlling impurity doping and impurity doping apparatus 失效
    控制杂质掺杂和杂质掺杂装置的方法

    公开(公告)号:US07666770B2

    公开(公告)日:2010-02-23

    申请号:US10570787

    申请日:2004-09-06

    IPC分类号: H01L21/42

    CPC分类号: H01L21/265

    摘要: A method is provided for controlling a dose amount of dopant to be doped into an object to be processed in plasma doping. According to the method, the doping control is formed of the following processes: determining the temperature of the object, the amount of ions having dopant in plasma that collide with the object, and types of gases in plasma during doping; calculating a dose amount by neutral gas according to the temperature of the object, and a dose amount by ions from the determined amount of ions containing dopant that collide with the object; and carrying out doping so that the sum of the dose amount by neutral gas and the dose amount by ions equal to a predetermined dose amount.

    摘要翻译: 提供了一种方法,用于控制掺杂到等离子体掺杂中待处理物体中的掺杂剂的剂量。 根据该方法,掺杂控制由以下处理形成:确定物体的温度,与物体相撞的等离子体中具有掺杂剂的离子的量以及掺杂期间的等离子体中的气体的种类; 根据物体的温度由中性气体计算剂量,以及从确定量的与物体碰撞的掺杂剂的离子的离子的剂量; 并进行掺杂,使得中性气体的剂量量与离子的剂量之和等于预定剂量的量。

    PLASMA DISPLAY PANEL AND MANUFACTURING METHOD THEREOF
    10.
    发明申请
    PLASMA DISPLAY PANEL AND MANUFACTURING METHOD THEREOF 失效
    等离子显示面板及其制造方法

    公开(公告)号:US20090267511A1

    公开(公告)日:2009-10-29

    申请号:US12093294

    申请日:2007-10-29

    IPC分类号: H01J17/49 H01J9/26

    摘要: A back face panel in a plasma display panel is provided with barrier-rib portions, fluorescent barrier-rib portions including a mixed material of a barrier-rib material and a phosphor material and formed on side faces thereof, and a phosphor portion including the phosphor material and formed in a manner so as to cover the fluorescent barrier-rib portions, and each of barrier ribs is formed by each barrier-rib portion and each fluorescent barrier-rib portion, while a phosphor layer is formed by each phosphor portion and each fluorescent barrier-rib portion.

    摘要翻译: 在等离子体显示面板中的背面板设置有隔离肋部分,荧光屏障部分包括阻挡肋材料和荧光体材料的混合材料并形成在其侧面上,荧光体部分包括磷光体 并且以覆盖荧光阻挡肋部分的方式形成,并且每个阻挡肋部分和每个荧光阻挡肋部分形成每个阻挡肋,同时由每个荧光体部分和每个荧光体部分形成荧光体层 荧光屏障部分。