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公开(公告)号:US20240072756A1
公开(公告)日:2024-02-29
申请号:US17900599
申请日:2022-08-31
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Shaoping TANG , Keegan MARTIN , Ting-Ta YEN
CPC classification number: H03H9/02015 , H03H9/171
Abstract: A BAW resonator includes first and second electrodes located over a substrate. A piezoelectric layer is located between the first and second electrodes. A guard ring is located between the piezoelectric layer and the second electrode, and is spaced apart from a perimeter of the electrode. The guard ring has a width in a range from 2.5 μm to 3.5 μm.
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公开(公告)号:US20150187938A1
公开(公告)日:2015-07-02
申请号:US14576693
申请日:2014-12-19
Applicant: Texas Instruments Incorporated
Inventor: Shaoping TANG , Amitava CHATTERJEE , Imran Mahmood KHAN , Kaiping LIU
IPC: H01L29/78 , H01L27/088 , H01L29/66 , H01L21/3213 , H01L21/8238 , H01L21/8234 , H01L27/092 , H01L21/265
CPC classification number: H01L29/7836 , H01L21/2652 , H01L21/26586 , H01L21/28105 , H01L21/32133 , H01L21/823418 , H01L21/823807 , H01L21/823814 , H01L21/82385 , H01L21/823892 , H01L27/0617 , H01L27/0922 , H01L27/0928 , H01L29/0847 , H01L29/105 , H01L29/1083 , H01L29/1095 , H01L29/4933 , H01L29/4983 , H01L29/665 , H01L29/66537 , H01L29/66575 , H01L29/66659 , H01L29/7833 , H01L29/7835
Abstract: An integrated circuit and method includes a DEMOS transistor with improved CHC reliability that has a lower resistance surface channel under the DEMOS gate that transitions to a lower resistance subsurface channel under the drain edge of the DEMOS transistor gate.
Abstract translation: 集成电路和方法包括具有改进的CHC可靠性的DEMOS晶体管,其在DEMOS栅极下具有较低电阻表面沟道,其转变到DEMOS晶体管栅极的漏极边缘下方的较低电阻的地下通道。
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公开(公告)号:US20160035890A1
公开(公告)日:2016-02-04
申请号:US14885637
申请日:2015-10-16
Applicant: Texas Instruments Incorporated
Inventor: Shaoping TANG , Amitava CHATTERJEE , Imran Mahmood KHAN , Kaiping LIU
IPC: H01L29/78 , H01L21/8234 , H01L21/8238 , H01L29/08 , H01L27/06 , H01L29/66 , H01L29/10 , H01L21/265 , H01L27/092
CPC classification number: H01L29/7836 , H01L21/2652 , H01L21/26586 , H01L21/28105 , H01L21/32133 , H01L21/823418 , H01L21/823807 , H01L21/823814 , H01L21/82385 , H01L21/823892 , H01L27/0617 , H01L27/0922 , H01L27/0928 , H01L29/0847 , H01L29/105 , H01L29/1083 , H01L29/1095 , H01L29/4933 , H01L29/4983 , H01L29/665 , H01L29/66537 , H01L29/66575 , H01L29/66659 , H01L29/7833 , H01L29/7835
Abstract: An integrated circuit and method includes a DEMOS transistor with improved CHC reliability that has a lower resistance surface channel under the DEMOS gate that transitions to a lower resistance subsurface channel under the drain edge of the DEMOS transistor gate.
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