High efficiency photovoltaic device
    1.
    发明授权
    High efficiency photovoltaic device 失效
    高效光伏器件

    公开(公告)号:US5977476A

    公开(公告)日:1999-11-02

    申请号:US731497

    申请日:1996-10-16

    摘要: An N-I-P type photovoltaic device includes a multi-layered body of N-doped semiconductor material which has an amorphous, N doped layer in contact with the amorphous body of intrinsic semiconductor material, and a microcrystalline, N doped layer overlying the amorphous, N doped material. A tandem device comprising stacked N-I-P cells may further include a second amorphous, N doped layer interposed between the microcrystalline, N doped layer and a microcrystalline P doped layer. Photovoltaic devices thus configured manifest improved performance, particularly when configured as tandem devices.

    摘要翻译: NIP型光伏器件包括N掺杂半导体材料的多层体,其具有与本征半导体材料的非晶体体接触的非晶态N掺杂层,以及覆盖非晶N掺杂材料的微晶N掺杂层 。 包括堆叠的N-I-P单元的串联装置还可以包括介于微晶N掺杂层和微晶P掺杂层之间的第二非晶N掺杂层。 如此配置的光伏设备显示出改善的性能,特别是当配置为串联设备时。

    Optically enhanced photovoltaic back reflector
    5.
    发明授权
    Optically enhanced photovoltaic back reflector 失效
    光学增强型光反射器

    公开(公告)号:US5569332A

    公开(公告)日:1996-10-29

    申请号:US511887

    申请日:1995-08-07

    摘要: An optically enhanced back reflector for a photovoltaic device includes a back reflector layer of aluminum having a multi-layered, reflectivity enhancement member deposed thereon. The multi-layer enhancement member includes at least one pair of first and second layers, the first layer having a low index of refraction and the second layer having a high index of refraction. A layer of transmissive conductive oxide is disposed between the optically enhanced back reflector and the photovoltaic device.

    摘要翻译: 用于光伏器件的光学增强后反射器包括铝的后反射器层,其具有放置在其上的多层反射增强部件。 多层增强构件包括至少一对第一层和第二层,第一层具有低折射率,第二层具有高折射率。 透光导电氧化物层设置在光学增强后反射器和光电器件之间。

    Method for depositing high-quality microcrystalline semiconductor materials
    7.
    发明授权
    Method for depositing high-quality microcrystalline semiconductor materials 失效
    沉积高品质微晶半导体材料的方法

    公开(公告)号:US07902049B2

    公开(公告)日:2011-03-08

    申请号:US10765435

    申请日:2004-01-27

    IPC分类号: H01L21/00

    摘要: A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

    摘要翻译: 微晶半导体材料层的等离子体沉积的方法是通过对包含半导体材料的前体的工艺气体和具有电磁能量的稀释剂进行激励,从而产生等离子体来进行的。 等离子体将一层微晶半导体材料沉积到基底上。 工艺气体中稀释剂的浓度随着沉积的微晶半导体材料层的厚度而变化。 还公开了该方法用于制备N-I-P型光伏器件的用途。