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公开(公告)号：US11904521B2
公开(公告)日：2024-02-20
申请号：US15715442
申请日：2017-09-26
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Daiyu Okafuji , Hiroyuki Yamazaki , Masao Ando , Masaki Takeuchi
CPC classification number: B29C59/026 , B24B9/065 , B29C33/3842 , G03F7/0002 , B29K2909/08
Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
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公开(公告)号：US11591260B2
公开(公告)日：2023-02-28
申请号：US16933343
申请日：2020-07-20
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Yoko Ishitsuka , Atsushi Watabe , Daijitsu Harada , Masaki Takeuchi
Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.
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公开(公告)号：US11424389B2
公开(公告)日：2022-08-23
申请号：US16518263
申请日：2019-07-22
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Harunobu Matsui , Daijitsu Harada , Daiyu Okafuji , Hiroyuki Yamazaki , Masaki Takeuchi
Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.
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公开(公告)号：US20220091501A1
公开(公告)日：2022-03-24
申请号：US17030845
申请日：2020-09-24
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Hiroyuki Yamazaki , Masao Ando , Daiyu Okafuji , Masaki Takeuchi
Abstract: In an imprint mold-forming synthetic quartz glass substrate (1) of rectangular shape having dimensions L1 and L2 with L1≥L2, a circular region is delineated on the substrate back surface by a circle of radius R with L2−2R≥10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than −(2R/100,000×1) μm.
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公开(公告)号：US10737966B2
公开(公告)日：2020-08-11
申请号：US15452910
申请日：2017-03-08
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Yoko Ishitsuka , Atsushi Watabe , Daijitsu Harada , Masaki Takeuchi
Abstract: Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
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Patent Agency Ranking
公开(公告)号：US10680139B2
公开(公告)日：2020-06-09
申请号：US15667249
申请日：2017-08-02
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Shuhei Ueda , Masaki Takeuchi , Harunobu Matsui
Abstract: An optical device package comprising a receptacle, an optical device received therein, and a window member disposed forward of the receptacle in a light emitting direction of the optical device. The window member is a member of synthetic quartz glass having front and back surfaces, at least one of the front and back surfaces being a rough surface.
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公开(公告)号：US10646976B2
公开(公告)日：2020-05-12
申请号：US15682821
申请日：2017-08-22
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor： Yoko Ishitsuka , Atsushi Watabe , Masaki Takeuchi
Abstract: There is furnished a working tool comprising a rotating shaft (6), a polishing plate (3) mounted on the shaft, an expandable elastomer sheet (4) attached to the polishing plate (3), an abrasive cloth (5) attached to the elastomer sheet (4), and means for pressing the elastomer sheet (4) at a plurality of positions under respective predetermined different pressures such that a lower surface of the abrasive cloth (5) is deformed to the desired inverted convex shape in accordance with differences of pressing force applied to the elastomer sheet (4) at the plurality of positions. A substrate is produced by bringing the inverted convexly deformed surface of the abrasive cloth (5) in contact with a substrate stock, and rotating and moving the working tool for polishing the substrate over a selected area.
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公开(公告)号：US09599746B2
公开(公告)日：2017-03-21
申请号：US14645908
申请日：2015-03-12
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor： Shuhei Ueda , Masaki Takeuchi
CPC classification number: G01V8/12 , B24B37/042 , B24B49/12 , C03C15/00 , C03C17/09 , C03C17/245 , C03C23/007 , C03C23/0075 , C03C2204/08 , C03C2217/252 , C03C2217/258 , C03C2217/28 , C03C2218/152 , C23C16/0227 , C23C16/402
Abstract: A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.
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公开(公告)号：US09505166B2
公开(公告)日：2016-11-29
申请号：US14068983
申请日：2013-10-31
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor： Daijitsu Harada , Daiyu Okafuji , Hiroyuki Yamazaki , Masaki Takeuchi
CPC classification number: B29C59/022 , B29C59/002 , B29C59/026 , B29C59/16 , C03C15/02 , G03F1/14 , G03F1/60 , G03F7/0002
Abstract: A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.
Abstract translation: 矩形基板在设置有拓扑图案之后用作模具。 基板具有A侧和B侧相对的表面，A侧表面设置有拓扑图案。 A侧表面包括具有高达350nm的平坦度的1至50mm乘1至50mm的中心矩形区域。 使用成型基板防止在成型基板上形成图案的步骤与转印步骤之间发生图案错位或图案错误。 转移精细尺寸和复杂图案是可能的。
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公开(公告)号：US12109734B2
公开(公告)日：2024-10-08
申请号：US17030813
申请日：2020-09-24
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Hiroyuki Yamazaki , Daiyu Okafuji , Masaki Takeuchi
IPC: B29C33/38 , G03F7/00 , H01L21/027
CPC classification number: B29C33/3842 , G03F7/0002 , H01L21/0271
Abstract: An imprint mold-forming substrate is manufactured by providing a starting imprint mold-forming substrate (1) having a patterned portion (2) and a non-patterned portion (5), providing a table (3) having a recess (4), bonding the substrate (1) to the table (3) such that the patterned portion (2) is received in the recess (4) of the table to define a space region (7) between the patterned portion (2) and the table (3) such that the patterned portion is not in direct contact with the table, and performing contour machining on the substrate (1) secured to the table (3).
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