公开(公告)号：US07217952B2

公开(公告)日：2007-05-15

申请号：US11221773

申请日：2005-09-09

申请人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

发明人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L29/04

CPC分类号： H01L21/02672 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/02609 ,  H01L21/2026 ,  H01L21/6708 ,  H01L21/67167 ,  H01L21/67213 ,  H01L29/66757 ,  H01L29/78675

摘要： A technique for manufacturing TFTs having little dispersion in their electrical characteristics is provided. Contamination of a semiconductor film is reduced by performing oxidation processing having an organic matter removing effect, forming a clean oxide film, after removing a natural oxide film formed on a semiconductor film surface. TFTs having little dispersion in their electrical characteristics can be obtained by using the semiconductor film thus obtained in active layers of the TFTs, and the electrical properties can be improved. In addition, deterioration in productivity and throughput can be reduced to a minimum by using a semiconductor manufacturing apparatus of the present invention.

摘要翻译： 提供了一种用于制造其电特性几乎没有偏差的TFT的技术。 在除去形成在半导体膜表面上的自然氧化物膜之后，通过进行具有有机物去除效果的氧化处理，形成清洁的氧化物膜来减少半导体膜的污染。 通过使用在TFT的有源层中获得的半导体膜，可以获得其电特性几乎没有色散的TFT，并且可以提高电性能。 此外，通过使用本发明的半导体制造装置，可以将生产率和生产量的劣化降低到最小。

公开(公告)号：US07087504B2

公开(公告)日：2006-08-08

申请号：US10133588

申请日：2002-04-29

申请人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

发明人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L21/20

CPC分类号： H01L21/02672 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/02609 ,  H01L21/2026 ,  H01L21/6708 ,  H01L21/67167 ,  H01L21/67213 ,  H01L29/66757 ,  H01L29/78675

摘要： A technique for manufacturing TFTs having little dispersion in their electrical characteristics is provided. Contamination of a semiconductor film is reduced by performing oxidation processing having an organic matter removing effect, forming a clean oxide film, after removing a natural oxide film formed on a semiconductor film surface. TFTs having little dispersion in their electrical characteristics can be obtained by using the semiconductor film thus obtained in active layers of the TFTs, and the electrical properties can be improved. In addition, deterioration in productivity and throughput can be reduced to a minimum by using a semiconductor manufacturing apparatus of the present invention.

摘要翻译： 提供了一种用于制造其电特性几乎没有偏差的TFT的技术。 在除去形成在半导体膜表面上的自然氧化物膜之后，通过进行具有有机物去除效果的氧化处理，形成清洁的氧化物膜来减少半导体膜的污染。 通过使用在TFT的有源层中获得的半导体膜，可以获得其电特性几乎没有色散的TFT，并且可以提高电性能。 此外，通过使用本发明的半导体制造装置，可以将生产率和生产量的劣化降低到最小。

公开(公告)号：US20060009015A1

公开(公告)日：2006-01-12

申请号：US11221773

申请日：2005-09-09

申请人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

发明人： Setsuo Nakajima ,  Aiko Shiga ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L21/20 ,  H01L21/36

CPC分类号： H01L21/02672 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/02609 ,  H01L21/2026 ,  H01L21/6708 ,  H01L21/67167 ,  H01L21/67213 ,  H01L29/66757 ,  H01L29/78675

摘要： A technique for manufacturing TFTs having little dispersion in their electrical characteristics is provided. Contamination of a semiconductor film is reduced by performing oxidation processing having an organic matter removing effect, forming a clean oxide film, after removing a natural oxide film formed on a semiconductor film surface. TFTs having little dispersion in their electrical characteristics can be obtained by using the semiconductor film thus obtained in active layers of the TFTs, and the electrical properties can be improved. In addition, deterioration in productivity and throughput can be reduced to a minimum by using a semiconductor manufacturing apparatus of the present invention.

公开(公告)号：US07015079B2

公开(公告)日：2006-03-21

申请号：US10771404

申请日：2004-02-05

申请人： Hidekazu Miyairi ,  Aiko Shiga ,  Katsumi Nomura ,  Naoki Makita ,  Takuya Matsuo

发明人： Hidekazu Miyairi ,  Aiko Shiga ,  Katsumi Nomura ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L21/00 ,  H01L21/84 ,  H01L21/20 ,  H01L21/36

CPC分类号： H01L27/12 ,  G02F1/1362 ,  H01L21/0237 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02672 ,  H01L21/02686 ,  H01L27/1277 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78675

摘要： By adding a novel improvement to the technique disclosed in JP 8-78329 A, a manufacturing method in which film characteristics of a semiconductor film having a crystalline structure are improved is provided. In addition, a TFT having superior TFT characteristics, such as field effect mobility, which uses the semiconductor film as an active layer, and a method of manufacturing the TFT, are also provided. A metallic element which promotes the crystallization of silicon is added to a semiconductor film having an amorphous structure and an oxygen concentration within the film of less than 5×1018/cm3. The semiconductor film having an amorphous structure is then heat-treated, forming a semiconductor film having a crystalline structure. Subsequently, an oxide film on the surface is removed. Oxygen is introduced to the semiconductor film having a crystalline structure, and processing is performed such that the concentration of oxygen within the film is from 5×1018/cm3 to 1×1021/cm3. After removing an oxide film on the surface of the semiconductor film, the semiconductor film surface is leveled by irradiating laser light under an inert gas atmosphere or in a vacuum.

摘要翻译： 通过添加对JP 8-78329A中公开的技术的新颖改进，提供了具有改善晶体结构的半导体膜的膜特性的制造方法。 此外，还提供了具有优异TFT特性的TFT，例如使用半导体膜作为有源层的场效应迁移率，以及TFT的制造方法。 将促进硅结晶的金属元素添加到半导体膜中，半导体膜具有薄膜内的非晶结构和氧浓度小于5×10 18 / cm 3。 然后对具有非晶结构的半导体膜进行热处理，形成具有晶体结构的半导体膜。 随后，除去表面上的氧化物膜。 将氧气引入到具有晶体结构的半导体膜中，并且进行处理，使得膜内的氧浓度为5×10 18 / cm 3至1×10 6 > 21 3/3。 在去除半导体膜表面上的氧化物膜之后，通过在惰性气体气氛或真空中照射激光来平整半导体膜表面。

公开(公告)号：US06777713B2

公开(公告)日：2004-08-17

申请号：US10265634

申请日：2002-10-08

申请人： Hidekazu Miyairi ,  Aiko Shiga ,  Katsumi Nomura ,  Naoki Makita ,  Takuya Matsuo

发明人： Hidekazu Miyairi ,  Aiko Shiga ,  Katsumi Nomura ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L2900

CPC分类号： H01L27/12 ,  G02F1/1362 ,  H01L21/0237 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02672 ,  H01L21/02686 ,  H01L27/1277 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78675

摘要： By adding a novel improvement to the technique disclosed in JP 8-78329 A, a manufacturing method in which film characteristics of a semiconductor film having a crystalline structure are improved is provided. In addition, a TFT having superior TFT characteristics, such as field effect mobility, which uses the semiconductor film as an active layer, and a method of manufacturing the TFT, are also provided. A metallic element which promotes the crystallization of silicon is added to a semiconductor film having an amorphous structure and an oxygen concentration within the film of less than 5×1018/cm3. The semiconductor film having an amorphous structure is then heat-treated, forming a semiconductor film having a crystalline structure. Subsequently, an oxide film on the surface is removed. Oxygen is introduced to the semiconductor film having a crystalline structure, and processing is performed such that the concentration of oxygen within the film is from 5×1018/cm3 to 1×1021/cm3. After removing an oxide film on the surface of the semiconductor film, the semiconductor film surface is leveled by irradiating laser light under an inert gas atmosphere or in a vacuum.

摘要翻译： 通过添加对JP 8-78329A中公开的技术的新颖改进，提供了具有改善晶体结构的半导体膜的膜特性的制造方法。 此外，还提供了具有优异TFT特性的TFT，例如使用半导体膜作为有源层的场效应迁移率，以及TFT的制造方法。 将促进硅结晶的金属元素加入到膜内的非晶结构和氧浓度小于5×10 18 / cm 3的半导体膜中。 然后对具有非晶结构的半导体膜进行热处理，形成具有晶体结构的半导体膜。 随后，除去表面上的氧化物膜。 将氧气引入具有晶体结构的半导体膜，并且进行处理，使得膜内的氧浓度为5×10 18 / cm 3至1×10 21 / cm 3。 在去除半导体膜表面上的氧化物膜之后，通过在惰性气体气氛或真空中照射激光来平整半导体膜表面。

公开(公告)号：US06727124B2

公开(公告)日：2004-04-27

申请号：US10000238

申请日：2001-11-02

申请人： Setsuo Nakajima ,  Hideto Ohnuma ,  Naoki Makita ,  Takuya Matsuo

发明人： Setsuo Nakajima ,  Hideto Ohnuma ,  Naoki Makita ,  Takuya Matsuo

IPC分类号： H01L2184

CPC分类号： H01L27/1214 ,  G02F1/13454 ,  H01L27/124 ,  H01L27/127 ,  H01L27/1277 ,  H01L29/42384 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78675 ,  H01L2029/7863

摘要： A catalytic element for promoting crystallization of an amorphous silicon film is efficiently gettered to provide a highly reliable TFT, and an electro-optical device using the TFT and a method of manufacturing the electro-optical device are provided. The electro-optical device has an n-channel TFT and a p-channel TFT. A semiconductor layer of the p-channel TFT has a channel forming region (13), a region (11) containing an n-type impurity element and a p-type impurity element, and a region (12) containing only a p-type impurity element. In the p-channel TFT, a wiring line for electrically connecting the TFTs is connected to the region (12) containing only a p-type impurity element. The region containing an n-type impurity element in the p-channel TFT is narrower than a region doped with an n-type impurity element in a semiconductor layer of the n-channel TFT.

摘要翻译： 提供了一种用于促进非晶硅膜的结晶的催化元件，以提供高度可靠的TFT，并且提供了使用该TFT的电光器件和制造该电光器件的方法。 电光装置具有n沟道TFT和p沟道TFT。 p沟道TFT的半导体层具有沟道形成区域（13），包含n型杂质元素和p型杂质元素的区域（11）和仅包含p型杂质元素的区域（12） 杂质元素。 在p沟道TFT中，用于电连接TFT的布线与仅包含p型杂质元素的区域（12）连接。 在p沟道TFT中含有n型杂质元素的区域比n沟道TFT的半导体层中掺杂有n型杂质元素的区域窄。

公开(公告)号：US06835986B2

公开(公告)日：2004-12-28

申请号：US09822462

申请日：2001-04-02

申请人： Setsuo Nakajima ,  Naoki Makita

发明人： Setsuo Nakajima ,  Naoki Makita

IPC分类号： H01L2976

CPC分类号： G02F1/1368 ,  H01L27/1277 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78627

摘要： To manufacture a liquid crystal display device with high thin film transistor accumulation, high productivity and high reliability by efficiently gettering a catalyst element, which promotes crystallization of an amorphous silicon film, from a channel region. In order to solve the above object, a step of providing a gettering sink on the outside of a p-channel thin film transistor region, and a step of removing a region provided on the outside of the thin film transistor region within the region where the catalyst element is gettered in a self-aligning manner by a source wiring or a drain wiring, are combined.

摘要翻译： 通过从沟道区域有效地吸收促进非晶硅膜结晶的催化剂元件，制造具有高薄膜晶体管积聚的液晶显示装置，高生产率和高可靠性。 为了解决上述目的，提供了一种在p沟道薄膜晶体管区域的外部设置吸收阱的步骤，以及在该区域内去除设置在薄膜晶体管区域的外部的区域的步骤， 催化剂元件通过源极布线或漏极布线以自对准的方式被吸收。

公开(公告)号：US06998641B2

公开(公告)日：2006-02-14

申请号：US10183056

申请日：2002-06-27

申请人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

发明人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

IPC分类号： H01L31/112

CPC分类号： H01L29/66757 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L27/1277 ,  H01L29/78612 ,  H01L29/78621

摘要： In order to solve the problem of inferior gettering efficiency in the n-channel TFT, the present invention provides at an end of the source/drain regions of the n-channel TFT a highly efficient gettering region that contains both of an n-type impurity and a p-type impurity with the concentration of the p-type impurity set higher than the concentration of the n-type impurity.

摘要翻译： 为了解决在n沟道TFT中吸杂效率差的问题，本发明在n沟道TFT的源极/漏极区域的末端提供了一种高效率的吸杂区域，其包含n型杂质 以及p型杂质浓度高于n型杂质浓度的p型杂质。

公开(公告)号：US20050170573A1

公开(公告)日：2005-08-04

申请号：US11088888

申请日：2005-03-25

申请人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

发明人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

IPC分类号： G02F1/1368 ,  H01L21/20 ,  H01L21/322 ,  H01L21/336 ,  H01L21/77 ,  H01L27/08 ,  H01L29/786 ,  H01L21/00 ,  H01L21/84

CPC分类号： H01L29/66757 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L27/1277 ,  H01L29/78612 ,  H01L29/78621

摘要： Problems in prior art regarding an n-channel TFT in the source/drain gettering method are solved. In the n-channel TFT, its source/drain regions contain only an n-type impurity. Therefore, compared to a p-channel TFT whose source/drain regions contain an n-type impurity and a higher concentration of p-type impurity, the gettering efficiency is inferior in a channel region of the n-channel transistor. Accordingly, the problem of inferior gettering efficiency in the n-channel TFT can be solved by providing at an end of its source/drain regions a highly efficient gettering region that contains an n-type impurity and a p-type impurity both with the concentration of the p-type impurity set higher than the concentration of the n-type impurity.

摘要翻译： 解决了在源极/漏极吸杂方法中关于n沟道TFT的现有技术中的问题。 在n沟道TFT中，其源极/漏极区仅包含n型杂质。 因此，与源极/漏极区域包含n型杂质和较高浓度的p型杂质的p沟道TFT相比，n沟道晶体管的沟道区域的吸杂效率较差。 因此，可以通过在其源极/漏极区域的末端设置包含n型杂质的高效吸气区域和浓度为p型的p型杂质来解决n沟道TFT的吸杂效率差的问题 的p型杂质的浓度高于n型杂质浓度。

公开(公告)号：US07625786B2

公开(公告)日：2009-12-01

申请号：US11088888

申请日：2005-03-25

申请人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

发明人： Naoki Makita ,  Misako Nakazawa ,  Hideto Ohnuma ,  Takuya Matsuo

IPC分类号： H01L21/84

CPC分类号： H01L29/66757 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L27/1277 ,  H01L29/78612 ,  H01L29/78621

摘要： Problems in prior art regarding an n-channel TFT in the source/drain gettering method are solved. In the n-channel TFT, its source/drain regions contain only an n-type impurity. Therefore, compared to a p-channel TFT whose source/drain regions contain an n-type impurity and a higher concentration of p-type impurity, the gettering efficiency is inferior in a channel region of the n-channel transistor. Accordingly, the problem of inferior gettering efficiency in the n-channel TFT can be solved by providing at an end of its source/drain regions a highly efficient gettering region that contains an n-type impurity and a p-type impurity both with the concentration of the p-type impurity set higher than the concentration of the n-type impurity.

摘要翻译： 解决了在源极/漏极吸杂方法中关于n沟道TFT的现有技术中的问题。 在n沟道TFT中，其源极/漏极区仅包含n型杂质。 因此，与源极/漏极区域包含n型杂质和较高浓度的p型杂质的p沟道TFT相比，n沟道晶体管的沟道区域的吸杂效率较差。 因此，可以通过在其源极/漏极区域的末端设置包含n型杂质的高效吸气区域和浓度为p型的p型杂质来解决n沟道TFT的吸杂效率差的问题 的p型杂质的浓度高于n型杂质浓度。