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公开(公告)号:US11606501B2
公开(公告)日:2023-03-14
申请号:US17509475
申请日:2021-10-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaehan Lee , Jiyeon Kim , Woojin Jung , Nari Choi
IPC: H04N5/232 , G06F3/01 , G06F3/04845 , G06F3/04847 , G06F1/16 , G03B5/00
Abstract: An electronic device is provided. The electronic device includes a camera including a plurality of lenses, a display, and a processor, in which the processor is configured to display a plurality of icons corresponding to the plurality of lenses, based on first position information in a first photographing mode, and upon selection of a first icon by a first gesture from the plurality of icons in the first photographing mode, switch to a second photographing mode and display a zoom control region including a plurality of zoom levels having a first zoom level of a first lens corresponding to the first icon as a reference zoom level and the plurality of icons rearranged based on second position information corresponding to the plurality of zoom levels.
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公开(公告)号:US11289951B2
公开(公告)日:2022-03-29
申请号:US16711262
申请日:2019-12-11
Applicant: Samsung Electronics Co., Ltd.
Inventor: Mincheol Ha , Dongzo Kim , Kwangseob Kim , Kihyun Kim , Jihye Kim , Yunjeong Noh , Jungsu Park , Kyungmin Lee , Woojin Jung , Yongsang Yun
Abstract: An electronic device including a coil, a power transmission circuit electrically connected with the coil, a detection circuit, and a control circuit. The control circuit of the electronic device configured to wirelessly output a first signal for identifying an access of a foreign object by first period intervals through the coil using the power transmission circuit, identify a change of the first signal using the detection circuit, wirelessly output the first signal by the first period intervals in response to a detection value of the changed first signal being less than or equal to a first threshold value, and wirelessly output the first signal by a second period intervals longer than the first period intervals in response to the detection value of the changed first signal exceeding the first threshold value.
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公开(公告)号:US20250061560A1
公开(公告)日:2025-02-20
申请号:US18798487
申请日:2024-08-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Minsu Kang , Kwang-Eun Kim , HuiSoo Kim , Seum Seo , Jeongho Ahn , Sungeun Lee , Chaeyoung Lee , Choonshik Leem , Woojin Jung
Abstract: A parameter optimization method includes receiving a plurality of SEM images respectively corresponding to a plurality of positions on a semiconductor wafer in which a first pattern and a second pattern are disposed based on overlay settings, determining a primary optimization parameter set based on the plurality of SEM images, clustering the plurality of SEM images to a plurality of clusters based on image attributes, and determining a secondary optimization parameter set corresponding to each of the plurality of clusters based on SEM images included in each of the plurality of clusters from among the plurality of SEM images and the primary optimization parameters.
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公开(公告)号:US11489371B2
公开(公告)日:2022-11-01
申请号:US16934511
申请日:2020-07-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Taehyun Woo , Yongsik Nam , Youngjoon Park , Jungsu Park , Woojin Jung
Abstract: A wireless charging device in communication with an electronic device is provided. The wireless charging device includes a charging circuit configured to communicate with the electronic device at a first frequency that is included in a frequency band of the electronic device and supple power received from an external power source to the electronic device depending on a communication result at the first frequency, and a control circuit configured to convert the first frequency, based on a response of the electronic device to a first connection signal that is transmitted from the charging circuit to the electronic device.
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公开(公告)号:USD949162S1
公开(公告)日:2022-04-19
申请号:US29701969
申请日:2019-08-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Designer: Jiyeon Kim , Minhee Kang , Woojin Jung , Hankyung Jeon
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公开(公告)号:US20250008722A1
公开(公告)日:2025-01-02
申请号:US18631884
申请日:2024-04-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Gyeyoung KIM , Sangho Yun , Jeonghee Choi , Woojin Jung
IPC: H10B12/00 , H01L21/308 , H01L21/762
Abstract: A method of forming a pattern is provided. The method includes: forming a first recess in a substrate; forming a first mask layer on the substrate that extends into the first recess; performing a heat treatment process on the first mask layer; removing an upper portion of the first mask layer to form a first mask in the first recess, the first mask comprising a lower portion of the first mask layer; forming a second mask on the substrate and the first mask, the second mask comprising a material having a tolerance with respect to an etching process that is greater than that of the first mask; and performing an etching process on the substrate using the second mask as an etching mask to form the pattern on the substrate.
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公开(公告)号:US11910087B2
公开(公告)日:2024-02-20
申请号:US18166203
申请日:2023-02-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaehan Lee , Jiyeon Kim , Woojin Jung , Nari Choi
IPC: H04N23/667 , G06F3/01 , H04N23/69 , H04N23/63
CPC classification number: H04N23/667 , G06F3/016 , H04N23/631 , H04N23/69
Abstract: An electronic device is provided. The electronic device includes a camera including a plurality of lenses, a display, and a processor, in which the processor is configured to display a plurality of icons corresponding to the plurality of lenses, based on first position information in a first photographing mode, and upon selection of a first icon by a first gesture from the plurality of icons in the first photographing mode, switch to a second photographing mode and display a zoom control region including a plurality of zoom levels having a first zoom level of a first lens corresponding to the first icon as a reference zoom level and the plurality of icons rearranged based on second position information corresponding to the plurality of zoom levels.
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公开(公告)号:USD915440S1
公开(公告)日:2021-04-06
申请号:US29701961
申请日:2019-08-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Designer: Jiyeon Kim , Jaehan Lee , Jiwon Jeon , Woojin Jung , Jungwoo Choi
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公开(公告)号:US10797051B2
公开(公告)日:2020-10-06
申请号:US16716384
申请日:2019-12-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yoonjae Kim , Cheol Kim , Yong-Hoon Son , Jin-Hyuk Yoo , Woojin Jung
IPC: H01L29/16 , H01L21/02 , H01L27/088 , H01L21/8234 , H01L23/485 , H01L21/768 , H01L21/306 , H01L21/311 , H01L27/02 , H01L29/06 , H01L29/08 , H01L29/10 , H01L29/423 , H01L29/66 , H01L29/78 , H01L21/8238 , H01L29/165
Abstract: A semiconductor device includes a substrate having an active pattern, a conductive pattern crossing the active pattern, a spacer structure on at least one side surface of the conductive pattern, and a capping structure on the conductive pattern. The capping structure includes a first capping pattern and a second capping pattern. The second capping pattern is disposed on a top surface of the first capping pattern and a top surface of the spacer structure.
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公开(公告)号:US20160351455A1
公开(公告)日:2016-12-01
申请号:US15001729
申请日:2016-01-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Woojin Jung , Sang-Ho Yun , Un Jeon , Byeongsoo Kim , Cheolhong Kim , Taehong Min , Joonsoo Park
IPC: H01L21/66 , G01N21/95 , G01B11/00 , H01L21/027 , G01B11/27
CPC classification number: H01L22/12 , G01B11/002 , G01B11/272 , G03F7/70633 , H01L21/0274
Abstract: Provided are methods of generating and revising overlay correction data, a method of performing a photolithography process using the overlay correction data, and a method of performing a photolithography process while revising the overlay correction data. The method of revising the overlay correction data includes forming a plurality of overlay keys on a first set of wafers using first overlay correction data, measuring first overlay keys formed on first overlay coordinates in a first shot area of a first wafer among the first set of wafers, generating first overlay error data, and revising primarily the first overlay correction data using the first overlay error data, measuring second overlay keys formed on second overlay coordinates in a second shot area of a second wafer among the first set of wafers, generating second overlay error data, and revising secondarily the primarily revised first overlay correction data using the second overlay error data, and measuring third overlay keys formed on third overlay coordinates in a third shot area of a third wafer among the first set of wafers, generating third overlay error data, revising tertiarily the secondarily revised first overlay correction data, and generating second overlay correction data. The first overlay coordinates, the second overlay coordinates, and the third overlay coordinates are mutually exclusive.
Abstract translation: 提供了生成和修改覆盖校正数据的方法,使用覆盖校正数据执行光刻处理的方法,以及在修改覆盖校正数据的同时执行光刻处理的方法。 修改覆盖校正数据的方法包括使用第一覆盖校正数据在第一组晶片上形成多个覆盖键,测量在第一组中的第一晶片的第一覆盖坐标中形成的第一覆盖坐标, 生成第一重叠错误数据,并且使用第一重叠错误数据主要修改第一重叠校正数据,测量形成在第一组晶片中的第二晶片的第二拍摄区域中的第二覆盖坐标上的第二重叠键,产生第二叠加错误数据 重叠错误数据,并且使用第二覆盖误差数据二次修改主要修改的第一覆盖校正数据,以及测量形成在第一晶片组中的第三晶片的第三拍摄区域中的第三覆盖坐标上的第三覆盖键,生成第三覆盖 错误数据,二次修改二次修改的第一重叠校正数据,并产生第二叠加校正 数据。 第一覆盖坐标,第二覆盖坐标和第三覆盖坐标是相互排斥的。
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