公开(公告)号：US09240050B2

公开(公告)日：2016-01-19

申请号：US13870484

申请日：2013-04-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung-Ho Park ,  Jae-Hyun Kim ,  Se-Hyeok Park ,  Tae-Gyoung Ahn

IPC: G06T7/20 ,  H04N19/513 ,  H04N19/553

CPC classification number: G06T7/2013 ,  G06T7/223 ,  G06T2207/10016 ,  G06T2207/20021 ,  G06T2207/30196 ,  H04N19/513 ,  H04N19/521 ,  H04N19/553

Abstract: A method for processing image data corresponding to temporally successive motions of an object, the method including adjusting a range of a first occlusion region which is estimated according to whether position changes occur in sub-blocks forming temporally successive first and second frames among image frames which display the motions of the object, by using Motion Vectors (MVs) mapped to the sub-blocks and detecting a second occlusion region of a third frame which displays the object that moves between the first frame and the second frame, by using the adjusted range of the first occlusion region.

Abstract translation: 一种用于处理与物体的时间连续运动相对应的图像数据的方法，所述方法包括调整根据位置变化是否发生在形成时间上连续的第一和第二帧的子块中的图像帧中估计的第一遮挡区域的范围， 通过使用映射到子块的运动矢量（MV）和检测第三帧的第二遮挡区域来显示对象的运动，该第三帧显示在第一帧和第二帧之间移动的对象，通过使用调整的范围 的第一遮挡区域。

公开(公告)号：US10435587B2

公开(公告)日：2019-10-08

申请号：US15214847

申请日：2016-07-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung-Ho Park ,  Ki-Hwa Jung ,  Sang-Kyun Kim ,  Jun-Ha Hwang ,  Chang-Gil Kwon ,  Seung-Yeop Baek ,  Jae-Woo Lee ,  Ji-Sung Lee ,  Jae-Kwang Choi ,  Jin-Myung Hwang

IPC: H01L21/31 ,  H01L21/76 ,  H01L21/82 ,  C09G1/02 ,  H01L21/762 ,  H01L29/06 ,  H01L21/3105 ,  H01L29/78 ,  H01L21/8238 ,  H01L29/66

Abstract: A polishing composition includes abrasive particles, a pyrrolidone containing a hydrophilic group, a dispersing agent, a first dishing inhibitor including polyacrylic acid, and a second dishing inhibitor including a non-ionic polymer.

公开(公告)号：US11290750B2

公开(公告)日：2022-03-29

申请号：US16641131

申请日：2018-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong Yoon Kim ,  Seung-Ho Park ,  Tae Gyoung Ahn ,  Ho Cheon Wey ,  Sang Hun Kim ,  Young Su Moon

IPC: H04N19/895 ,  H04N5/232 ,  H04N19/172 ,  H04N19/117 ,  H04N19/14 ,  H04N19/176 ,  H04N19/86

Abstract: A display apparatus and method that reduces block noise by performing block noise boundary detections and generating a block noise boundary map on the basis of a result of the detections to cope with local random block noise having irregular shaped and blurred block boundaries to perform adaptive deblocking filtering. The apparatus includes: an image receiver; a map generator to generate a block boundary map by performing convolution using a plurality of kernels on a received image; a determiner to determine a filter parameter on the basis of the block boundary map and a block boundary period included in the block boundary map; a deblocking filter to vary a filter strength on the basis of the determined filter parameter; and a display on which an image in which block noise is removed by the deblocking filter is displayed.

公开(公告)号：US09960169B2

公开(公告)日：2018-05-01

申请号：US15243248

申请日：2016-08-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jun-Seok Lee ,  Byoung-Ho Kwon ,  Sang-Kyun Kim ,  Yun-Jeong Kim ,  Seung-Ho Park ,  Hao Cui ,  In-Seak Hwang

IPC: H01L27/108 ,  H01L21/762 ,  H01L21/3105

CPC classification number: H01L27/10873 ,  H01L21/0337 ,  H01L21/31053 ,  H01L21/31058 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76224 ,  H01L21/76229 ,  H01L27/10814 ,  H01L27/10823 ,  H01L27/10855 ,  H01L27/10876 ,  H01L27/10894

Abstract: In a method of manufacturing a semiconductor device, mask patterns are formed on a semiconductor substrate. An organic layer is formed on the semiconductor substrate to cover the mask patterns. An upper portion of the organic layer is planarized using a polishing composition. The polishing composition includes an oxidizing agent and is devoid of abrasive particles.

公开(公告)号：US09665274B2

公开(公告)日：2017-05-30

申请号：US14194512

申请日：2014-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yoon-Suk Choi ,  Gi-Tae Mun ,  Seung-Ho Park

IPC: G06F3/0488 ,  G06F3/0482

CPC classification number: G06F3/04886 ,  G06F3/0482 ,  G06F3/04883

Abstract: An apparatus and method for controlling a virtual keypad in an electronic device. The method includes determining whether a touch is sensed, determining whether the touch is held during a reference time when the touch is sensed, determining whether a coordinate of the touch is included in a reference region when the touch is held during the reference time, and displaying the virtual keypad based on the coordinate of the touch when the coordinate of the touch is included in the reference region.

公开(公告)号：US20170062437A1

公开(公告)日：2017-03-02

申请号：US15243248

申请日：2016-08-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jun-Seok Lee ,  Byoung-Ho Kwon ,  Sang-Kyun Kim ,  Yun-Jeong Kim ,  Seung-Ho Park ,  Hao Cui ,  ln-Seak Hwang

IPC: H01L27/108 ,  H01L21/3105 ,  H01L21/762

CPC classification number: H01L27/10873 ,  H01L21/0337 ,  H01L21/31053 ,  H01L21/31058 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76224 ,  H01L21/76229 ,  H01L27/10814 ,  H01L27/10823 ,  H01L27/10855 ,  H01L27/10876 ,  H01L27/10894

Abstract: In a method of manufacturing a semiconductor device, mask patterns are formed on a semiconductor substrate. An organic layer is formed on the semiconductor substrate to cover the mask patterns. An upper portion of the organic layer is planarized using a polishing composition. The polishing composition includes an oxidizing agent and is devoid of abrasive particles.

Abstract translation: 在制造半导体器件的方法中，在半导体衬底上形成掩模图案。 在半导体衬底上形成有机层以覆盖掩模图案。 使用抛光组合物对有机层的上部进行平面化处理。 抛光组合物包括氧化剂并且没有磨料颗粒。

公开(公告)号：US20140240265A1

公开(公告)日：2014-08-28

申请号：US14194512

申请日：2014-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yoon-Suk Choi ,  Gi-Tae Mun ,  Seung-Ho Park

IPC: G06F3/041 ,  G06F3/0488

CPC classification number: G06F3/04886 ,  G06F3/0482 ,  G06F3/04883

Abstract: An apparatus and method for controlling a virtual keypad in an electronic device. The method includes determining whether a touch is sensed, determining whether the touch is held during a reference time when the touch is sensed, determining whether a coordinate of the touch is included in a reference region when the touch is held during the reference time, and displaying the virtual keypad based on the coordinate of the touch when the coordinate of the touch is included in the reference region.

Abstract translation: 一种用于控制电子设备中的虚拟键盘的装置和方法。 所述方法包括确定是否感测到触摸，确定在感测到触摸的参考时间期间是否保持触摸;在参考时间期间确定触摸是否包括在参考区域中;以及 当触摸的坐标被包括在参考区域中时，基于触摸的坐标显示虚拟键盘。