Abstract:
A thermal pad of a semiconductor chip, a semiconductor chip including the thermal pad, and a method of manufacturing the semiconductor chip, the thermal pad including a thermal core in a trench at a lower surface of a semiconductor substrate, the thermal core being configured to receive heat generated from a through silicon via (TSV) vertically extending through the semiconductor substrate; a thermal head connected to the thermal core and protruding from the lower surface of the semiconductor substrate, the thermal head being configured to dissipate the heat in the thermal core; a first insulation layer between an inner surface of the trench and the thermal core; and a second insulation layer between the first insulation layer and the thermal core.
Abstract:
The disclosure relates to a fifth generation (5G) or pre-5G communication system supporting higher data rates after a fourth generation (4G) communication system such as Long Term Evolution (LTE). A module in a wireless communication system is provided. The module includes a plurality of antenna elements, an antenna substrate coupled to the plurality of antenna elements, a metal plate coupled to the antenna substrate, a calibration substrate coupled to a Radio Frequency (RF) component on a first face, and a conductive adhesive material for electrical coupling between the metal plate and the calibration substrate. The conductive adhesive material may be coupled to the calibration substrate on a second face different from the first face of the calibration substrate. The conductive adhesive material may include an air gap formed along a signal line included in the calibration substrate.
Abstract:
A semiconductor device includes a stacked structure disposed on a substrate. The stacked structure includes a plurality of insulation layers and a plurality of electrode layers alternately stacked in a third direction intersecting with first and second directions. A plurality of channel structures extends through the stacked structure in the third direction. A first wiring group includes a plurality of first horizontal wirings disposed on the stacked structure that are arranged in the first direction and extends in the second direction. A second wiring group includes a plurality of second horizontal wirings disposed on the stacked structure that are arranged in the first direction and extends in the second direction. Each of the plurality of first and second horizontal wirings are connected to corresponding one of the plurality of channel structures. A first line identifier is disposed between the first wiring group and the second wiring group.
Abstract:
A memory controller includes an error correction code (ECC) engine and an error managing circuit. The ECC engine is configured to, during a read operation, perform an ECC decoding on a read codeword set to generate a first and second syndrome associated with a correctable error in a user data set included in the read codeword set, correct the correctable error based on the first syndrome and the second syndrome, and provide the second syndrome to the error managing circuit. The error managing circuit is configured to accumulate second syndromes associated with a plurality of correctable errors and obtained through a plurality of read operations as a plurality of second syndromes, store the plurality of second syndromes, compare the plurality of second syndromes with an error pattern set, and predict an occurrence of an uncorrectable error associated with the correctable error in a memory region based on the comparison.
Abstract:
A photosensitive composition including a quantum dot; a carboxylic acid group-containing binder; a multi-thiol compound including at least two thiol groups at its terminal ends; a photopolymerizable monomer including a carbon-carbon double bond; a metal oxide fine particle including an organic compound represented by Chemical Formula 1 or a moiety derived from the organic compound at a surface of the metal oxide fine particle; a polymeric stabilizer; a photoinitiator; and a solvent, a production method thereof, a quantum dot polymer composite prepared therefrom, and a layered structure and an electronic device including the same are disclosed: (AnSiR)4-n Chemical Formula 1 wherein n, A, and R are the same as defined in the specification.
Abstract:
A method for preparing a hydrogenation catalyst by mixing a copper salt with colloidal silica to form a precipitate, washing the formed precipitate to remove anions of the copper salt from the precipitate, and impregnating the anion-removed precipitate with an alkali metal to form a hydrogenation catalyst; and a method for preparing a diol from a lactone using the hydrogenation catalyst.
Abstract:
A semiconductor device includes; a semiconductor substrate including a chip area and a scribe lane area, a low-k layer on the semiconductor substrate, an interlayer insulating layer on the low-k layer, a trench area in the scribe lane area, a gap-fill insulating layer in the trench area and vertically extending from the semiconductor substrate through the low-k layer and the interlayer insulating layer to expose an upper surface of the gap-fill insulating layer through the interlayer insulating layer, and a first metal liner covering a side surface of the gap-fill insulating layer and disposed between the gap-fill insulating layer and the low-k layer and between the gap-fill insulating layer and the interlayer insulating layer.
Abstract:
A semiconductor device includes; a semiconductor substrate including a chip area and a scribe lane area, a low-k layer on the semiconductor substrate, an interlayer insulating layer on the low-k layer, a trench area in the scribe lane area, a gap-fill insulating layer in the trench area and vertically extending from the semiconductor substrate through the low-k layer and the interlayer insulating layer to expose an upper surface of the gap-fill insulating layer through the interlayer insulating layer, and a first metal liner covering a side surface of the gap-fill insulating layer and disposed between the gap-fill insulating layer and the low-k layer and between the gap-fill insulating layer and the interlayer insulating layer.
Abstract:
A semiconductor device may include a cell capacitor including first lower electrodes, a first upper support layer pattern, a first dielectric layer, and a first upper electrode. The decoupling capacitor may include second lower electrodes, a second upper support layer pattern, a second dielectric layer, and a second upper electrode. The first and second lower electrodes may be arranged in a honeycomb pattern at each vertex of a hexagon and a center of the hexagon. The first upper support layer pattern may be connected to upper sidewalls of the first lower electrodes. The first upper support layer pattern may correspond to a first plate defining first openings. The second upper support layer pattern may be connected to upper sidewalls of the second electrodes. The second upper support layer pattern may correspond to a second plate defining second openings having a shape different from a shape of the first opening.
Abstract:
A photocatalyst including a first metal oxide; and a second metal oxide, wherein the first metal oxide is disposed on a surface of the second metal oxide, and wherein absorbance of the photocatalyst in a wavelength region of about 200 nanometers (nm) to about 600 nm is about 5% to about 50% greater than an absorbance of TiO2 in the wavelength region of about 200 nm to about 600 nm.