Semiconductor device
    2.
    发明授权

    公开(公告)号:US12249563B2

    公开(公告)日:2025-03-11

    申请号:US17473481

    申请日:2021-09-13

    Abstract: A semiconductor device includes a substrate comprising a redistribution layer, a ball land provided on a bottom surface of the redistribution layer, a passivation layer surrounding the ball land on the bottom surface of the redistribution layer and spaced apart from the ball land by a space region formed between the passivation layer and the ball land, and a signal wiring line provided in the redistribution layer on the ball land, a semiconductor chip mounted on the substrate, and an external terminal adhered to the ball land. The signal wiring line includes a first wiring pattern extending in a first direction perpendicular to one side surface of the semiconductor chip, and a support pattern disposed under the one side surface of the semiconductor chip. A second width of the support pattern in a second direction is greater than a first width of the wiring pattern in the second direction.

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