GRAPHENE ELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME
    1.
    发明申请
    GRAPHENE ELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME 审中-公开
    石墨电子器件及其制造方法

    公开(公告)号:US20130203222A1

    公开(公告)日:2013-08-08

    申请号:US13796918

    申请日:2013-03-12

    Abstract: A graphene electronic device may include a silicon substrate, connecting lines on the silicon substrate, a first electrode and a second electrode on the silicon substrate, and an interlayer dielectric on the silicon substrate. The interlayer dielectric may be configured to cover the connecting lines and the first and second electrodes and the interlayer dielectric may be further configured to expose at least a portion of the first and second electrodes. The graphene electronic device may further include an insulating layer on the interlayer dielectric and a graphene layer on the insulating layer, the graphene layer having a first end and a second end. The first end of the graphene layer may be connected to the first electrode and the second end of the graphene layer may be connected to the second electrode.

    Abstract translation: 石墨烯电子器件可以包括硅衬底,硅衬底上的连接线,硅衬底上的第一电极和第二电极,以及硅衬底上的层间电介质。 层间电介质可以被配置为覆盖连接线,并且第一和第二电极和层间电介质可以被进一步配置为暴露第一和第二电极的至少一部分。 所述石墨烯电子器件还可以包括在所述层间电介质上的绝缘层和所述绝缘层上的石墨烯层,所述石墨烯层具有第一端和第二端。 石墨烯层的第一端可以连接到第一电极,并且石墨烯层的第二端可以连接到第二电极。

    GRAPHENE ELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME
    6.
    发明申请
    GRAPHENE ELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME 有权
    石墨电子器件及其制造方法

    公开(公告)号:US20140225068A1

    公开(公告)日:2014-08-14

    申请号:US14244275

    申请日:2014-04-03

    CPC classification number: H01L29/66477 H01L29/42384 H01L29/775 H01L29/78684

    Abstract: A graphene electronic device includes a graphene channel layer on a substrate, a source electrode on an end portion of the graphene channel layer and a drain electrode on another end portion of the graphene channel layer, a gate oxide on the graphene channel layer and between the source electrode and the drain electrode, and a gate electrode on the gate oxide. The gate oxide has substantially the same shape as the graphene channel layer between the source electrode and the drain electrode.

    Abstract translation: 石墨烯电子器件包括在衬底上的石墨烯通道层,石墨烯通道层的端部上的源电极和在石墨烯通道层的另一端部上的漏电极,石墨烯通道层上的栅极氧化物 源电极和漏电极以及栅极氧化物上的栅电极。 栅极氧化物具有与源电极和漏电极之间的石墨烯沟道层基本相同的形状。

    GRAPHENE SUBSTITUTED WITH BORON AND NITROGEN, METHOD OF FABRICATING THE SAME, AND TRANSISTOR HAVING THE SAME
    8.
    发明申请
    GRAPHENE SUBSTITUTED WITH BORON AND NITROGEN, METHOD OF FABRICATING THE SAME, AND TRANSISTOR HAVING THE SAME 有权
    用硼和氮取代的石墨,其制造方法和具有其的晶体管

    公开(公告)号:US20140131626A1

    公开(公告)日:2014-05-15

    申请号:US14162397

    申请日:2014-01-23

    Abstract: Graphene, a method of fabricating the same, and a transistor having the graphene are provided, the graphene includes a structure of carbon (C) atoms partially substituted with boron (B) atoms and nitrogen (N) atoms. The graphene has a band gap. The graphene substituted with boron and nitrogen may be used as a channel of a field effect transistor. The graphene may be formed by performing chemical vapor deposition (CVD) method using borazine or ammonia borane as a boron nitride (B-N) precursor.

    Abstract translation: 提供石墨烯,其制造方法和具有石墨烯的晶体管,石墨烯包括部分被硼(B)原子和氮(N)原子取代的碳(C)原子的结构。 石墨烯具有带隙。 用硼和氮取代的石墨烯可以用作场效应晶体管的通道。 可以通过使用环硼氮烷或氨硼烷作为氮化硼(B-N)前体进行化学气相沉积(CVD)方法来形成石墨烯。

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