公开(公告)号：US09716104B2

公开(公告)日：2017-07-25

申请号：US14987835

申请日：2016-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong Won Kim ,  Seung Hyun Lim ,  Chang Seok Kang ,  Young Woo Park ,  Dae Hoon Bae ,  Dong Seog Eun ,  Woo Sung Lee ,  Jae Duk Lee ,  Jae Woo Lim ,  HanMei Choi

IPC: H01L27/115 ,  H01L27/11582 ,  H01L27/11556 ,  H01L27/11521 ,  H01L27/11568

CPC classification number: H01L27/11565 ,  H01L27/11519 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L27/11556 ,  H01L27/11568 ,  H01L27/1157 ,  H01L27/11573 ,  H01L27/11582 ,  H01L28/00 ,  H01L29/04

Abstract: A memory device includes a plurality of channel regions that each extend in a direction perpendicular to an upper surface of a substrate, a plurality of gate electrode layers and a plurality of insulating layers stacked on the substrate adjacent the channel regions, each of the gate electrodes extending different lengths, and a plurality of dummy channel regions adjacent first ends of the plurality of gate electrode layers, wherein the substrate includes a substrate insulating layer formed below the plurality of dummy channel regions.

公开(公告)号：US10153292B2

公开(公告)日：2018-12-11

申请号：US15907667

申请日：2018-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong Won Kim ,  Seung Hyun Lim ,  Chang Seok Kang ,  Young Woo Park ,  Dae Hoon Bae ,  Dong Seog Eun ,  Woo Sung Lee ,  Jae Duk Lee ,  Jae Woo Lim ,  Hanmei Choi

IPC: H01L27/11556 ,  H01L27/11565 ,  H01L27/11582 ,  H01L27/11521 ,  H01L27/11568 ,  H01L27/11519 ,  H01L27/11524 ,  H01L27/11529 ,  H01L27/1157 ,  H01L27/11573 ,  H01L29/04 ,  H01L49/02

Abstract: A memory device includes a plurality of channel regions that each extend in a direction perpendicular to an upper surface of a substrate, a plurality of gate electrode layers and a plurality of insulating layers stacked on the substrate adjacent the channel regions, each of the gate electrodes extending different lengths, and a plurality of dummy channel regions adjacent first ends of the plurality of gate electrode layers, wherein the substrate includes a substrate insulating layer formed below the plurality of dummy channel regions.

公开(公告)号：US11910614B2

公开(公告)日：2024-02-20

申请号：US17711826

申请日：2022-04-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang Sup Lee ,  Phil Ouk Nam ,  Sung Yun Lee ,  Chang Seok Kang

IPC: H10B43/50 ,  H01L23/528 ,  H01L23/522 ,  H01L23/532 ,  H10B41/27 ,  H10B41/50 ,  H10B43/10 ,  H10B43/20 ,  H10B43/27 ,  H10B43/35

CPC classification number: H10B43/50 ,  H01L23/528 ,  H01L23/5226 ,  H01L23/53295 ,  H10B41/27 ,  H10B41/50 ,  H10B43/10 ,  H10B43/20 ,  H10B43/27 ,  H10B43/35

Abstract: A three-dimensional semiconductor device and a method of forming the same are provided. The three-dimensional semiconductor device comprises a substrate including first and second areas; first and second main separation patterns, disposed on the substrate and intersecting the first and second areas; gate electrodes disposed between the first and second main separation patterns and forming a stacked gate group, the gate electrodes sequentially stacked on the first area and extending in a direction from the first area to the second area; and at least one secondary separation pattern disposed on the second area, disposed between the first and second main separation patterns, and penetrating through the gate electrodes disposed on the second area. The gate electrodes include pad portions on the second area, and the pad portions are thicker than the gate electrodes disposed on the first area and in contact with the at least one secondary separation pattern.

公开(公告)号：US11296104B2

公开(公告)日：2022-04-05

申请号：US16845236

申请日：2020-04-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang Sup Lee ,  Phil Ouk Nam ,  Sung Yun Lee ,  Chang Seok Kang

IPC: H01L27/11575 ,  H01L23/528 ,  H01L23/522 ,  H01L27/11582 ,  H01L27/11548 ,  H01L27/11556 ,  H01L23/532 ,  H01L27/1157 ,  H01L27/11565 ,  H01L27/11578

Abstract: A three-dimensional semiconductor device and a method of forming the same are provided. The three-dimensional semiconductor device comprises a substrate including first and second areas; first and second main separation patterns, disposed on the substrate and intersecting the first and second areas; gate electrodes disposed between the first and second main separation patterns and forming a stacked gate group, the gate electrodes sequentially stacked on the first area and extending in a direction from the first area to the second area; and at least one secondary separation pattern disposed on the second area, disposed between the first and second main separation patterns, and penetrating through the gate electrodes disposed on the second area. The gate electrodes include pad portions on the second area, and the pad portions are thicker than the gate electrodes disposed on the first area and in contact with the at least one secondary separation pattern.

公开(公告)号：US09972636B2

公开(公告)日：2018-05-15

申请号：US15626395

申请日：2017-06-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong Won Kim ,  Seung Hyun Lim ,  Chang Seok Kang ,  Young Woo Park ,  Dae Hoon Bae ,  Dong Seog Eun ,  Woo Sung Lee ,  Jae Duk Lee ,  Jae Woo Lim ,  Hanmei Choi

IPC: H01L27/115 ,  H01L27/11565 ,  H01L27/11519 ,  H01L27/11524 ,  H01L27/11556 ,  H01L27/11529 ,  H01L27/1157 ,  H01L27/11582 ,  H01L27/11573 ,  H01L29/04

CPC classification number: H01L27/11565 ,  H01L27/11519 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11529 ,  H01L27/11556 ,  H01L27/11568 ,  H01L27/1157 ,  H01L27/11573 ,  H01L27/11582 ,  H01L28/00 ,  H01L29/04

Abstract: A memory device includes a plurality of channel regions that each extend in a direction perpendicular to an upper surface of a substrate, a plurality of gate electrode layers and a plurality of insulating layers stacked on the substrate adjacent the channel regions, each of the gate electrodes extending different lengths, and a plurality of dummy channel regions adjacent first ends of the plurality of gate electrode layers, wherein the substrate includes a substrate insulating layer formed below the plurality of dummy channel regions.