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1.发明授权公开(公告)号：US09590207B2
公开(公告)日：2017-03-07
申请号：US15073354
申请日：2016-03-17
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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2.发明授权公开(公告)号：US09306192B2
公开(公告)日：2016-04-05
申请号：US13965182
申请日：2013-08-12
Applicant: Samsung Display Co., LTD
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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公开(公告)号：US12096654B2
公开(公告)日：2024-09-17
申请号：US17278785
申请日：2019-09-20
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Ju-Chan Park , Seung-Hwan Cho , Sun-Ho Kim , Sun-Hee Lee , Jong-Hyun Choi
IPC: H01L27/32 , G09G3/3266 , H01L51/52 , H10K50/84 , H10K59/121 , H10K59/131
CPC classification number: H10K59/121 , G09G3/3266 , H10K50/84 , H10K59/131
Abstract: A display panel includes a display area in which a plurality of pixels is disposed, a non-display area disposed outside the display area, a plurality of protrusions protruding from the non-display area and disposed along an edge of the non-display area, and a first driver disposed in the non-display area and including a plurality of first stages respectively corresponding to the plurality of protrusions.
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公开(公告)号：US08944875B2
公开(公告)日：2015-02-03
申请号：US14197102
申请日：2014-03-04
Applicant: Samsung Display Co., Ltd.
Inventor： Sun-Ho Kim
IPC: H05B33/10
CPC classification number: H05B33/10 , H01L27/3244 , H01L51/003 , H01L2251/5338
Abstract: A method for manufacturing a display device includes forming a releasing layer including graphene on a support substrate, forming a thin film substrate on the releasing layer, forming pixels and an encapsulation member on the thin film substrate, and separating the releasing layer and the support substrate from the thin film substrate.
Abstract translation: 一种显示装置的制造方法，其特征在于，在支撑基板上形成由石墨烯构成的剥离层，在所述剥离层上形成薄膜基板，在所述薄膜基板上形成像素和密封部件，将所述剥离层和所述支撑基板 从薄膜基板。
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公开(公告)号：US09664935B2
公开(公告)日：2017-05-30
申请号：US14303909
申请日：2014-06-13
Applicant: Samsung Display Co., LTD.
Inventor： Sun-Ho Kim
IPC: G02F1/1333 , H01L51/00 , B32B37/12 , B32B38/10 , B32B37/18
CPC classification number: G02F1/133305 , B32B37/1284 , B32B37/18 , B32B38/10 , B32B2315/00 , B32B2315/02 , B32B2457/20 , H01L51/003 , H01L51/0097 , Y02E10/549 , Y02P70/521 , Y10T156/10
Abstract: A method of manufacturing a flexible display panel includes forming an adhesive layer by depositing an inorganic material on a flexible substrate, forming a hydroxyl group on a surface of the adhesive layer by modifying the surface of the adhesive layer, laminating a glass substrate to the modified surface of the adhesive layer and forming a heat-treated layer by heating the glass substrate and the adhesive layer.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20160197305A1
公开(公告)日：2016-07-07
申请号：US15073354
申请日：2016-03-17
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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公开(公告)号：US20140256206A1
公开(公告)日：2014-09-11
申请号：US14197102
申请日：2014-03-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Sun-Ho Kim
IPC: H05B33/10
CPC classification number: H05B33/10 , H01L27/3244 , H01L51/003 , H01L2251/5338
Abstract: A method for manufacturing a display device includes forming a releasing layer including graphene on a support substrate, forming a thin film substrate on the releasing layer, forming pixels and an encapsulation member on the thin film substrate, and separating the releasing layer and the support substrate from the thin film substrate.
Abstract translation: 一种显示装置的制造方法，其特征在于，在支撑基板上形成由石墨烯构成的剥离层，在所述剥离层上形成薄膜基板，在所述薄膜基板上形成像素和密封部件，将所述剥离层和所述支撑基板 从薄膜基板。
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公开(公告)号：US20180305809A1
公开(公告)日：2018-10-25
申请号：US16024626
申请日：2018-06-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Sun-Ho Kim , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Hyun-Woo Joo , Yong-Suk Lee
CPC classification number: C23C14/564 , C23C14/24 , C23C16/4412 , H01L21/56 , H01L51/0008
Abstract: A deposition apparatus configured to perform a deposition process on a substrate, the deposition apparatus including a chamber having an exhaust opening in a surface, a deposition source in the chamber configured to eject one or more deposition materials toward the substrate, a cooling plate corresponding to an inner surface of the chamber, at which the exhaust opening is formed, a refrigerator contacting the cooling plate, and a pump coupled to the exhaust opening.
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公开(公告)号：US10081862B2
公开(公告)日：2018-09-25
申请号：US14012916
申请日：2013-08-28
Applicant: Samsung Display Co., Ltd.
Inventor： Sun-Ho Kim , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Hyun-Woo Joo , Yong-Suk Lee
CPC classification number: C23C14/564 , C23C14/24 , C23C16/4412 , H01L21/56 , H01L51/0008
Abstract: A deposition apparatus configured to perform a deposition process on a substrate, the deposition apparatus including a chamber having an exhaust opening in a surface, a deposition source in the chamber configured to eject one or more deposition materials toward the substrate, a cooling plate corresponding to an inner surface of the chamber, at which the exhaust opening is formed, a refrigerator contacting the cooling plate, and a pump coupled to the exhaust opening.
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10.发明申请THIN FILM DEPOSITING APPARATUS AND THE THIN FILM DEPOSITING METHOD USING THE SAME 审中-公开薄膜沉积装置和使用其的薄膜沉积方法公开(公告)号：US20170016109A1
公开(公告)日：2017-01-19
申请号：US15277977
申请日：2016-09-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Yong-Suk Lee , Myung-Soo Huh , Cheol-Rae Jo , Sang-Hyuk Hong , Jeong-Ho Yi , Suk-Won Jung , Sun-Ho Kim , Mi-Ra An
CPC classification number: C23C14/12 , C23C14/228 , C23C14/246 , C23C14/58 , C23C14/584
Abstract: A thin film depositing apparatus and a thin film deposition method using the apparatus. The thin film depositing apparatus includes a chamber configured to have a substrate mounted therein, an ejection unit configured to move in the chamber and to eject a deposition vapor to the substrate, and a source supply unit configured to supply a source of the deposition vapor to the ejection unit.
Abstract translation: 一种薄膜沉积设备和使用该设备的薄膜沉积方法。 该薄膜沉积设备包括：一个被配置为具有安装在其中的基板的腔室;喷射单元，被配置为在腔室中移动并将沉积蒸气喷射到基底;以及源供应单元，其构造成将沉积蒸气源供应到 喷射单元。
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