Linear evaporation source and vacuum deposition apparatus including the same

    公开(公告)号:US10689749B2

    公开(公告)日:2020-06-23

    申请号:US13797632

    申请日:2013-03-12

    Abstract: A linear evaporation source is disclosed. In one aspect, the source includes a crucible storing an evaporated material, a heater unit surrounding the crucible and heating the crucible, and a plurality of lateral reflectors surrounding a lateral surface of the heater unit. Each of the lateral reflectors includes a first reflector combined with the heater unit while being spaced apart from the heater unit and having a plurality of first openings and a second reflector movably combined with the first reflector and having a second opening. Open ratios of the lateral reflectors are independently adjusted to control a temperature of the crucible according to areas of the crucible. Thus, deposition uniformity of the linear evaporation source is enhanced.

    LINEAR EVAPORATION SOURCE AND VACUUM DEPOSITION APPARATUS INCLUDING THE SAME
    3.
    发明申请
    LINEAR EVAPORATION SOURCE AND VACUUM DEPOSITION APPARATUS INCLUDING THE SAME 审中-公开
    线性蒸发源和真空沉积装置,包括它们

    公开(公告)号:US20140109829A1

    公开(公告)日:2014-04-24

    申请号:US13797632

    申请日:2013-03-12

    Abstract: A linear evaporation source is disclosed. In one aspect, the source includes a crucible storing an evaporated material, a heater unit surrounding the crucible and heating the crucible, and a plurality of lateral reflectors surrounding a lateral surface of the heater unit. Each of the lateral reflectors includes a first reflector combined with the heater unit while being spaced apart from the heater unit and having a plurality of first openings and a second reflector movably combined with the first reflector and having a second opening. Open ratios of the lateral reflectors are independently adjusted to control a temperature of the crucible according to areas of the crucible. Thus, deposition uniformity of the linear evaporation source is enhanced.

    Abstract translation: 公开了一种线性蒸发源。 在一个方面,源包括存储蒸发材料的坩埚,围绕坩埚加热坩埚的加热器单元和围绕加热器单元的侧表面的多个侧向反射器。 每个横向反射器包括与加热器单元组合的第一反射器,同时与加热器单元间隔开并且具有多个第一开口和与第一反射器可移动地组合并具有第二开口的第二反射器。 独立地调整横向反射器的开放比以根据坩埚的面积来控制坩埚的温度。 因此,提高了线性蒸发源的沉积均匀性。

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