公开(公告)号：US09795983B2

公开(公告)日：2017-10-24

申请号：US13794701

申请日：2013-03-11

Applicant: Samsung Display Co., Ltd.

Inventor： Min Ho Kim ,  You Min Cha ,  Seuk Hwan Park

IPC: B05C3/20 ,  C23C14/04 ,  C23C14/46 ,  C23C14/52 ,  C23C14/54 ,  C23C14/56

CPC classification number: B05C3/20 ,  C23C14/042 ,  C23C14/46 ,  C23C14/52 ,  C23C14/542 ,  C23C14/568

Abstract: A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.

公开(公告)号：US10151022B2

公开(公告)日：2018-12-11

申请号：US15722987

申请日：2017-10-02

Applicant: Samsung Display Co., Ltd.

Inventor： Min Ho Kim ,  You Min Cha ,  Seuk Hwan Park

IPC: C23C14/04 ,  C23C14/46 ,  C23C14/52 ,  C23C14/54 ,  C23C14/56 ,  B05C3/20

Abstract: A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.

公开(公告)号：US20180021802A1

公开(公告)日：2018-01-25

申请号：US15722987

申请日：2017-10-02

Applicant: Samsung Display Co., Ltd.

Inventor： Min Ho Kim ,  You Min Cha ,  Seuk Hwan Park

IPC: B05C3/20 ,  C23C14/56 ,  C23C14/54 ,  C23C14/46 ,  C23C14/04 ,  C23C14/52

CPC classification number: B05C3/20 ,  C23C14/042 ,  C23C14/46 ,  C23C14/52 ,  C23C14/542 ,  C23C14/568

Abstract: A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.