Abstract:
Provided are a method of manufacturing a mold, a method of manufacturing a polarizer, and a display apparatus including the polarizer. According to one or more exemplary embodiments, a method of manufacturing a mold, the method including: forming a polymer pattern on a substrate, the polymer pattern including protrusions; forming a wire grid template portion on the substrate by etching, the substrate being etched using protrusions of the polymer pattern as a mask; forming a cover mask covering a portion of the wire grid template portion; forming a recess in the substrate by etching, the substrate being etched using the cover mask, the recess having a bottom surface lower than an upper surface of the wire grid template portion; and removing the cover mask.
Abstract:
A display panel includes a first substrate, a second substrate disposed opposite to the first substrate and a liquid crystal layer disposed between the first substrate and the second substrate. The first substrate includes a first wire grid pattern disposed on the first substrate extending in a first direction. The first wire grid pattern includes first recesses spaced apart from each other. The first substrate includes first metal wires disposed in the recesses.
Abstract:
A polarizer includes a base substrate and a metal pattern disposed on the base substrate and forming a wire grid. The wire grid has a width and a height and spaced apart from adjacent wire grid by a separation distance. A pitch is a sum of the width and the separation distance. A fill factor is obtained by dividing the width by the pitch. The range of the fill factor is based on an extinction ratio of polarization and a transmittance of the polarizer.
Abstract:
A reflective polarizing plate is monolithically integrated on a surface of a base layer of a display device. The polarizing plate comprises a polarizing area portion and a reflective/blocking area portion, both having a multi-layered structure. The polarizing area portion is patterned to have a plurality of spaced apart reflective wire grid strips. The reflective/blocking area portion is configured to reflect all light incident thereon from a predetermined direction (where that light would not otherwise be used) and to direct the reflected light back to a light providing source where the light can be recycled for other use. Therefore, a brightness and efficiency of the display device is improved.
Abstract:
A homogenous thin film layer is patterned into a transparent conductive portion and a non-conductive portion without use of etching through the thin film. Instead, conductive fine-wires which are convertible in one embodiment into non-conductive fine-wires are selectively converted into the non-conductive form. In an alternate embodiment, the homogenous thin film layer which includes conductive fine-wires is provided in a curable liquid form and selected portions of the liquid formed are cured into being affixed to substrate. Remaining portions can be washed away. In the case of display devices using transparent electrodes, a thin thin-film transistor array substrate is provided where the initially homogenous thin film which is and then converted into patterned conductive and non-conductive sections forms the pixel-electrodes and/or common electrode of the display device.
Abstract:
A method of manufacturing a polarizer, the method including: forming a metal layer on a substrate; forming a hard mask on the metal layer; forming an adhesion layer on a portion of the hard mask; forming a polymer layer on the hard mask and the adhesion layer; pressing a mold on the polymer layer to form a lattice pattern in association with the polymer layer; removing the mold and a portion of the lattice pattern; and patterning the adhesion layer, the hard mask, and the metal layer using a remaining portion of the lattice pattern as a mask.
Abstract:
An array substrate includes a reflecting pattern, a protecting pattern, a first passivation layer and a thin film transistor. The reflecting pattern is on a substrate. The protecting pattern is on the reflecting pattern and overlaps the reflecting pattern. The first passivation layer covers the substrate and the protecting pattern. The thin film transistor is on the first passivation layer and overlaps the reflecting pattern. The first passivation layer includes a silicon oxycarbide (SiOC).
Abstract:
A polarizer includes a base substrate and a dielectric stacked layer. The dielectric stacked layer in includes a first dielectric layer and second dielectric layer. The first dielectric layer has a high refractive index and a second dielectric layer has a low refractive index. A wire grid pattern is disposed on the dielectric stacked layer. The wire grid pattern has a line width, a separation distance and a pitch. The pitch is a sum of the line width and the separation distance. Adjacent grids of the wire grid pattern are spaced apart by the separation distance.
Abstract:
An exemplary embodiment discloses an imprint lithography method including: forming a first imprint pattern on a base substrate in a first area; forming a first resist pattern on the base substrate in a second area, the second area partially overlapping the first area; etching a third area using the first imprint pattern and the first resist pattern as an etch barrier, wherein the third area is a portion of the first area that is not overlapped with the second area; removing the first imprint pattern and the first resist pattern; forming a second imprint pattern on the base substrate in a fourth area which overlaps the second area and partially overlaps the third area; forming a second resist pattern on the base substrate in the third area; and etching the second area using the second imprint pattern and the second resist pattern as an etch barrier.
Abstract:
A polarizer includes a substrate, and a first metal layer and a second metal layer disposed on the substrate. The first metal layer includes a plurality of protrusions of a wire grid pattern. Each protrusion has a first width and adjacent protrusions are spaced apart by a second width. The second metal layer is disposed on each of the protrusions of the first metal layer, and includes molybdenum (Mo) and/or titanium (Ti).