Abstract:
Provided are a method of manufacturing a mold, a method of manufacturing a polarizer, and a display apparatus including the polarizer. According to one or more exemplary embodiments, a method of manufacturing a mold, the method including: forming a polymer pattern on a substrate, the polymer pattern including protrusions; forming a wire grid template portion on the substrate by etching, the substrate being etched using protrusions of the polymer pattern as a mask; forming a cover mask covering a portion of the wire grid template portion; forming a recess in the substrate by etching, the substrate being etched using the cover mask, the recess having a bottom surface lower than an upper surface of the wire grid template portion; and removing the cover mask.
Abstract:
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
Abstract:
A polarizer includes a base substrate and a metal pattern disposed on the base substrate and forming a wire grid. The wire grid has a width and a height and spaced apart from adjacent wire grid by a separation distance. A pitch is a sum of the width and the separation distance. A fill factor is obtained by dividing the width by the pitch. The range of the fill factor is based on an extinction ratio of polarization and a transmittance of the polarizer.
Abstract:
A reflective polarizing plate is monolithically integrated on a surface of a base layer of a display device. The polarizing plate comprises a polarizing area portion and a reflective/blocking area portion, both having a multi-layered structure. The polarizing area portion is patterned to have a plurality of spaced apart reflective wire grid strips. The reflective/blocking area portion is configured to reflect all light incident thereon from a predetermined direction (where that light would not otherwise be used) and to direct the reflected light back to a light providing source where the light can be recycled for other use. Therefore, a brightness and efficiency of the display device is improved.
Abstract:
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
Abstract:
A wire grid pattern used as a wire grid polarizer included in a display device or a master substrate for fabricating the wire gird polarizer includes a substrate; a cell area having a plurality of cells, each of the plurality of cells having a plurality of wires protruding from the substrate and arranged in a substantially parallel relationship at regular intervals; and a bezel area disposed along a periphery of the cell area. The cell area includes a trench area separating at least some of the cells. A method for fabricating the wire grid pattern also is disclosed.
Abstract:
A method of manufacturing a polarizer, the method including: forming a metal layer on a substrate; forming a hard mask on the metal layer; forming an adhesion layer on a portion of the hard mask; forming a polymer layer on the hard mask and the adhesion layer; pressing a mold on the polymer layer to form a lattice pattern in association with the polymer layer; removing the mold and a portion of the lattice pattern; and patterning the adhesion layer, the hard mask, and the metal layer using a remaining portion of the lattice pattern as a mask.
Abstract:
An array substrate includes a reflecting pattern, a protecting pattern, a first passivation layer and a thin film transistor. The reflecting pattern is on a substrate. The protecting pattern is on the reflecting pattern and overlaps the reflecting pattern. The first passivation layer covers the substrate and the protecting pattern. The thin film transistor is on the first passivation layer and overlaps the reflecting pattern. The first passivation layer includes a silicon oxycarbide (SiOC).
Abstract:
A polarizer includes a base substrate and a dielectric stacked layer. The dielectric stacked layer in includes a first dielectric layer and second dielectric layer. The first dielectric layer has a high refractive index and a second dielectric layer has a low refractive index. A wire grid pattern is disposed on the dielectric stacked layer. The wire grid pattern has a line width, a separation distance and a pitch. The pitch is a sum of the line width and the separation distance. Adjacent grids of the wire grid pattern are spaced apart by the separation distance.
Abstract:
A wire grid pattern used as a wire grid polarizer included in a display device or a master substrate for fabricating the wire gird polarizer include a substrate; a cell area having a plurality of cells, each of the plurality of cells having a plurality of wires protruding from the substrate and arranged in a substantially parallel relationship at regular intervals; and a bezel area disposed along a periphery of the cell area. The cell area includes a trench area separating at least some of the cells. A method for fabricating the wire grid pattern also is disclosed.