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公开(公告)号：US20210114163A1
公开(公告)日：2021-04-22
申请号：US17036062
申请日：2020-09-29
Applicant: Samsung Display Co., LTD. , KCTECH CO.,LTD.
Inventor： Seung Bae KANG , Sung Hyeon PARK , Jung Gun NAM , Joon-Hwa BAE , Kyung Bo LEE , Keun Woo LEE , Woo Jin CHO , Byoung Kwon CHOO
Abstract: A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.
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2.发明申请公开(公告)号：US20210043661A1
公开(公告)日：2021-02-11
申请号：US16927327
申请日：2020-07-13
Applicant: Samsung Display Co., LTD. , UBmaterials lnc.
Inventor： Joon-Hwa BAE , Jin Hyung PARK , Bonggu KANG , Seungbae KANG , Heesung YANG , Woojin CHO , Byoung Kwon CHOO
IPC: H01L27/12 , H01L21/3105 , C09G1/02 , C09K3/14
Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.
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公开(公告)号：US20210008685A1
公开(公告)日：2021-01-14
申请号：US16926034
申请日：2020-07-10
Applicant: Samsung Display Co., LTD.
Inventor： Jung-Gun NAM , Seung-Bae KANG , Heesung YANG , Bonggu KANG , Joon-Hwa BAE , Woo-Jin CHO , Byoung-Kwon CHOO
IPC: B24B37/10 , B24B7/22 , H01L21/321
Abstract: A method of manufacturing a display and a chemical mechanical polishing method which employ a chemical mechanical polishing apparatus that includes a conveyor belt to transfer a substrate, a polishing head disposed on the conveyor belt, and a body part which moves the polishing head and supplies a slurry to the polishing head. The polishing head includes a first polishing part including a first polishing pad surrounding a first slurry outlet, and a second polishing part surrounding the first polishing part and including a second polishing pad. A second slurry outlet is formed between the first polishing part and the second polishing part, and the first polishing part and the second polishing part are movable independently of each other in a direction substantially perpendicular to the substrate.
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公开(公告)号：US20180108684A1
公开(公告)日：2018-04-19
申请号：US15702797
申请日：2017-09-13
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Hyun Jin CHO , Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Kwang Suk KIM , Woo Jin CHO , Jun Hyuk CHEON
IPC: H01L27/12 , H01L21/3105 , H01L21/66 , C09G1/02 , B24B31/00
CPC classification number: H01L27/1248 , B24B31/00 , C09G1/02 , G09G3/3233 , G09G2300/0819 , G09G2300/0847 , H01L21/02164 , H01L21/0217 , H01L21/31053 , H01L22/26 , H01L27/1244 , H01L27/1255 , H01L27/1262 , H01L27/3258 , H01L27/3262 , H01L27/3265 , H01L27/3276 , H01L29/78675 , H01L2227/323
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号：US20240251607A1
公开(公告)日：2024-07-25
申请号：US18628242
申请日：2024-04-05
Applicant: Samsung Display Co., Ltd.
Inventor： Byoung Kwon CHOO , Seung Bae KANG , Bong Gu KANG , Tae Joon KIM , Jeong Min PARK , Joon-Hwa BAE , Hee Sung YANG , Woo Jin CHO
CPC classification number: H10K59/123 , H10K50/84 , H10K50/865 , H10K59/38 , H10K59/40 , H10K71/00 , H10K59/1201
Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.
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Patent Agency Ranking
公开(公告)号：US20190148414A1
公开(公告)日：2019-05-16
申请号：US16243702
申请日：2019-01-09
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Hyun Jin CHO , Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Kwang Suk KIM , Woo Jin CHO , Jun Hyuk CHEON
IPC: H01L27/12 , B24B31/00 , H01L21/3105 , G09G3/3233 , C09G1/02
CPC classification number: H01L27/1248 , B24B31/00 , C09G1/02 , G09G3/3233 , G09G2300/0819 , G09G2300/0847 , H01L21/02164 , H01L21/0217 , H01L21/31053 , H01L22/26 , H01L27/1244 , H01L27/1255 , H01L27/1262 , H01L27/3258 , H01L27/3262 , H01L27/3265 , H01L27/3276 , H01L29/78675 , H01L2227/323
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号：US20180047762A1
公开(公告)日：2018-02-15
申请号：US15671638
申请日：2017-08-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Joon-Hwa BAE , Byoung Kwon CHOO , Byung Hoon KANG , Woo Jin CHO , Hyun Jin CHO , Jun Hyuk CHEON , Jee-Hyun LEE
IPC: H01L27/12 , H01L21/02 , H01L29/786
CPC classification number: H01L27/1285 , H01L21/02532 , H01L21/02658 , H01L21/02675 , H01L21/02697 , H01L21/30625 , H01L21/31053 , H01L21/3212 , H01L21/76834 , H01L27/1222 , H01L27/127 , H01L29/66757 , H01L29/78672 , H01L29/7869 , H01L29/78696
Abstract: A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.
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8.发明申请公开(公告)号：US20250015098A1
公开(公告)日：2025-01-09
申请号：US18890313
申请日：2024-09-19
Applicant: Samsung Display Co., LTD. , UBmaterials lnc.
Inventor： Joon-Hwa BAE , Jin Hyung PARK , Bonggu KANG , Seungbae KANG , Heesung YANG , Woojin CHO , Byoung Kwon CHOO
IPC: H01L27/12 , C09G1/02 , C09K3/14 , H01L21/3105
Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.
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公开(公告)号：US20220077260A1
公开(公告)日：2022-03-10
申请号：US17332933
申请日：2021-05-27
Applicant: Samsung Display Co., Ltd.
Inventor： Byoung Kwon CHOO , Seung Bae KANG , Bong Gu KANG , Tae Joon KIM , Jeong Min PARK , Joon-Hwa BAE , Hee Sung YANG , Woo Jin CHO
Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.
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公开(公告)号：US20210273208A1
公开(公告)日：2021-09-02
申请号：US17324626
申请日：2021-05-19
Applicant: Samsung Display Co., LTD.
Inventor： Heesung YANG , Seung Bae KANG , Bonggu KANG , Tae Wook KANG , Joon-Hwa BAE , Woojin CHO , Byoung Kwon CHOO
IPC: H01L51/56 , H01L21/311 , H01L21/3105
Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.
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