公开(公告)号：US20210043661A1

公开(公告)日：2021-02-11

申请号：US16927327

申请日：2020-07-13

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  H01L21/3105 ,  C09G1/02 ,  C09K3/14

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20250048735A1

公开(公告)日：2025-02-06

申请号：US18667362

申请日：2024-05-17

Applicant: Samsung Display Co., Ltd.

Inventor： Sung Jun KIM ,  Byoung Kwon CHOO ,  Seung Bae KANG ,  Sung Hoon MOON

IPC: H01L27/12

Abstract: According to an embodiment of the disclosure, a display device may include an active layer, a gate electrode disposed on the active layer, a first insulating layer disposed on the gate electrode, entirely covering the gate electrode, and including a flat surface, and a second insulating layer disposed on the first insulating layer and including a flat surface, and the first insulating layer and the second insulating layer may include inorganic materials different from each other.

公开(公告)号：US20210114163A1

公开(公告)日：2021-04-22

申请号：US17036062

申请日：2020-09-29

Applicant: Samsung Display Co., LTD. ,  KCTECH CO.,LTD.

Inventor： Seung Bae KANG ,  Sung Hyeon PARK ,  Jung Gun NAM ,  Joon-Hwa BAE ,  Kyung Bo LEE ,  Keun Woo LEE ,  Woo Jin CHO ,  Byoung Kwon CHOO

IPC: B24B37/015 ,  B24B37/04 ,  H01L27/32 ,  H01L51/00 ,  H01L51/56 ,  C03C19/00

Abstract: A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.

公开(公告)号：US20230240094A1

公开(公告)日：2023-07-27

申请号：US18099496

申请日：2023-01-20

Applicant: Samsung Display Co., LTD. ,  IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)

Inventor： Byoung Kwon CHOO ,  Jea Gun PARK ,  Seung Bae KANG ,  Sungjun KIM ,  Sung Hoon MOON

IPC: H10K59/12 ,  H10K59/131 ,  H10K59/124 ,  C09G1/02

CPC classification number: H10K59/1201 ,  H10K59/131 ,  H10K59/124 ,  C09G1/02

Abstract: Embodiments provide a slurry for polishing copper, a manufacturing method of a display device which uses the slurry, and the display device. The slurry for polishing copper includes an abrasive, a catalyst including a single molecule having an iron ion, a polishing suppressant, and an oxidizing agent.

公开(公告)号：US20200287171A1

公开(公告)日：2020-09-10

申请号：US16883780

申请日：2020-05-26

Applicant: Samsung Display Co., Ltd.

Inventor： Joon Hwa BAE ,  Hyun Jin CHO ,  Byoung Kwon CHOO ,  Woo Jin CHO

IPC: H01L51/56 ,  H01L27/32 ,  H01L27/12

Abstract: In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.

公开(公告)号：US20180108684A1

公开(公告)日：2018-04-19

申请号：US15702797

申请日：2017-09-13

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun Jin CHO ,  Joon-Hwa BAE ,  Byoung Kwon CHOO ,  Byung Hoon KANG ,  Kwang Suk KIM ,  Woo Jin CHO ,  Jun Hyuk CHEON

IPC: H01L27/12 ,  H01L21/3105 ,  H01L21/66 ,  C09G1/02 ,  B24B31/00

CPC classification number: H01L27/1248 ,  B24B31/00 ,  C09G1/02 ,  G09G3/3233 ,  G09G2300/0819 ,  G09G2300/0847 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/31053 ,  H01L22/26 ,  H01L27/1244 ,  H01L27/1255 ,  H01L27/1262 ,  H01L27/3258 ,  H01L27/3262 ,  H01L27/3265 ,  H01L27/3276 ,  H01L29/78675 ,  H01L2227/323

Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.

公开(公告)号：US20240251607A1

公开(公告)日：2024-07-25

申请号：US18628242

申请日：2024-04-05

Applicant: Samsung Display Co., Ltd.

Inventor： Byoung Kwon CHOO ,  Seung Bae KANG ,  Bong Gu KANG ,  Tae Joon KIM ,  Jeong Min PARK ,  Joon-Hwa BAE ,  Hee Sung YANG ,  Woo Jin CHO

IPC: H10K59/123 ,  H10K50/84 ,  H10K50/86 ,  H10K59/12 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00

CPC classification number: H10K59/123 ,  H10K50/84 ,  H10K50/865 ,  H10K59/38 ,  H10K59/40 ,  H10K71/00 ,  H10K59/1201

Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.

公开(公告)号：US20210288122A1

公开(公告)日：2021-09-16

申请号：US17019445

申请日：2020-09-14

Applicant: Samsung Display Co., LTD.

Inventor： Jae Sik KIM ,  Woo Yong SUNG ,  Byoung Kwon CHOO

IPC: H01L27/32 ,  H01L51/00 ,  H01L51/56

Abstract: A display device includes: a substrate; an inorganic insulating layer disposed on the substrate; a conductor disposed on the inorganic insulating layer; and an organic insulating layer disposed on the conductor, where an opening is defined through the organic insulating layer to expose a part of the upper surface of the conductor, and at least one material selected from a siloxane, a thiol, a phosphate, a disulfide including a sulfur series, and an amine is bonded on the part of the upper surface of the conductor exposed through the opening.

公开(公告)号：US20190148414A1

公开(公告)日：2019-05-16

申请号：US16243702

申请日：2019-01-09

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun Jin CHO ,  Joon-Hwa BAE ,  Byoung Kwon CHOO ,  Byung Hoon KANG ,  Kwang Suk KIM ,  Woo Jin CHO ,  Jun Hyuk CHEON

IPC: H01L27/12 ,  B24B31/00 ,  H01L21/3105 ,  G09G3/3233 ,  C09G1/02

CPC classification number: H01L27/1248 ,  B24B31/00 ,  C09G1/02 ,  G09G3/3233 ,  G09G2300/0819 ,  G09G2300/0847 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/31053 ,  H01L22/26 ,  H01L27/1244 ,  H01L27/1255 ,  H01L27/1262 ,  H01L27/3258 ,  H01L27/3262 ,  H01L27/3265 ,  H01L27/3276 ,  H01L29/78675 ,  H01L2227/323

Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.

公开(公告)号：US20180047762A1

公开(公告)日：2018-02-15

申请号：US15671638

申请日：2017-08-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joon-Hwa BAE ,  Byoung Kwon CHOO ,  Byung Hoon KANG ,  Woo Jin CHO ,  Hyun Jin CHO ,  Jun Hyuk CHEON ,  Jee-Hyun LEE

IPC: H01L27/12 ,  H01L21/02 ,  H01L29/786

CPC classification number: H01L27/1285 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/02675 ,  H01L21/02697 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/3212 ,  H01L21/76834 ,  H01L27/1222 ,  H01L27/127 ,  H01L29/66757 ,  H01L29/78672 ,  H01L29/7869 ,  H01L29/78696

Abstract: A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.