Integrated semiconductor device and process for manufacturing an integrated semiconductor device

    公开(公告)号:US11069587B2

    公开(公告)日:2021-07-20

    申请号:US16905486

    申请日:2020-06-18

    Abstract: An integrated semiconductor device and a method for manufacturing the integrated semiconductor device are disclosed. In an embodiment an integrated semiconductor device includes a supporting substrate having a first substrate face and a second substrate face opposite to the first substrate face, a semiconductor die having a first die face coupled to the first substrate face of the supporting substrate, the first die face including first die contact pads, wherein the supporting substrate has at least one through opening, wherein the first die contact pads are arranged facing the through opening, and wherein the supporting substrate comprises first substrate contact pads connected by first bonding wires to the respective first die contact pads through the through opening.

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