公开(公告)号：US3357641A

公开(公告)日：1967-12-12

申请号：US47752265

申请日：1965-08-05

Applicant: STANFORD RESEARCH INST

Inventor： MARTNER JOHN G

IPC: B06B1/06 ,  B06B3/02

CPC classification number: B06B3/02 ,  B06B1/0651 ,  Y10S261/48

公开(公告)号：US3292910A

公开(公告)日：1966-12-20

申请号：US41009664

申请日：1964-11-10

Applicant: STANFORD RESEARCH INST

Inventor： MARTNER JOHN G

IPC: G10K11/28

CPC classification number: G10K11/28 ,  Y10S261/48

公开(公告)号：US3667424A

公开(公告)日：1972-06-06

申请号：US3667424D

申请日：1969-04-14

Applicant: STANFORD RESEARCH INST

Inventor： CORNELIUS WILLIAM L ,  MARTNER JOHN G

IPC: C23C14/24 ,  C23C14/56 ,  C23C13/12

CPC classification number: C23C14/56 ,  C23C14/24

Abstract: A high-current vacuum system suitable for on-vacuum deposition of multiple layers onto a substrate. A vacuum chamber encloses a stationary substrate holder disposed above a plurality of vapor sources utilizing diverse heating elements. The vapor sources are arranged on a rotatable support for sequential movement to a deposition station for the vaporization and deposit of low and high temperature metals and dielectrics. Manipulators for making and breaking electrical contact to the station and for rotation of the support are positioned without the chamber and are externally operated to change sources without breaking vacuum. A liquid nitrogen cooled cold cam is situated between the station and the substrate support to funnel the vapor stream toward the stationary substrate target.

Abstract translation: 适用于将多层真空沉积到基底上的大电流真空系统。 真空室围绕设置在多个蒸气源上方的固定衬底保持器，其利用不同的加热元件。 蒸气源布置在可旋转支撑件上，用于顺序移动到沉积站，用于蒸发和沉积低温和高温金属和电介质。 用于制造和断开与工位的电接触和用于支撑件的旋转的操纵器被定位而没有室，并且在外部操作以改变源而不破坏真空。 液氮冷却冷凸轮位于工位和衬底支架之间，以将蒸气流向静止衬底靶漏斗。

公开(公告)号：US3661117A

公开(公告)日：1972-05-09

申请号：US3661117D

申请日：1969-12-03

Applicant: STANFORD RESEARCH INST

Inventor： CORNELIUS WILLIAM L ,  MARTNER JOHN G

IPC: C23C14/04 ,  C23C14/24 ,  C23C13/12

CPC classification number: C23C14/228 ,  C23C14/04 ,  C23C14/24 ,  C23C14/243

Abstract: An apparatus for depositing thin lines of conducting, semiconducting or dielectric material on a substrate including a crucible having a vaporizable material charge receiving chamber and a vapor chamber. A first tube for introducing a flow of carrier gas and a heated capillary tube penetrate the vapor compartment. On heating the crucible to a temperature above the evaporation temperature of the charge, the charge evaporates and is pushed through the capillary tube by the carrier gas. The stream of carrier gas and vapor deposits dots or lines on the target. Patterns are produced by translating the target with respect to the crucible.

Abstract translation: 一种在包括具有可蒸发材料电荷接收室和蒸气室的坩埚的基板上沉积导电，半导体或介电材料的细线的装置。 用于引入载气流和加热的毛细管的第一管穿透蒸气室。 在将坩埚加热到高于蒸发温度的电荷的温度下，电荷蒸发并被载气通过毛细管推动。 载气和蒸汽流在目标上沉积点或线。 通过相对于坩埚翻译目标产生图案。

公开(公告)号：US3335602A

公开(公告)日：1967-08-15

申请号：US36695264

申请日：1964-05-13

Applicant: STANFORD RESEARCH INST

Inventor： MARTNER JOHN G

IPC: G01N19/04

CPC classification number: G01N19/04