公开(公告)号：US11823923B2

公开(公告)日：2023-11-21

申请号：US17860202

申请日：2022-07-08

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  B65G49/07 ,  H01L21/677 ,  F24F3/167 ,  F24F7/08 ,  H01L21/673 ,  F24F7/003 ,  B01D53/40 ,  B01D53/42 ,  C12M1/12 ,  F24F6/00 ,  H01L21/687

CPC classification number: H01L21/67196 ,  B01D53/04 ,  B01D53/40 ,  B01D53/42 ,  B65G49/07 ,  C12M37/00 ,  F24F3/167 ,  F24F6/00 ,  F24F7/003 ,  F24F7/06 ,  F24F7/065 ,  F24F7/08 ,  F24F13/28 ,  H01L21/67017 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67766 ,  H01L21/68707 ,  B01D2258/02

Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter.
The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

公开(公告)号：US10923372B2

公开(公告)日：2021-02-16

申请号：US15757560

申请日：2016-08-19

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Yasushi Taniyama ,  Munekazu Komiya ,  Takashi Shigeta

IPC: F16K31/122 ,  H01L21/673 ,  F16K15/14 ,  H01L21/677 ,  F16K15/02

Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.

公开(公告)号：US11424145B2

公开(公告)日：2022-08-23

申请号：US16845555

申请日：2020-04-10

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  F24F7/00 ,  B65G49/07 ,  H01L21/677 ,  F24F3/167 ,  F24F7/08 ,  H01L21/673 ,  B01D53/40 ,  B01D53/42 ,  C12M1/12 ,  F24F6/00 ,  H01L21/687

Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter.
The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

公开(公告)号：US10586723B2

公开(公告)日：2020-03-10

申请号：US15750379

申请日：2016-07-12

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Yasushi Taniyama ,  Munekazu Komiya ,  Takashi Shigeta

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673

Abstract: A door opening/closing system includes: a base as part of a wall isolating a conveyance space from an external space; an opening portion provided in the base; a door configured to open/close the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door; a sealed space constituted by the base, the first and second seal members, a lid member, and the door when the container state of contact with the opening portion with the first seal member therebetween; a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit which evacuates the sealed space. The door opening/closing system prevents entry of atmospheric air into a front-opening unified pod and an equipment front end module when placed in communication.

公开(公告)号：US20180047602A1

公开(公告)日：2018-02-15

申请号：US15554152

申请日：2016-02-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673

Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.

公开(公告)号：US20180040493A1

公开(公告)日：2018-02-08

申请号：US15554135

申请日：2016-02-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  B01D53/42 ,  C12M1/12 ,  F24F13/28 ,  F24F6/00 ,  H01L21/687 ,  B01D53/40 ,  F24F7/06

Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

公开(公告)号：US10930537B2

公开(公告)日：2021-02-23

申请号：US16774758

申请日：2020-01-28

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Yasushi Taniyama ,  Munekazu Komiya ,  Takashi Shigeta

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673

Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system. The door opening/closing system is provided with: a base which constitutes a part of a wall isolating a conveyance space from an external space, an opening portion provided in the base; a door which is capable of opening and closing the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door, a sealed space which is constituted by the base, the first seal member, the second seal member, a lid member, and the door when the container is in a state of contact with the opening portion with the first seal member therebetween, a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit 88 which evacuates the sealed space.

公开(公告)号：US10672632B2

公开(公告)日：2020-06-02

申请号：US15554135

申请日：2016-02-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  B01D53/40 ,  B01D53/42 ,  C12M1/12 ,  F24F13/28 ,  F24F6/00 ,  F24F7/06 ,  H01L21/687 ,  B01D53/04 ,  F24F7/00 ,  B65G49/07 ,  H01L21/677

Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

公开(公告)号：US10658217B2

公开(公告)日：2020-05-19

申请号：US15554152

申请日：2016-02-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673 ,  H01L21/02

Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.

公开(公告)号：US20240038554A1

公开(公告)日：2024-02-01

申请号：US18484546

申请日：2023-10-11

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  B65G49/07 ,  H01L21/677 ,  F24F3/167 ,  F24F7/08 ,  H01L21/673 ,  F24F7/003 ,  B01D53/40 ,  B01D53/42 ,  C12M1/12 ,  F24F6/00 ,  H01L21/687

CPC classification number: H01L21/67196 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  B65G49/07 ,  H01L21/67766 ,  H01L21/67017 ,  F24F3/167 ,  F24F7/065 ,  F24F7/08 ,  H01L21/67389 ,  H01L21/67393 ,  F24F7/003 ,  B01D53/40 ,  B01D53/42 ,  C12M37/00 ,  F24F6/00 ,  H01L21/68707 ,  B01D2258/02

Abstract: The EFEM comprises: a transfer chamber in which a transfer robot is disposed, a first fan that forms a downward air flow in the transfer chamber, a gas return space that circulates the gas flowing downward in the transfer chamber above the first fan, a box that communicates with the transfer chamber and is provided with a gas outlet, and a connecting and disconnecting means configured to switch connection and disconnection of the box to and from the transport chamber. A circulation path in which gas circulates is formed by the transfer chamber, the gas return space, and the box. When the transfer chamber and the box are separated by the connecting and disconnecting means, a shortened circulation path is formed in which the gas circulates without passing through the box.