公开(公告)号：US11203703B2

公开(公告)日：2021-12-21

申请号：US16247730

申请日：2019-01-15

申请人： SAMSUNG DISPLAY CO., LTD. ,  UBmaterials Inc.

发明人： Hyunjin Cho ,  Joonhwa Bae ,  Byoungkwon Choo ,  Woojin Cho ,  Jinhyung Park

IPC分类号： H01L21/321 ,  H01L21/3105 ,  H01L21/306 ,  H01L21/302 ,  C09K3/14 ,  C09G1/04 ,  C09G1/02 ,  C09G1/00 ,  B24B37/04

摘要： A polishing slurry includes an abrasive material, a first oxide polishing promoter, a first nitride polishing inhibitor, and a second nitride polishing inhibitor. The first oxide polishing promoter includes a polymer-based oxide polishing promoter. The first nitride polishing inhibitor includes an anionic nitride polishing inhibitor. The second nitride polishing inhibitor includes at least one selected from a cationic nitride polishing inhibitor and a non-ionic nitride polishing inhibitor.

公开(公告)号：US09969047B2

公开(公告)日：2018-05-15

申请号：US15138630

申请日：2016-04-26

申请人： Samsung Display Co., Ltd.

发明人： Joowoan Cho ,  Hyunjin Cho ,  Byoungkwon Choo ,  Oleg Prudnikov ,  Jeongkyun Na ,  Sanghoon Ahn ,  Seunghwan Lee ,  Byoungho Cheong

IPC分类号： B24B37/20

CPC分类号： B24B37/20 ,  B24B27/0015 ,  B24B27/0076 ,  B24B37/10

摘要： A substrate polishing apparatus includes a support part on which at least one substrate is disposed, a plurality of first moving parts disposed at both opposite sides of the support part in a second direction crossing a first direction, and configured to upwardly extend and reciprocate in the first direction, a second moving part disposed between the plurality of first moving parts in the second direction and connected to an upper side of the first moving parts, a plurality of polishing units disposed at a lower portion of the second moving part and configured to contact an upper surface of the substrate, and a plurality of nozzles disposed at the lower portion of the second moving part and configured to spray slurry to the substrate where the polishing units rotate and revolve along a predetermined trajectory.

公开(公告)号：US09460922B1

公开(公告)日：2016-10-04

申请号：US14937068

申请日：2015-11-10

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Sanghoon Ahn ,  Byoungkwon Choo ,  Byoungho Cheong ,  Jeongkyun Na ,  Seung Hwan Lee ,  Joowoan Cho ,  Hyunjin Cho ,  Oleg Prudnikov

IPC分类号： H01L21/331 ,  H01L21/02 ,  G02B27/28

CPC分类号： H01L21/02675 ,  B23K26/0604 ,  B23K26/0676 ,  B23K26/352 ,  B23K2103/56 ,  G02B27/283 ,  G02B27/286 ,  H01L21/268

摘要： A method of manufacturing a display apparatus includes forming an amorphous silicon layer on a substrate, splitting a first laser beam emitted from a first laser source into a first master beam in a first polarization state and a second master beam in a second polarization state, changing the first polarization state of the first master beam to the second polarization state to output a third master beam having the second polarization state and corresponding to the first master beam having the second polarization state, combining the second master beam with the third master beam to output a merged laser beam, and irradiating the amorphous silicon layer with the merged laser beam to form a polysilicon layer.

摘要翻译： 制造显示装置的方法包括在基板上形成非晶硅层，将从第一激光源发射的第一激光束分成第一偏振态的第一主光束和第二偏振状态的第二主光束， 将第一主光束的第一偏振状态转换到第二偏振状态，以输出具有第二偏振状态并对应于具有第二偏振状态的第一主光束的第三主光束，将第二主光束与第三主光束组合以输出 合并的激光束，并且用合并的激光束照射非晶硅层以形成多晶硅层。

公开(公告)号：US20160284546A1

公开(公告)日：2016-09-29

申请号：US14857302

申请日：2015-09-17

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Joowoan Cho ,  Byoungho Cheong ,  Byoungkwon Choo ,  Jeongkyun Na ,  Sanghoon Ahn ,  Hyunjin Cho

IPC分类号： H01L21/02 ,  H01L29/16 ,  H01L29/66 ,  H01L29/04

CPC分类号： H01L21/02675 ,  B23K26/00 ,  B23K26/0608 ,  B23K26/0643 ,  B23K26/352 ,  H01L21/02532 ,  H01L21/02691 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/16 ,  H01L29/1604 ,  H01L29/6675 ,  H01L29/66757 ,  Y02P70/605

摘要： A method of manufacturing a substrate includes: irradiating, along a first path, a laser beam emitted from a source onto a substrate, wherein the substrate includes a target layer of the laser beam, and wherein the substrate is disposed on a stage; and irradiating, along a second path, a portion the laser beam, which was emitted from the source and reached the target layer, by reflecting the laser beam back onto the target layer using a reflection mirror. An area of a second region of the target layer is greater than an area of a first region of the target layer, wherein the laser beam is irradiated along the second path in the second region, and the laser beam is irradiated along the first path in the first region.

摘要翻译： 一种制造衬底的方法包括：沿着第一路径照射从源发射到衬底上的激光束，其中衬底包括激光束的目标层，并且其中衬底设置在平台上; 并且通过使用反射镜将激光束反射回目标层，沿着第二路径照射从源发射并到达目标层的激光束的一部分。 目标层的第二区域的面积大于目标层的第一区域的面积，其中沿第二区域的第二路径照射激光束，沿着第一路径照射激光束 第一个地区。

公开(公告)号：US09786499B2

公开(公告)日：2017-10-10

申请号：US15460612

申请日：2017-03-16

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Joowoan Cho ,  Byoungho Cheong ,  Byoungkwon Choo ,  Jeongkyun Na ,  Sanghoon Ahn ,  Hyunjin Cho

IPC分类号： H01L21/02 ,  H01L29/04 ,  H01L29/16 ,  H01L29/66

CPC分类号： H01L21/02675 ,  B23K26/00 ,  B23K26/0608 ,  B23K26/0643 ,  B23K26/352 ,  H01L21/02532 ,  H01L21/02691 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/16 ,  H01L29/1604 ,  H01L29/6675 ,  H01L29/66757 ,  Y02P70/605

摘要： A method of manufacturing a substrate includes: irradiating, along a first path, a laser beam emitted from a source onto a substrate, wherein the substrate includes a target layer of the laser beam, and wherein the substrate is disposed on a stage; and irradiating, along a second path, a portion the laser beam, which was emitted from the source and reached the target layer, by reflecting the laser beam back onto the target layer using a reflection mirror. An area of a second region of the target layer is greater than an area of a first region of the target layer, wherein the laser beam is irradiated along the second path in the second region, and the laser beam is irradiated along the first path in the first region.

公开(公告)号：US09633845B2

公开(公告)日：2017-04-25

申请号：US14857302

申请日：2015-09-17

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Joowoan Cho ,  Byoungho Cheong ,  Byoungkwon Choo ,  Jeongkyun Na ,  Sanghoon Ahn ,  Hyunjin Cho

IPC分类号： H01L21/02 ,  H01L29/04 ,  H01L29/16 ,  H01L29/66 ,  B23K26/00

CPC分类号： H01L21/02675 ,  B23K26/00 ,  B23K26/0608 ,  B23K26/0643 ,  B23K26/352 ,  H01L21/02532 ,  H01L21/02691 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/16 ,  H01L29/1604 ,  H01L29/6675 ,  H01L29/66757 ,  Y02P70/605

摘要： A method of manufacturing a substrate includes: irradiating, along a first path, a laser beam emitted from a source onto a substrate, wherein the substrate includes a target layer of the laser beam, and wherein the substrate is disposed on a stage; and irradiating, along a second path, a portion the laser beam, which was emitted from the source and reached the target layer, by reflecting the laser beam back onto the target layer using a reflection mirror. An area of a second region of the target layer is greater than an area of a first region of the target layer, wherein the laser beam is irradiated along the second path in the second region, and the laser beam is irradiated along the first path in the first region.