公开(公告)号：US10898957B2

公开(公告)日：2021-01-26

申请号：US15922838

申请日：2018-03-15

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Masaaki Tanabe ,  Hisao Nagai ,  Takeshi Koiwasaki ,  Takafumi Okuma

IPC: B22F9/14 ,  B01J19/08 ,  C01B33/021 ,  B22F1/00 ,  C01B32/956 ,  B22F9/16

Abstract: A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.

公开(公告)号：US10124406B2

公开(公告)日：2018-11-13

申请号：US15915017

申请日：2018-03-07

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takeshi Koiwasaki ,  Masaaki Tanabe ,  Takafumi Okuma

IPC: B22F9/14 ,  C04B35/10 ,  B22F1/00 ,  H01J37/32 ,  H05H1/42 ,  C04B35/628

Abstract: A production apparatus for fine particles includes a vacuum chamber, a material supply device, a plurality of electrodes arranged and a collection device connecting to the other end of the vacuum chamber and collecting fine particles, which generates plasma and produces fine particles from the material particles, in which a first electrode arrangement region on the material supply port's side and a second electrode arrangement region apart from the first electrode arrangement region to the collection device's side which respectively cross a direction in which the material flows between the vicinity of the material supply port and the collection device are provided in the intermediate part of the vacuum chamber, and both the first electrode arrangement region and the second electrode arrangement region are provided with a plurality of electrodes respectively to form the electrodes in multi-stages.

公开(公告)号：US10974220B2

公开(公告)日：2021-04-13

申请号：US16255135

申请日：2019-01-23

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takeshi Koiwasaki ,  Takafumi Okuma

IPC: B01J19/08 ,  B22F9/14 ,  B22F1/00

Abstract: A fine particle producing apparatus includes a reaction chamber extending vertically from the lower side to the upper side; a material supply device which is connected to a central part on one end side of the vertically lower side inside the reaction chamber and supplies a material particle into the reaction chamber of a vertically upper side from a material supply port; a first electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the material supply device, and includes a plurality of lower electrodes to which AC power is applied; a second electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the first electrode arrangement region, and includes a plurality of upper electrodes to which AC power is applied; a collector which is connected to the other end side in the reaction chamber of the vertically upper side so as to collect fine particles; a power source which is capable of changing a frequency of AC power applied to at least one of the lower electrode included in the first electrode arrangement region and the upper electrode included in the second electrode arrangement region; and a controller which sets the frequency of AC power applied to the lower electrode as a frequency equal to or higher than a frequency of AC power applied to the upper electrode, in which a fine particle is generated from the material particle by generating arc discharge by the lower electrode and the upper electrode, and generating plasma in the reaction chamber.

公开(公告)号：US10882114B2

公开(公告)日：2021-01-05

申请号：US16251040

申请日：2019-01-17

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takafumi Okuma

IPC: B22F9/14 ,  C04B35/622 ,  C04B35/14 ,  C04B35/111 ,  C04B35/573 ,  C04B35/591 ,  C04B35/628 ,  B22F1/00 ,  C01F7/02

Abstract: An apparatus and a method for producing fine particles includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeing ports, and a plurality of electrodes connected to the vacuum chamber. Tip ends of the electrodes protrude into the vacuum chamber to generate plasma, and a collecting device is connected to the vacuum chamber and collects fine particles. The electrodes generate discharge inside the vacuum chamber and produce the fine particles from the material. The material feeding ports of the material feeding device are arranged in a lower side than (below) the plural electrodes in the vertical direction in the vacuum chamber.

公开(公告)号：US11280027B2

公开(公告)日：2022-03-22

申请号：US16637553

申请日：2018-11-21

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Takahide Hirasaki ,  Daisuke Suetsugu ,  Takafumi Okuma

IPC: C30B25/06 ,  C30B29/38 ,  C30B29/42 ,  C30B29/44 ,  C30B29/20 ,  C23C14/06 ,  C30B29/22 ,  C30B25/18 ,  C23C14/34 ,  C30B29/36

Abstract: A composite nitride-based film structure includes a bulk single crystal, a plurality of nitride microcrystals, and an amorphous nitride thin film. The plurality of nitride microcrystals is provided on the bulk single crystal, and has a specific orientation relationship with a crystal structure of the bulk single crystal. The nitride thin film is provided on the bulk single crystal, surrounds the nitride microcrystal, and covers a surface of the bulk single crystal.

公开(公告)号：US10363540B2

公开(公告)日：2019-07-30

申请号：US15430439

申请日：2017-02-10

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Takeshi Koiwasaki ,  Hisao Nagai ,  Takafumi Okuma

IPC: B01J19/08 ,  H01J37/32

Abstract: A production apparatus for fine particles includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a fine particle collection device connected to the vacuum chamber and collecting fine particles. The fine particles are produced from the material by generating electric discharge inside the vacuum chamber. The apparatus includes an inner chamber which forms an outside space with respect to the vacuum chamber installed between a wall of the vacuum chamber and a plasma generation region and gas supply pipes which supply a gas to the outside space between the wall of the vacuum chamber and a wall of the inner chamber.

公开(公告)号：US10226821B2

公开(公告)日：2019-03-12

申请号：US14885979

申请日：2015-10-16

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takafumi Okuma

IPC: B22F9/14 ,  C04B35/626 ,  C04B35/14 ,  C04B35/111 ,  C04B35/573 ,  C04B35/591 ,  C04B35/628 ,  B22F1/00 ,  C01F7/02

Abstract: An apparatus and a method for producing fine particles capable of increasing the production and producing fine particles at low costs by feeding a large quantity of material efficiently into the plasma. The apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeing ports, a plurality of electrodes connected to the vacuum chamber, tip ends of which protrude into the vacuum chamber to generate plasma and a collecting device connected to the vacuum chamber and collecting fine particles, which generates discharge inside the vacuum chamber and produces the fine particles from the material, in which the material feeding ports of the material feeding device are arranged in a lower side than the plural electrodes in the vertical direction in the vacuum chamber.

公开(公告)号：US11021788B2

公开(公告)日：2021-06-01

申请号：US16205166

申请日：2018-11-29

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Takafumi Okuma ,  Daisuke Suetsugu ,  Takahide Hirasaki

IPC: C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  H01L21/02 ,  H01L21/3205

Abstract: A sputtering method of forming a thin film by allowing a target material to react with a gas includes narrowing down film deposition conditions from an existing period of nitrogen radicals by focusing on a nitriding process in thin-film forming processes when the thin film is formed by pulsing a waveform of electric current from a DC power supply at the time of generating plasma and applying the electric current to the target material.

公开(公告)号：US10252339B2

公开(公告)日：2019-04-09

申请号：US15251840

申请日：2016-08-30

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takeshi Koiwasaki ,  Daisuke Suetsugu ,  Takafumi Okuma

IPC: B22F9/16 ,  B01J19/08 ,  C01B21/068 ,  C01B33/021 ,  C01B33/18 ,  C01F7/02 ,  B22F9/14 ,  C01B32/956

Abstract: To provide an apparatus and a method of producing fine particles capable of increasing evaporation efficiency of a material, increasing the production of fine particles and reducing costs by heating the inputted material by a gas heated by thermal plasma. A fine particle production apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a collection device connected to the vacuum chamber and collecting fine particles, which produces the fine particles from the material by generating electric discharge inside the vacuum chamber, in which the collection device and the material feeding device are connected by piping, and a material heating and circulation device which heats the material by heat of a gas inside the chamber heated by the plasma through the piping is provided.