公开(公告)号：US10898957B2

公开(公告)日：2021-01-26

申请号：US15922838

申请日：2018-03-15

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Masaaki Tanabe ,  Hisao Nagai ,  Takeshi Koiwasaki ,  Takafumi Okuma

IPC: B22F9/14 ,  B01J19/08 ,  C01B33/021 ,  B22F1/00 ,  C01B32/956 ,  B22F9/16

Abstract: A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.

公开(公告)号：US10124406B2

公开(公告)日：2018-11-13

申请号：US15915017

申请日：2018-03-07

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Hisao Nagai ,  Takeshi Koiwasaki ,  Masaaki Tanabe ,  Takafumi Okuma

IPC: B22F9/14 ,  C04B35/10 ,  B22F1/00 ,  H01J37/32 ,  H05H1/42 ,  C04B35/628

Abstract: A production apparatus for fine particles includes a vacuum chamber, a material supply device, a plurality of electrodes arranged and a collection device connecting to the other end of the vacuum chamber and collecting fine particles, which generates plasma and produces fine particles from the material particles, in which a first electrode arrangement region on the material supply port's side and a second electrode arrangement region apart from the first electrode arrangement region to the collection device's side which respectively cross a direction in which the material flows between the vicinity of the material supply port and the collection device are provided in the intermediate part of the vacuum chamber, and both the first electrode arrangement region and the second electrode arrangement region are provided with a plurality of electrodes respectively to form the electrodes in multi-stages.

公开(公告)号：US11094515B2

公开(公告)日：2021-08-17

申请号：US15834036

申请日：2017-12-06

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Daisuke Suetsugu ,  Masaaki Tanabe ,  Akira Okuda ,  Yosimasa Takii

IPC: H01J37/34 ,  H01J37/32 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C14/54 ,  C23C14/06 ,  H01L21/02

Abstract: A sputtering apparatus has a vacuum chamber capable of arranging a target material and a substrate therein so as to face each other, a DC power supply capable of electrically being connected to the target material, and a pulsing unit pulsing electric current flowing in the target material from the DC power supply, in which plasma is generated in the vacuum chamber to form a thin film on the substrate, including an ammeter measuring electric current flowing in the pulsing unit from the DC power supply, a power supply controller performing feedback control of the DC power supply so that a current value measured by the ammeter becomes a prescribed value and a pulse controller indicating a pulse cycle shifted from a control cycle of the DC power supply by the power supply controller to the pulsing unit.