-
公开(公告)号:US11732362B2
公开(公告)日:2023-08-22
申请号:US16781813
申请日:2020-02-04
发明人: Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
CPC分类号: C23C16/50 , B81B3/0018 , H01L21/67271 , H01L21/67282 , H01L21/67294 , H01L24/75 , H01L24/95 , H01L2224/95001 , H01L2224/95101 , H01L2224/95115 , H01L2224/95144 , H01L2224/95145 , H01L2924/10253 , H01L2924/1434 , H01L2924/1461
摘要: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
-
公开(公告)号:US20210356951A1
公开(公告)日:2021-11-18
申请号:US17391381
申请日:2021-08-02
发明人: Ion Matei , Jeng Ping Lu , Saigopal Nelaturi , Julie A. Bert , Lara S. Crawford , Armin R. Volkel , Eugene M. Chow
摘要: The system and method described allow for real-time control over positioning of a micro-object. A movement of at least one micro-object suspended in a medium can be induced by a generation of one or more forces by electrodes proximate to the micro-object. Prior to inducing the movement, a simulation is used to develop a model describing a parameter of an interaction between each of the electrodes and the micro-object. A function describing the forces generated by an electrode and an extent of the movement induced due to the forces is generated using the model. The function is used to design closed loop policy control scheme for moving the micro-object towards a desired position. The position of the micro-object is tracked and taken into account when generating voltage patterns in the scheme.
-
公开(公告)号:US11148941B2
公开(公告)日:2021-10-19
申请号:US16237316
申请日:2018-12-31
发明人: Anne Plochowietz , Eugene M. Chow , Jengping Lu , Julie A. Bert , David K. Biegelsen , Bradley Rupp , Sourobh Raychaudhuri
摘要: Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause phototransistors or electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler.
-
公开(公告)号:US11079747B2
公开(公告)日:2021-08-03
申请号:US16734147
申请日:2020-01-03
发明人: Ion Matei , Jeng Ping Lu , Saigopal Nelaturi , Julie A. Bert , Lara S. Crawford , Armin R. Volkel , Eugene M. Chow
摘要: The system and method described allow for real-time control over positioning of a micro-object. A movement of at least one micro-object suspended in a medium can be induced by a generation of one or more forces by electrodes proximate to the micro-object. Prior to inducing the movement, a simulation is used to develop a model describing a parameter of an interaction between each of the electrodes and the micro-object. A function describing the forces generated by an electrode and an extent of the movement induced due to the forces is generated using the model. The function is used to design closed loop policy control scheme for moving the micro-object towards a desired position. The position of the micro-object is tracked and taken into account when generating control signals in the scheme.
-
公开(公告)号:US20200173026A1
公开(公告)日:2020-06-04
申请号:US16781813
申请日:2020-02-04
发明人: Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
摘要: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
-
公开(公告)号:US10604843B2
公开(公告)日:2020-03-31
申请号:US15591959
申请日:2017-05-10
发明人: Yunda Wang , Sourobh Raychaudhuri , JengPing Lu , Eugene M. Chow , Julie A. Bert , David Biegelsen , George A. Gibson , Jamie Kalb
摘要: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.
-
公开(公告)号:US20180182650A1
公开(公告)日:2018-06-28
申请号:US15391140
申请日:2016-12-27
IPC分类号: H01L21/67 , H01L21/68 , H01L21/683
CPC分类号: H01L21/67121 , B81C3/004 , B81C99/002 , H01L21/68 , H01L21/6835 , H01L21/6875 , H01L23/5386 , H01L24/95 , H01L25/0655 , H01L25/50 , H01L2221/68368 , H01L2224/95085 , H01L2224/95133
摘要: An apparatus including a bumped electrode array and a method of fabricating a bumped electrode array is disclosed. The method includes providing a substrate for the electrode array. The method also includes disposing a plurality of non-planar structures including electrodes above the substrate of the electrode array. The method further includes disposing a dielectric layer above the plurality of non-planar structures having a defined radius of curvature.
-
公开(公告)号:US20220153576A1
公开(公告)日:2022-05-19
申请号:US17665305
申请日:2022-02-04
发明人: Anne Plochowietz , Bradley Rupp , Jengping Lu , Julie A. Bert , Lara S. Crawford , Sourobh Raychaudhuri , Eugene M. Chow , Matthew Shreve , Sergey Butylkov
摘要: Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.
-
公开(公告)号:US20200207617A1
公开(公告)日:2020-07-02
申请号:US16237419
申请日:2018-12-31
发明人: Anne Plochowietz , Bradley Rupp , Jengping Lu , Julie A. Bert , Lara S. Crawford , Sourobh Raychaudhuri , Eugene M. Chow , Matthew Shreve , Sergey Butylkov
摘要: Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.
-
10.
公开(公告)号:US10558204B2
公开(公告)日:2020-02-11
申请号:US15469433
申请日:2017-03-24
发明人: Ion Matei , Jeng Ping Lu , Saigopal Nelaturi , Julie A. Bert , Lara S. Crawford , Armin R. Volkel , Eugene M. Chow
摘要: The system and method described below allow for real-time control over positioning of a micro-object. A movement of at least one micro-object suspended in a medium can be induced by a generation of one or more forces by electrodes proximate to the micro-object. Prior to inducing the movement, a simulation is used to develop a model describing a parameter of an interaction between each of the electrodes and the micro-object. A function describing the forces generated by an electrode and an extent of the movement induced due to the forces is generated using the model. The function is used to design closed loop policy control scheme for moving the micro-object towards a desired position. The position of the micro-object is tracked and taken into account when generating control signals in the scheme.
-
-
-
-
-
-
-
-
-