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公开(公告)号：US07053387B2
公开(公告)日：2006-05-30
申请号：US10639165
申请日：2003-08-11
Applicant: Osamu Masuda , Kazumi Furuta
Inventor： Osamu Masuda , Kazumi Furuta
IPC: G21K5/10
CPC classification number: H01J37/3045 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G02B5/1876 , G11B7/13922 , H01J37/3174 , H01J2237/30461 , H01J2237/31764 , H01J2237/31766
Abstract: A pattern drawing method of drawing a desired pattern on a base material by irradiating an electronic beam and scanning the base material with the electronic beam with a predetermined dose amount, comprising: a first step of drawing a first region on the base material by scanning with the electronic beam with a first dose amount; a second step of drawing a second region on the base material by scanning with the electronic beam with a second dose amount; and a inclining step of inclining a boundary between the first region and the second region to form an inclined surface by conducting a first scanning to scan with the electronic beam with the first dose amount and a second scanning to scan with the electronic beam with the second does amount in a mixed arrangement.
Abstract translation: 一种通过用电子束照射电子束并用电子束以预定剂量扫描基底材料来在基材上绘制所需图案的图案描绘方法，包括：第一步骤，通过扫描基底材料上的第一区域， 具有第一剂量的电子束; 第二步骤，通过用第二剂量的电子束扫描来在基材上绘制第二区域; 以及倾斜步骤，通过用电子束以第一剂量进行第一次扫描扫描以及第二次扫描，使第二区域和第二区域之间的边界倾斜以形成倾斜表面，并用第二扫描电子束扫描第二扫描 确实是混合排列的。
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公开(公告)号：US20050213209A1
公开(公告)日：2005-09-29
申请号：US11088117
申请日：2005-03-23
Applicant: Hiroshi Miyakoshi , Kazumi Furuta , Masahiro Morikawa , Osamu Masuda , Makiko Imae
Inventor： Hiroshi Miyakoshi , Kazumi Furuta , Masahiro Morikawa , Osamu Masuda , Makiko Imae
IPC: B29C43/02 , B29C43/52 , B29C59/02 , B29D11/00 , C03B11/08 , C03B11/12 , C03B11/16 , G11B7/00 , G11B7/135 , G11B7/22
CPC classification number: B29C43/52 , B29C33/08 , B29C33/30 , B29C43/021 , B29C59/02 , B29C2035/1616 , B29C2043/023 , B29C2043/3634 , B29C2059/023 , B29D11/00365 , B29L2011/0016 , C03B11/082 , C03B11/125 , C03B11/16 , C03B2215/412 , C03B2215/60 , C03B2215/69 , G11B7/1365 , G11B7/22 , G11B2007/0006 , Y10S425/808
Abstract: There is described a molding method for molding a product, having a microscopic structure of high aspect ratio. The molding method includes the steps of: setting a temperature of a mold, having a microscopic shape, at a value higher than a glass transition temperature of a material being deformable with heat; pushing the mold against the material at a first velocity, after the material is positioned opposite to the mold so that the microscopic shape contacts the material; pushing the mold against the material at a second velocity being faster than the first velocity; and releasing the mold from the material. The pushing pressure for pushing the mold against the material at the first velocity is equal to or smaller than a half of that for pushing the mold against the material at the second velocity.
Abstract translation: 描述了具有高纵横比的微观结构的产品成型模制方法。 成型方法包括以下步骤：将具有微观形状的模具的温度设定为高于可热变形材料的玻璃化转变温度的值; 在材料与模具相对定位以使微观形状接触材料之后，将模具以第一速度推压到材料上; 以比第一速度快的第二速度推动模具抵靠材料; 并从该材料中释放模具。 以第一速度推动模具抵靠材料的推压力等于或小于以第二速度将模具推向材料的推压压力的一半。
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公开(公告)号：US07319558B2
公开(公告)日：2008-01-15
申请号：US11360947
申请日：2006-02-23
Applicant: Osamu Masuda , Kazumi Furuta , Makiko Imae
Inventor： Osamu Masuda , Kazumi Furuta , Makiko Imae
IPC: G02B5/30
CPC classification number: G02B5/3083 , G02B5/1809
Abstract: A wide-band wave plate having at least two wave plates, each of which has a microstructure to generate a phase difference, the microstructure having a cycle not shorter than 1/nmin of a shortest wavelength of light in use, wherein the two wave plates are arranged to face opposite with their main axes in non-parallel with each other, wherein nmin is a refractive index of a wave plate material with respect to the shortest wavelength.
Abstract translation: 具有至少两个波片的宽带波片，每个波片具有微结构以产生相位差，所述微结构具有不短于最短波长的光的1 / n 的周期 在使用中，其中两个波片布置成彼此不平行地与其主轴线相对，其中n分钟是波片材料相对于最短波长的折射率 。
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公开(公告)号：US20060193045A1
公开(公告)日：2006-08-31
申请号：US11360947
申请日：2006-02-23
Applicant: Osamu Masuda , Kazumi Furuta , Makiko Imae
Inventor： Osamu Masuda , Kazumi Furuta , Makiko Imae
CPC classification number: G02B5/3083 , G02B5/1809
Abstract: A wide-band wave plate having at least two wave plates, each of which has a microstructure to generate a phase difference, the microstructure having a cycle not shorter than 1/nmin of a shortest wavelength of light in use, wherein the two wave plates are arranged to face opposite with their main axes in non-parallel with each other, wherein nmin is a refractive index of a wave plate material with respect to the shortest wavelength.
Abstract translation: 具有至少两个波片的宽带波片，每个波片具有微结构以产生相位差，所述微结构具有不短于最短波长的光的1 / n 的周期 在使用中，其中两个波片布置成彼此不平行地与其主轴线相对，其中n分钟是波片材料相对于最短波长的折射率 。
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公开(公告)号：US20050018496A1
公开(公告)日：2005-01-27
申请号：US10897344
申请日：2004-07-22
Applicant: Osamu Masuda , Kazumi Furuta , Kunito Hayashi , Kazuhiko Kobayashi
Inventor： Osamu Masuda , Kazumi Furuta , Kunito Hayashi , Kazuhiko Kobayashi
IPC: G11C5/00 , H01J37/302 , H01J37/304 , H01J37/317
CPC classification number: H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/31761
Abstract: The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.
Abstract translation: 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起点到终点距离L（S502），并且扫描时间计算装置312基于开始时间计算装置312计算写入写入模式所需的扫描时钟数， 端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离（S503）。 计数转换装置605将起点到终点距离L分离为X和Y分量，以使用扫描时钟数在等式中转换它们（S504）。 基于该方程，可变速率计算装置314计算消光比以确定可变衰减器307处的消光比（S505）。 ATT D / A转换器303指定衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离，使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离
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Patent Agency Ranking
公开(公告)号：US07001709B2
公开(公告)日：2006-02-21
申请号：US10392667
申请日：2003-03-20
Applicant: Osamu Masuda , Kazumi Furuta
Inventor： Osamu Masuda , Kazumi Furuta
IPC: B23K15/00 , H01J37/302
CPC classification number: B23K26/0734
Abstract: A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam source and the base material to scan the beam on a second pattern-drawn field located next to the first pattern-drawn field in such a way that a boundary between the first pattern-drawn field and the second pattern-drawn field is positioned at a joint portion between a slope portion and a side wall portion of the ring-shaped zones; and drawing the pattern on the second pattern-drawn field by scanning a beam so that the joint portion between the slope portion and the side wall portion is drawn at the boundary between the first pattern-drawn field and the second pattern-drawn field.
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7.发明申请Optical element producing method, base material drawings method and base material drawing apparatus 审中-公开光学元件制造方法，基材图纸方法和基材拉丝装置公开(公告)号：US20050006353A1
公开(公告)日：2005-01-13
申请号：US10901551
申请日：2004-07-28
Applicant: Kazumi Furuta , Yuichi Akanabe , Masahiro Morikawa , Osamu Masuda , Koji Horii , Tomohide Mizukoshi
Inventor： Kazumi Furuta , Yuichi Akanabe , Masahiro Morikawa , Osamu Masuda , Koji Horii , Tomohide Mizukoshi
CPC classification number: B23K15/0006 , B23K15/02
Abstract: A method of working an optical element for producing an optical element having a microscopic pattern, comprising a pattern drawing step for forming a specified pattern corresponding to said optical element on a base material including a layer of pattern drawing object, wherein said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.
Abstract translation: 一种用于制造具有微观图案的光学元件的光学元件的制造方法，包括在包括图案绘制对象的层的基材上形成与所述光学元件相对应的规定图案的图案绘制步骤，其中所述图案图形层 物体具有弯曲表面，并且通过将电子束施加到所述图案绘制对象层来绘制所述指定图案。
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8.发明申请OPTICAL ELEMENT PRODUCING METHOD, BASE MATERIAL DRAWING METHOD AND BASE MATERIAL DRAWING APPARATUS 审中-公开光学元件生产方法，基材描绘方法和基材描绘装置公开(公告)号：US20070289953A1
公开(公告)日：2007-12-20
申请号：US11609270
申请日：2006-12-11
Applicant: KAZUMI FURUTA , Yuichi Akanabe , Masahiro Morikawa , Osamu Masuda , Koji Horii , Tomohide Mizukoshi
Inventor： KAZUMI FURUTA , Yuichi Akanabe , Masahiro Morikawa , Osamu Masuda , Koji Horii , Tomohide Mizukoshi
IPC: B23K15/08
CPC classification number: B23K15/0006 , B23K15/02
Abstract: A method of working an optical element for producing an optical element having a microscopic pattern, comprising a pattern drawing step for forming a specified pattern corresponding to said optical element on a base material including a layer of pattern drawing object, wherein said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.
Abstract translation: 一种用于制造具有微观图案的光学元件的光学元件的制造方法，包括在包括图案绘制对象层的基材上形成与所述光学元件相对应的规定图案的图案绘制步骤，其中所述图案图形层 物体具有弯曲表面，并且通过将电子束施加到所述图案绘制对象层来绘制所述指定图案。
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公开(公告)号：US06989536B2
公开(公告)日：2006-01-24
申请号：US10897344
申请日：2004-07-21
Applicant: Osamu Masuda , Kazumi Furuta , Kunito Hayashi , Kazuhiko Kobayashi
Inventor： Osamu Masuda , Kazumi Furuta , Kunito Hayashi , Kazuhiko Kobayashi
IPC: H01J37/28 , H01J37/256
CPC classification number: H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/31761
Abstract: The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.
Abstract translation: 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起始点到终点距离L（S 502），并且扫描时间计算装置312基于开始计算写入写入模式所需的扫描时钟数 到端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离（S 503）。 计数转换装置605将起始点到终点距离L分离为X和Y分量，以使用扫描时钟数在等式中转换它们（S 504）。 基于该方程，可变速率计算装置314计算消光比以确定可变衰减器307处的消光比（S 505）。 ATT D / A转换器303指定衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离，使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离
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10.发明授权Base material to be coated, coating apparatus, coating method and element producing method 失效待涂布基材，涂布装置，涂布方法和元件制造方法公开(公告)号：US06916503B2
公开(公告)日：2005-07-12
申请号：US10230790
申请日：2002-08-29
Applicant: Masahiro Morikawa , Kazumi Furuta , Osamu Masuda , Akiko Kuji
Inventor： Masahiro Morikawa , Kazumi Furuta , Osamu Masuda , Akiko Kuji
CPC classification number: B05D1/005 , B05D3/0254
Abstract: A method of coating a coating liquid on a base material having a curved surface portion, includes processes of: a coating process of coating a coating liquid on a base material; and a rotating process of rotating the base material coated with the coating liquid.
Abstract translation: 一种在具有弯曲表面部分的基材上涂覆涂布液的方法，包括以下步骤：在基材上涂覆涂布液的涂布方法; 以及使涂布有涂布液的基材旋转的旋转方法。
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