Pattern drawing method by scanning beam and pattern drawing apparatus
    2.
    发明授权
    Pattern drawing method by scanning beam and pattern drawing apparatus 失效
    扫描光束和图案绘制装置的图案绘制方法

    公开(公告)号:US07053387B2

    公开(公告)日:2006-05-30

    申请号:US10639165

    申请日:2003-08-11

    IPC分类号: G21K5/10

    摘要: A pattern drawing method of drawing a desired pattern on a base material by irradiating an electronic beam and scanning the base material with the electronic beam with a predetermined dose amount, comprising: a first step of drawing a first region on the base material by scanning with the electronic beam with a first dose amount; a second step of drawing a second region on the base material by scanning with the electronic beam with a second dose amount; and a inclining step of inclining a boundary between the first region and the second region to form an inclined surface by conducting a first scanning to scan with the electronic beam with the first dose amount and a second scanning to scan with the electronic beam with the second does amount in a mixed arrangement.

    摘要翻译: 一种通过用电子束照射电子束并用电子束以预定剂量扫描基底材料来在基材上绘制所需图案的图案描绘方法,包括:第一步骤,通过扫描基底材料上的第一区域, 具有第一剂量的电子束; 第二步骤,通过用第二剂量的电子束扫描来在基材上绘制第二区域; 以及倾斜步骤,通过用电子束以第一剂量进行第一次扫描扫描以及第二次扫描,使第二区域和第二区域之间的边界倾斜以形成倾斜表面,并用第二扫描电子束扫描第二扫描 确实是混合排列的。

    LIGHT SOURCE MODULE AND VEHICULAR LAMP
    6.
    发明申请
    LIGHT SOURCE MODULE AND VEHICULAR LAMP 失效
    光源模块和车灯

    公开(公告)号:US20100188865A1

    公开(公告)日:2010-07-29

    申请号:US12691267

    申请日:2010-01-21

    IPC分类号: F21V1/00 H01J5/00 B23P11/00

    摘要: A light source module includes a substrate made with a recess portion formed on one face and an unformed portion not having the recess portion formed therein; a light emitting diode disposed on the recess portion of the substrate; a pair of power supply members disposed on the unformed portion of the substrate; and a connecting portion formed on the substrate and connecting the light emitting diode and the pair of power supply members. A part of an end edge of the recess portion conforms to a part of a side edge of the substrate.

    摘要翻译: 光源模块包括:由形成在一个面上的凹部形成的基板和不形成有凹部的未成形部; 设置在所述基板的凹部上的发光二极管; 设置在所述基板的未成形部分上的一对电源构件; 以及形成在所述基板上并连接所述发光二极管和所述一对电源构件的连接部。 凹部的端部边缘的一部分符合基板的侧边缘的一部分。

    Electron-beam writing device and electron-beam writing method
    9.
    发明授权
    Electron-beam writing device and electron-beam writing method 失效
    电子束写入装置和电子束写入方法

    公开(公告)号:US06989536B2

    公开(公告)日:2006-01-24

    申请号:US10897344

    申请日:2004-07-21

    IPC分类号: H01J37/28 H01J37/256

    摘要: The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.

    摘要翻译: 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起始点到终点距离L(S 502),并且扫描时间计算装置312基于开始计算写入写入模式所需的扫描时钟数 到端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离(S 503)。 计数转换装置605将起始点到终点距离L分离为X和Y分量,以使用扫描时钟数在等式中转换它们(S 504)。 基于该方程,可变速率计算装置314计算消光比以确定可变衰减器307处的消光比(S 505)。 ATT D / A转换器303指定衰减器307处的消光比,以减小对应于高速D / A转换器306的分辨率的单位距离,使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离