摘要:
An exposure device in which a reticle having a circuit pattern of a semiconductor device formed on it is irradiated with light beam emanated from a light source, such as a laser light source, for exposing the circuit pattern formed on the reticle on a semiconductor wafer. The exposure device includes a light beam generator for illuminating the reticle having a semiconductor circuit pattern formed on it, an image-forming optical system for forming an image on a wafer of a light image produced on radiating a light beam on the reticle from the light beam generator. The exposure device also includes a movement unit for moving the wafer relative to the image-forming optical system, and an alignment unit for detecting the position on the wafer of the image formed on the wafer by the image-forming optical system for position matching the image by the image-forming optical system relative to the wafer. The light beam generator includes a light source for excitation, a first resonator and a second resonator. The first resonator is illuminated by the light beam from the light source for excitation and outputs the light beam from the light source for excitation after waveform conversion. The second resonator is illuminated by the light beam from the first resonator and outputs the light beam from the first resonator after waveform conversion.
摘要:
A lens evaluating device for measuring the optical transfer function of the lens under evaluation for evaluating the lens. The lens evaluating device includes an exposure light source, a converging lens for converging a light beam radiated from the exposure light source at a point, a characteristics evaluating pattern onto which the light beam outputted from the converging lens is converged by the lens under evaluation to form an image on it, a detection unit for receiving a return light beam having scanned the characteristics evaluating pattern via the lens under evaluation for detecting changes in reflection intensity of the return light beam, and an analysis unit for executing frequency analysis of the detected results from the detection unit for measuring the optical transfer function. The results of detection by the detection unit are subjected to a frequency analysis using a spectrum analyzer for measuring the optical transfer function of the lens under evaluation for evaluating the lens. An exposure light source includes a first resonator and a second resonator. The first resonator has a laser medium illuminated by an excited light radiated by an exciting light source and a first non-linear optical crystal device for wavelength-converting the light beam radiated from the laser medium. The second resonator has a second non-linear optical crystal device for wavelength-converting a light beam radiated from the first resonator.
摘要:
The UV laser light outgoing from a UV laser light source 1 is modulated in intensity by a light modulator 2 in accordance with the subsidiary information so as to fall on a mirror 14 via lenses 3, 4, a phase diffraction lattice 5 and a half mirror 11. The UV laser light is then reflected by the mirror 14 and condensed by an objective lens 6 so as to be radiated on an optical disc 8. The UV laser light outgoing from the UV laser light source 1 falls on a phase diffraction lattice via a light modulator 2 and lenses 3 and 4 so as to be radiated on the optical disc 8 via the half mirror 11, mirror 14 and the objective lens 6. On the other hand, the reflected light of the visible laser light reflected by the optical disc 8 falls on the half mirror 11 via the objective lens 6 and the mirror 14 so as to be reflected by the half mirror 11 to fall on a photodetector 13 via a cylindrical lens 12. By effecting focusing control and tracking control based upon an output signal of the photodetector 13, a light spot of the UV laser may be formed at a precise position in the subsidiary information recording area for correctly recording the subsidiary information.
摘要:
A lens evaluating device for measuring the optical transfer function of the lens under evaluation for evaluating the lens. The lens evaluating device includes an exposure light source, a converging lens for converging a light beam radiated from the exposure light source at a point, a characteristics evaluating pattern onto which the light beam outputted from the converging lens is converged by the lens under evaluation to form an image on it, a detection unit for receiving a return light beam having scanned the characteristics evaluating pattern via the lens under evaluation for detecting changes in reflection intensity of the return light beam, and an analysis unit for executing frequency analysis of the detected results from the detection unit for measuring the optical transfer function. The results of detection by the detection unit are subjected to a frequency analysis using a spectrum analyzer for measuring the optical transfer function of the lens under evaluation for evaluating the lens. An exposure light source includes a first resonator and a second resonator. The first resonator has a laser medium illuminated by an excited light radiated by an exciting light source and a first non-linear optical crystal device for wavelength-converting the light beam radiated from the laser medium. The second resonator has a second non-linear optical crystal device for wavelength-converting a light beam radiated from the first resonator.
摘要:
A laser apparatus includes a master laser for emitting reference laser pulse light RPref having a wavelength of 914 nm and a pulse width of 0.5 ns; a microlens array for dividing the reference laser pulse light RPref into N pieces of light; optical fiber amplifiers 14-1 to 14-N being set to increase their length progressively in that order so as to have a propagation delay time of 0.5 ns, which is the pulse width of the divided pieces of reference laser pulse light DRPref1 to DRPrefN; a third harmonic generating unit for receiving the divided pieces of reference laser pulse light on which amplifying and delaying effects have been produced, and generating third harmonics TRD1 to TRDN having a wavelength of 305 nm and a pulse width of 0.5 ns; and an illuminating optical system for successively disposing the N third harmonics TRD1 to TRDN in parallel with each other, subjecting the N third harmonics TRD1 to TRDN to time multiplexing, and emitting the result.
摘要:
A system for correcting for positional deviations in a hand-held video camera caused by small movements or shaping of the user's hands includes an afocal optical system constituted by a positive meniscus lens and a negative meniscus lens. The positional deviations of the camera caused by minute tremors or shaking of the user's hands are detected by a pitch sensor and a roll sensor and a micro-computer is responsive to the detected amount of the positional deviations to drive the positive meniscus lens and the negative meniscus lens in vertical and horizontal directions with respect to the optical axis, thereby controlling the position of the image pickup light being radiated onto a CCD image sensor of the video camera.
摘要:
A UV image forming optical system includes a collimating lens for collimating light emitted from a UV light source, an imaging lens for forming an image of the collimated light transmitted through the collimating lens, and a beam splitting optical system positioned in an optical path of the collimated light between the collimating lens and the imaging lens. At least one of the collimated light emitted from the collimating lens and the light transmitted through the imaging lens, reflected by a reflector and transmitted again through the imaging lens is made incident upon an external viewing optical system.
摘要:
Signals are provided which allow colors in a wider color range than predetermined standards, which can be handled by apparatus according to such predetermined standards. A primary color converter converts first color signals having primary color points in a wider color range than the primary color points according to BT.709 into second color signals based on the primary colors according to BT.709. A photoelectric transducer converts the second color signals into third color signals according to photoelectric transducer characteristics defined in a numerical range wider than a range from 0 to 1.0 of color signals corresponding to a luminance signal and color difference signals according to BT.709. A color signal converter converts the third color signals into a luminance signal and color difference signals. A corrector incorporated in the color signal converter corrects the color difference signals into color difference signals.
摘要:
There is provided a lens formed from a circular bottom face (11), lateral face (14) and top face (15) and having a surface light source (13) of a finite size disposed at the center of the bottom face (11). The top face (15) is an aspheric surface rotational symmetric with respect to a z-axis and which totally reflects a part of a component, whose polar angle is smaller than a polar angle Θ0 at the intersection between the lateral face (14) and top face (15), of light emitted from the surface light source (13). The lateral face (14) is an aspheric surface rotational symmetric with respect to the z-axis and pervious to a component, whose polar angle is larger than the polar angle Θ0, and component, totally reflected at the top face (15), of the light emitted from the surface light source (13). A function r=fS(z) where z is a variable representing the lateral face (14) increases monotonously as the variable z decreases in a closed zone defined by 0≦z≦z1 (z-coordinate of an intersection between the lateral face (14) and top face (15)), and has at least one point where a absolute value |d2r/dz2| is maximum in the closed zone.
摘要:
A laser annealing device (10) includes a laser oscillator (12), radiating a pulsed laser light beam of a preset period, and an illuminating optical system (15) for illuminating a pulsed laser light beam to an amorphous silicon film (1). The illuminating optical system (15) manages control for moving a laser spot so that a plural number of light pulses will be illuminated on the same location on the amorphous silicon film (1). The laser oscillator (12) radiates a laser light beam of a pulse generation period shorter than the reference period. The reference period is a time interval as from the radiation timing of illumination of a pulsed laser light beam on the surface of the film (1) until the timing of reversion of the substrate temperature raised due to the illumination of the laser light beam to the original substrate temperature.