公开(公告)号：US08034418B2

公开(公告)日：2011-10-11

申请号：US10529904

申请日：2003-10-03

申请人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

发明人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

IPC分类号： C23C16/00

CPC分类号： C23C16/509 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

摘要： A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.

摘要翻译： 形成有多个天线元件，每个天线元件具有第一和第二线性导体，其第一端电互连。 天线元件布置在平面中，使得第一和第二线性导体以规则的间隔彼此交替和分离，从而形成设置在腔室中的一个或多个阵列天线。 第一线性导体的第二端连接到高频电源，第二线性导体的第二端连接到地。 多个基板平行地放置在阵列天线的两侧，距离线性导体之间的距离近似。 通过将成分气体引入室中形成膜。

公开(公告)号：US20050115504A1

公开(公告)日：2005-06-02

申请号：US10725905

申请日：2003-12-01

申请人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

发明人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

IPC分类号： C23C16/44 ,  C23C16/00 ,  C23C16/24 ,  C23C16/505 ,  H01L21/205 ,  H01L31/04 ,  H05H1/24

CPC分类号： H01J37/32082 ,  C23C16/24 ,  C23C16/45523 ,  C23C16/505

摘要： An apparatus for forming thin films forms a plurality of thin films in a single chamber by sequential formation of at least a first and a second thin film on a substrate by an antenna type plasma CVD method. This apparatus is provided with a residual material removal apparatus, which removes from the chamber residual materials resulting from the step for forming the first film and which affect the properties of the second film. A method and an apparatus for forming films and a solar cell removes residual material (including material gas) resulting in the step for forming the first film which have an effect on the properties of the second film. Since a plurality of films are deposited inside a single chamber, it is unnecessary to provide a plurality of chambers, thus enabling the apparatus and solar cell to be more compact and of reduced cost.

摘要翻译： 用于形成薄膜的装置通过天线型等离子体CVD方法在衬底上顺序地形成至少第一和第二薄膜而在单个室中形成多个薄膜。 该装置设置有残留材料去除装置，其从室中除去由用于形成第一膜的步骤产生的并且影响第二膜的性质的剩余材料。 用于形成薄膜和太阳能电池的方法和装置除去残留材料（包括材料气体），导致形成第一薄膜的步骤，这对第二薄膜的性能有影响。 由于多个膜沉积在单个室内，所以不需要设置多个室，因此能够使装置和太阳能电池更加紧凑并降低成本。

公开(公告)号：US20060011231A1

公开(公告)日：2006-01-19

申请号：US10529904

申请日：2003-10-03

申请人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

发明人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito

IPC分类号： H01L31/00

CPC分类号： C23C16/509 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

摘要： A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.

摘要翻译： 形成有多个天线元件，每个天线元件具有第一和第二线性导体，其第一端电互连。 天线元件布置在平面中，使得第一和第二线性导体以规则的间隔彼此交替和分离，从而形成设置在腔室中的一个或多个阵列天线。 第一线性导体的第二端连接到高频电源，第二线性导体的第二端连接到地。 多个基板平行地放置在阵列天线的两侧，距离线性导体之间的距离近似。 通过将成分气体引入室中形成膜。

公开(公告)号：US20050067934A1

公开(公告)日：2005-03-31

申请号：US10670476

申请日：2003-09-26

申请人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito ,  Yoshimi Watabe

发明人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito ,  Yoshimi Watabe

IPC分类号： H01J17/26 ,  H01J37/32 ,  H01J61/28 ,  H01L31/20 ,  H05H1/24

CPC分类号： H01L31/202 ,  H01J37/32091 ,  H01J2237/3132 ,  H01J2237/3137 ,  H01J2237/3142 ,  H05H1/46 ,  H05H2001/463 ,  Y02E10/50 ,  Y02P70/521

摘要： The object of this invention is to realize the new configuration of antenna and the electric power feeding method which substantially suppress the generation of standing wave and consequently to provide a discharge apparatus to generate plasma having an excellent uniformity, a plasma processing method for large-area substrate, and a solar cell manufactured with a high productivity. The present invention is composed of a plurality of U-shaped antenna elements having a power feeding end and a grounded end which are arranged to form an array antenna in such a way that the grounded end and the power feeding end are alternately placed in parallel at regular intervals on a plane, wherein the alternating current electric powers with the same excitation frequency are simultaneously fed to the power feeding ends with the phase shift of 180 degrees between adjacent power feeding ends, the excitation frequency of the alternating current power is 10 MHz-2 GHz, and the length of the conductor is set so that the measured ratio of reflected wave to incident wave is 0.1 or less at the power feeding end. It is also possible to determine the length La of straight conductor to hold the inequality: 0.5(1/α)

摘要翻译： 本发明的目的是实现基本上抑制驻波产生的天线的新配置和馈电方法，从而提供具有均匀性优异的等离子体的放电装置，大面积等离子体处理方法 基板和以高生产率制造的太阳能电池。 本发明由具有供电端和接地端的多个U形天线元件组成，这些U形天线元件被布置成形成阵列天线，使得接地端和馈电端交替地平行放置在 其中具有相同激励频率的交流电功率在相邻供电端之间以180度的相移同时馈送到馈电端，交流功率的激励频率为10MHz- 2GHz，并且设定导体的长度，使得测得的反射波与入射波的比例在馈电端为0.1或更小。 也可以确定直线导体的长度La以保持不等式：0.5（1 /α）

公开(公告)号：US06719876B1

公开(公告)日：2004-04-13

申请号：US09830879

申请日：2001-05-02

申请人： Masashi Ueda ,  Tomoko Takagi

发明人： Masashi Ueda ,  Tomoko Takagi

IPC分类号： H05H100

CPC分类号： H01J37/32082 ,  C23C16/509 ,  H01J37/32541

摘要： A plasma processing apparatus is of an internal electrode type, and an inductive coupling type electrode arranged facing a substrate has a shape formed by bending back a conductor at its central portion. A high frequency power is supplied to an end of the electrode so that a standing wave of half wavelength are produced at straight portions formed by bending back the electrode to make an antinode there and thus a plasma discharge is generated around the electrode. The controlled standing waves with its antinodes positively generated at the straight portions of the electrode are effectively used.

摘要翻译： 等离子体处理装置是内部电极型，并且面向基板布置的电感耦合型电极具有通过在其中心部分弯曲导体而形成的形状。 向电极的端部供给高频电力，使得通过使电极弯曲而形成的直线部分产生半波长的驻波，从而在那里形成波腹，从而在电极周围产生等离子体放电。 有效地使用在电极的直线部分积极产生其波腹的受控驻波。

公开(公告)号：US20090148624A1

公开(公告)日：2009-06-11

申请号：US12368740

申请日：2009-02-10

申请人： Tomoko TAKAGI ,  Masashi Ueda

发明人： Tomoko TAKAGI ,  Masashi Ueda

IPC分类号： B01J19/08 ,  C23C16/54

CPC分类号： H01J37/321 ,  C23C16/509 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32128 ,  H01J37/32137 ,  H01J37/32146 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32541 ,  H01J37/32559

摘要： A plasma CVD apparatus includes a an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.

摘要翻译： 等离子体CVD装置包括在反应室中的电极阵列，该电极阵列包括多个电感耦合电极，每个电极在中心折回，使得每个电极基本上为U形，具有两个平行的直线部分，电极 被布置成使得所有平行的直线部分在公共平面中彼此平行地布置，每个电极具有至少一个直径为10mm或更小的部分，以及用于馈送高频功率的相位控制电源 到馈送部分，以便在馈送部分和折回部分之间以及在接地部分和折回部分之间建立半波长的半波长或自然数倍的驻波，并被控制成具有相位 相邻两个供电部分之间的差异。

公开(公告)号：US06933009B2

公开(公告)日：2005-08-23

申请号：US10428849

申请日：2003-05-05

申请人： Masashi Ueda ,  Tomoko Takagi

发明人： Masashi Ueda ,  Tomoko Takagi

IPC分类号： H01L21/205 ,  B01J3/00 ,  B01J3/02 ,  B01J19/00 ,  C23C16/458 ,  C23C16/46 ,  C23C16/509 ,  C23C16/54 ,  H01L31/04 ,  C23C16/00

CPC分类号： C23C16/46 ,  C23C16/4587 ,  C23C16/509 ,  C23C16/54

摘要： In a thin-film deposition method, a substrate is placed in a heat chamber having a pressure equal to or higher than an atmospheric pressure, and the substrate is heated in the heat chamber by supplying gas having a temperature higher than a room temperature by forced convection. The heated substrate is transferred from the heat chamber into a deposition chamber which is a vacuum chamber connected to the heat chamber directly or indirectly with a valve interposed therebetween. Then, a thin-film deposition is carried out on the substrate in the deposition chamber at a deposition temperature higher than the room temperature.

摘要翻译： 在薄膜沉积方法中，将基板放置在等于或大于大气压力的加热室中，并且通过强制地供给具有高于室温的气体在加热室中加热基板 对流。 加热的基板从加热室转移到沉积室，该沉积室是直接或间接地连接到加热室的真空室，其间插入阀。 然后，在高于室温的沉积温度下，在沉积室中的基板上进行薄膜沉积。

公开(公告)号：US20090314349A1

公开(公告)日：2009-12-24

申请号：US12295250

申请日：2007-03-29

申请人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Itou

发明人： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Itou

IPC分类号： H01L31/036 ,  H01L29/04

CPC分类号： C23C16/24 ,  C23C16/509 ,  H01L31/1804 ,  H01L31/1824 ,  Y02E10/545 ,  Y02E10/547 ,  Y02P70/521

摘要： Object of this invention is to provide a plasma CVD method capable of forming a microcrystalline silicon film at low hydrogen gas flow rate, thereby providing a low-cost microcrystalline silicon solar cell.In the plasma CVD method forming the microcrystalline silicon film, plural antennas are arranged to form an antenna array structure in a vacuum chamber. One end of each antenna is connected to a high frequency power source and anther end is grounded. Substrates are placed facing the antenna arrays, and the substrate temperature is kept between 150 and 250° C. Plasma is generated by introducing gas mixture of hydrogen and silane to the chamber, and by introducing high frequency power to the antennas. When hydrogen/silane gas flow ratio is controlled in the range from 1 to 10, microcrystalline silicon films are formed on the substrates with the ratio Ic/Ia between 2 and 6, whereas Ic and Ia are the Raman scattering intensity at around 520 cm−1 and at around 480 cm−1, related to crystalline silicon and amorphous silicon, respectively

摘要翻译： 本发明的目的是提供能够以低氢气流速形成微晶硅膜的等离子体CVD方法，从而提供低成本的微晶硅太阳能电池。 在形成微晶硅膜的等离子体CVD法中，布置多个天线以在真空室中形成天线阵列结构。 每个天线的一端连接到高频电源，另一端接地。 衬底被放置成面向天线阵列，并且衬底温度保持在150和250℃之间。通过将氢气和硅烷的气体混合物引入腔室并通过向天线引入高频功率来产生等离子体。 当氢/硅烷气体流量比控制在1到10的范围内时，微晶硅膜以2/6的比例Ic / Ia形成在基片上，而Ic和Ia是在520cm -1处的拉曼散射强度， 1和约480cm -1，分别与晶体硅和非晶硅相关

公开(公告)号：US09165748B2

公开(公告)日：2015-10-20

申请号：US12855809

申请日：2010-08-13

申请人： Tomoko Takagi ,  Masashi Ueda

发明人： Tomoko Takagi ,  Masashi Ueda

IPC分类号： H01J37/32 ,  C23C16/509 ,  H01L21/306

CPC分类号： H01J37/321 ,  C23C16/509 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32128 ,  H01J37/32137 ,  H01J37/32146 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32541 ,  H01J37/32559

摘要： A plasma CVD method uses an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.

摘要翻译： 等离子体CVD法在反应室中使用电极阵列，电极阵列包括多个电感耦合电极，每个电极在中心折回，使得每个电极基本上为U形，具有两个平行的直线部分，电极为 被布置为使得所有平行的直线部分在公共平面中彼此平行地布置，每个电极具有至少一个直径为10mm或更小的部分，以及用于将高频功率馈送到 馈送部分，以便在馈送部分和折回部分之间以及在接地部分和折回部分之间建立半波长或自然数倍的半波长的驻波，并且被控制为具有相位差 在相邻的两个进给部分之间。

公开(公告)号：US20140205835A1

公开(公告)日：2014-07-24

申请号：US14235919

申请日：2012-09-05

申请人： Naoki Taya ,  Masashi Ueda ,  Yosuke Sato ,  Masaharu Ito

发明人： Naoki Taya ,  Masashi Ueda ,  Yosuke Sato ,  Masaharu Ito

IPC分类号： H01L21/683

CPC分类号： H01L21/6836 ,  C09J7/241 ,  C09J2201/606 ,  C09J2203/326 ,  H01L2221/68327 ,  Y10T428/2848 ,  Y10T428/2878 ,  Y10T428/31938

摘要： A base film for a dicing sheet is provided which can suppress dicing debris from generating during the dicing of a cut object without imparting physical energy, such as electron beam or γ ray. The base film for a dicing sheet comprises a resin layer. The resin layer comprises: a norbornene-based resin that is a thermoplastic resin having a norbornene-based compound as at least one type of monomer; and an olefin-based thermoplastic resin other than the norbornene-based resin. The norbornene-based resin in the resin layer has a content of more than 3.0 mass %. A dicing sheet is also provided which comprises: the base film for a dicing sheet; and a pressure-sensitive adhesive layer placed on a surface of the film at the resin layer side.

摘要翻译： 提供了一种用于切割片的基底膜，其能够在切割物体的切割期间抑制切割屑不产生物理能量，例如电子束或γ射线。 用于切割片的基膜包括树脂层。 树脂层包括：作为至少一种单体的具有降冰片烯系化合物的热塑性树脂的降冰片烯系树脂; 以及除了降冰片烯系树脂以外的烯烃类热塑性树脂。 树脂层中的降冰片烯系树脂的含量大于3.0质量％。 还提供了一种切割片，其包括：用于切割片的基膜; 以及设置在树脂层侧的膜表面上的压敏粘合剂层。