摘要:
An object of the present invention is to provide a multi-function peripheral which is easy for a user to operate. To achieve the object, according to the present invention, there is provided a peripheral connected to an information processing apparatus, which inputs and analyzes a job script constituted of packet data from the information processing apparatus, and subsequently generates an appropriate job file in accordance with the content of the job script.
摘要:
In a thin-film deposition method, a substrate is placed in a heat chamber having a pressure equal to or higher than an atmospheric pressure, and the substrate is heated in the heat chamber by supplying gas having a temperature higher than a room temperature by forced convection. The heated substrate is transferred from the heat chamber into a deposition chamber which is a vacuum chamber connected to the heat chamber directly or indirectly with a valve interposed therebetween. Then, a thin-film deposition is carried out on the substrate in the deposition chamber at a deposition temperature higher than the room temperature.
摘要:
There is provided a multi-functional peripheral which is easy for user to use. In the multi-functional peripheral, after a logical device control program retaining a function of a logical device to which the job is transmitted from an information processing apparatus and managing the job transmitted to the logical device is allowed to analyze the inputted job, a physical device control program retaining a function of a device engine of the peripheral and managing the job in the device engine is allowed to analyze the job.
摘要:
An object of the present invention is to provide a multi-function peripheral which is easy for a user to operate. To achieve the object, according to the present invention, there is provided a peripheral connected to an information processing apparatus, which inputs and analyzes a job script constituted of packet data from the information processing apparatus, and subsequently generates an appropriate job file in accordance with the content of the job script.
摘要:
The invention enables the user to designate a start mode even if the driver software, controlling the peripheral device, does not know the start mode (start timing and condition for the job processing) settable in the peripheral device, at the installation.The driver software requests, to the peripheral device, a list of the attribute values settable for the start mode, then displays the attribute values in the list to the user, and sets the attribute value, designated in the list, as the job attribute.
摘要:
An object of the present invention is to provide a multi-function peripheral which is easy for a user to operate. To achieve the object, according to the present invention, there is provided a peripheral connected to an information processing apparatus, which inputs and analyzes a job script constituted of packet data from the information processing apparatus, and subsequently generates an appropriate job file in accordance with the content of the job script.
摘要:
A plasma processing apparatus is of an internal electrode type, and an inductive coupling type electrode arranged facing a substrate has a shape formed by bending back a conductor at its central portion. A high frequency power is supplied to an end of the electrode so that a standing wave of half wavelength are produced at straight portions formed by bending back the electrode to make an antinode there and thus a plasma discharge is generated around the electrode. The controlled standing waves with its antinodes positively generated at the straight portions of the electrode are effectively used.
摘要:
There is disclosed an information processing apparatus which is handy for a user. In the information processing apparatus, a user interface of a control program for controlling a peripheral is automatically formed in accordance with a function obtained from the peripheral.
摘要:
Object of this invention is to provide a plasma CVD method capable of forming a microcrystalline silicon film at low hydrogen gas flow rate, thereby providing a low-cost microcrystalline silicon solar cell.In the plasma CVD method forming the microcrystalline silicon film, plural antennas are arranged to form an antenna array structure in a vacuum chamber. One end of each antenna is connected to a high frequency power source and anther end is grounded. Substrates are placed facing the antenna arrays, and the substrate temperature is kept between 150 and 250° C. Plasma is generated by introducing gas mixture of hydrogen and silane to the chamber, and by introducing high frequency power to the antennas. When hydrogen/silane gas flow ratio is controlled in the range from 1 to 10, microcrystalline silicon films are formed on the substrates with the ratio Ic/Ia between 2 and 6, whereas Ic and Ia are the Raman scattering intensity at around 520 cm−1 and at around 480 cm−1, related to crystalline silicon and amorphous silicon, respectively
摘要:
There is provided an information processing apparatus which is easy for a user to operate. In the information processing apparatus, it is judged based on a function obtained from a peripheral whether or not a job script can be issued to the peripheral, and a job issuance processing is controlled in accordance with a judgment result.