摘要:
A silicon substrate is used as the substrate, on which a conical projection is formed as a cathode. A gate electrode is arranged via an insulating film formed on the substrate. The gate electrode is formed so as to enclose and encircle the cathode while the pointed portion of the cathode and the surface of the gate electrode are coated with two layered coating films.
摘要:
A cathode is formed on a glass substrate by depositing nickel thereon, and silicon dioxide is allowed to accumulate on the cathode by sputtering to form an insulator film. Then, a gate electrode is provided on the insulator film by depositing nickel thereon. A hole is formed on the glass substrate by lithography to carry out patterning, and the gate electrode and the insulator film are selectively etched to create a hole for the formation of an emitter emitting electrons. Furthermore, nickel is stacked into the hole by deposition to form the emitter, and subsequently the emitter is covered with sulfur as a high vapor-pressure substance to form a high vapor-pressure substance layer.
摘要:
There is provided a magnetron comprising a cold cathode having an electron emitting member which is formed linearly or as a plane on a substrate to emit electrons a subdivided anode disposed oppositely in parallel with the electron emitting member, the subdivided anode having cavity resonators formed therein at the side of the cold cathode, and a magnet which producing a magnetic field lying at right angles to an electric field applied between the cold cathode and the subdivided anode. There is also provided a microwave oven for dielectric-heating a substance to be heated by using the magnetron as a microwave supply source.
摘要:
A thin-film transistor (1) of the present invention includes an insulating substrate (2), a gate electrode (3) which has a predetermined shape and is formed on the insulating substrate (2), a gate insulating film (4) formed on the gate electrode (3), and a semiconductor layer (5) which is polycrystalline ZnO and is formed on the gate insulating film (4). The semiconductor layer (5) is immersed in a solution in which impurities are dissolved so that the impurities are selectively added to a grain boundary part of the polycrystalline ZnO film. Subsequently, a source electrode (6) and a drain electrode (7) are formed so as to have a predetermined shape. Next, a protection layer (8) is formed on the source electrode (6) and the drain electrode (7). Thus, a thin-film transistor which has a good subthreshold characteristic and has a zinc oxide film as a base of an active layer can be realized.
摘要:
A carbon nanotube has a carbon network film of polycrystalline structure divided into crystal regions along the axis of the tube, and the length along the tube axis of each crystal region preferably ranges from 3 to 6 nm. An electron source includes a carbon nanotube having a cylindrical shape and the end of which on the substrate side is closed and disposed in a fine hole. The end on the substrate side of the tube is firmly adhered to the substrate. The carbon nanotube is produced by a method in which carbon is deposited under the condition that no metal catalyst is present in the fine hole and produced by a method in which after the carbon deposition the end of the carbon deposition film is modified by etching the carbon deposition film using a plasma. Therefore, an electron source excellent in the evenness of field emission characteristics in a field emission region (pixel) in the device plane and driven with low voltage can be provided, and a display operated with ultralow power consumption exhibiting ultrahigh luminance can be provided.
摘要:
A cold-cathode electron source having an improved utilization efficiency of an electron beam and a simple structure. The cold-cathode electron source comprises a gate electrode (4) provided on a substrate (2) through an insulating layer (3) and an emitter (6) extending through the insulating layer (3) and the gate electrode (4) and disposed in an opening of the gate. During the emission of electrons from the emitter (6), the following relationships are satisfied: 10 [V/μm]≧(Va−Vg)/(Ha−Hg)≧Vg/Hg; and Vg/Hg [V/μm]≧Va×10−4×(9.7−1.3×1n(Hg))×(1000/Ha)0.5, where Ha [μm] is an anode-emitter distance, Va [V] is an anode-emitter voltage, Hg [μm] is a gate-emitter distance, and Vg [V] is a gate-emitter voltage.
摘要:
A thin-film transistor (1) of the present invention includes an insulating substrate (2), a gate electrode (3) which has a predetermined shape and is formed on the insulating substrate (2), a gate insulating film (4) formed on the gate electrode (3), and a semiconductor layer (5) which is polycrystalline ZnO and is formed on the gate insulating film (4). The semiconductor layer (5) is immersed in a solution in which impurities are dissolved so that the impurities are selectively added to a grain boundary part of the polycrystalline ZnO film. Subsequently, a source electrode (6) and a drain electrode (7) are formed so as to have a predetermined shape. Next, a protection layer (8) is formed on the source electrode (6) and the drain electrode (7). Thus, a thin-film transistor which has a good subthreshold characteristic and has a zinc oxide film as a base of an active layer can be realized.
摘要:
Disclosed is a cold cathode electron source characterized in that a cold cathode material which can achieve electron emission in a low electric field (e.g., a carbon nanotube), necessary constituent elements are provided individually in uncalcined ceramic sheets (green sheets 21, 43, 46) and the sheets are laminated and calcined to form an integral structure. The electron source can be manufactured by forming through-holes 20 in a flat plate, charging a conductive paste 30 containing carbon nanotubes 31 dispersed therein into the through-holes 20 by vacuum suction, thereby causing to orient the carbon nanotubes 31 in the axis direction of the through-hoes 20. The electron source is useful for the low-cost manufacture of a device with a cold cathode electron source which can achieve ready vacuum evacuation and maintenance of the vacuum level, as well as a high emission current density at a low voltage.
摘要:
A liquid crystal display element (10) in accordance with the present invention includes (i) a pair of substrates (1), at least one of which is a flexible substrate, (ii) a liquid crystal (3) with which a gap between the pair of substrates (1) is filled, (iii) a spacer member (4) having a height so as to sustain a thickness of the liquid crystal (3), (iv) a sealant (2) for allowing the gap to be filled with the liquid crystal (3), and (v) a barrier (5) for causing a liquid crystal filling region to be divided into (a) a first region including a display region and (b) a second region located outside the first region. The barrier (5) is attached to one substrate (1b) of the pair of the substrates (1), and is in close contact with, but not attached to, the other substrate (1a).
摘要:
A liquid crystal display element (10) in accordance with the present invention includes: a pair of substrates (1), at least one of which is a flexible substrate; a liquid crystal layer (3) sealed in a gap between the pair of substrates (1); and spacer members (4), provided between the pair of substrates (1), which sustain the gap between the pair of substrates (1). A thickness of the liquid crystal layer (3) falls in a range of 93% to 98% of heights of the spacer members (4) while no pressure is applied to the spacer members. Adjacent spacer members (4) are provided at intervals of less than 400 μm.