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    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
    1.
    发明授权
    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 有权
    流出气流处理系统可用于半导体制造废气的氧化处理

    公开(公告)号：US07695700B2

    公开(公告)日：2010-04-13

    申请号：US11745428

    申请日：2007-05-07

    申请人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    发明人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    IPC分类号： B01D53/34 ,  B01D53/38 ,  B01D53/68

    CPC分类号： B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

    EFFLUENT GAS STREAM TREATMENT SYSTEM HAVING UTILITY FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    2.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM HAVING UTILITY FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 审中-公开
    具有用于氧化处理半导体制造流体气体的实用性气体流处理系统

    公开(公告)号：US20090010814A1

    公开(公告)日：2009-01-08

    申请号：US11838549

    申请日：2007-08-14

    申请人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    发明人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    IPC分类号： B01D53/34

    CPC分类号： B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
    3.
    发明授权
    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 失效
    流出气流处理系统可用于半导体制造废气的氧化处理

    公开(公告)号：US07214349B2

    公开(公告)日：2007-05-08

    申请号：US09970613

    申请日：2001-10-04

    申请人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    发明人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    IPC分类号： B01D50/00

    CPC分类号： B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
    4.
    发明授权
    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 有权
    流出气流处理系统可用于半导体制造废气的氧化处理

    公开(公告)号：US06333010B1

    公开(公告)日：2001-12-25

    申请号：US09400662

    申请日：1999-09-20

    申请人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    发明人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash V. Arya

    IPC分类号： B01D5334

    CPC分类号： B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。

    Weeping weir gas/liquid interface structure
    6.
    发明授权
    Weeping weir gas/liquid interface structure 失效
    堰式堰气/液界面结构

    公开(公告)号：US5833888A

    公开(公告)日：1998-11-10

    申请号：US778396

    申请日：1996-12-31

    申请人： Prakash V. Arya ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

    发明人： Prakash V. Arya ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

    IPC分类号： B01D45/00 ,  B01D53/14 ,  B01J4/00 ,  B01J4/04 ,  B01J8/00 ,  B01J8/20 ,  B01J8/22 ,  B01J19/00 ,  B01J19/26 ,  C23C16/44 ,  C30B25/14 ,  B01F3/04

    CPC分类号： C30B25/14 ,  B01D45/00 ,  B01D53/14 ,  B01J19/002 ,  B01J19/26 ,  B01J8/003 ,  B01J8/20 ,  B01J8/22 ,  C23C16/4412 ,  B01J2219/00135 ,  B01J2219/00164 ,  B01J2219/00252 ,  B01J2219/00268

    摘要： A gas/liquid interface structure for transport of a gas stream from an upstream source of same to a downstream processing unit, comprising first and second flow passage members defining an annular volume therebetween, with the second flow passage member extending downwardly to a lower elevation than the lower end of the first flow passage member, with an outer wall member enclosingly circumscribing the second flow passage member and defining therewith an enclosed interior annular volume, and with a liquid flow port in the outer wall member for introducing liquid into the enclosed interior annular volume. The second flow passage member includes an upper liquid-permeable portion in liquid flow communication with the enclosed interior annular volume, whereby liquid from such volume can "weep" through the permeable portion and form a falling liquid film on interior surface portions of the second flow passage member, as a protective liquid interface for the second flow passage member.

    摘要翻译： 一种气体/液体界面结构，用于将气流从其上游源输送到下游处理单元，包括在其间限定环形体积的第一和第二流动通道构件，其中第二流动通道构件向下延伸至低于 所述第一流动通道构件的下端具有封闭地限定所述第二流动通道构件并且限定所述第二流动通道构件的封闭内部环形容积的外壁构件，并且在所述外壁构件中具有用于将液体引入所述封闭内部环形空间中的液体流动口 卷。 第二流道构件包括与封闭的内部环形容积流体连通的上部液体可透过部分，由此来自该体积的液体可以通过可渗透部分“流失”并在第二流动的内表面部分上形成下落的液体膜 通道构件，用作第二流动通道构件的保护液界面。

    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
    8.
    发明授权
    Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 有权
    流出气流处理系统可用于半导体制造废气的氧化处理

    公开(公告)号：US06322756B1

    公开(公告)日：2001-11-27

    申请号：US09307058

    申请日：1999-05-07

    申请人： Jose I. Arno ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

    发明人： Jose I. Arno ,  Mark Holst ,  Kent Carpenter ,  Scott Lane

    IPC分类号： B01D5334

    CPC分类号： B01D53/14 ,  B01D53/50 ,  B01D53/56 ,  B01D53/62 ,  B01D53/68 ,  B01D53/70 ,  B01D2251/104 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises an oxidation unit to which an oxygen-containing gas such as ozone may be added, with input of energy (e.g., thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF3, nitrogen oxides, and sulfur oxides). The effluent gas stream treatment system may include a wet scrubber associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括氧化单元，可以加入诸如臭氧的含氧气体，输入能量（例如，热，射频，电，微波等），以实现可氧化物质的氧化 （如氯氟烃，全氟化碳），CO，NF3，氮氧化物和硫氧化物）。 废气流处理系统可以包括与含氧气体源相关联的湿式洗涤器，使得在湿式洗涤操作期间气流与含氧气体接触，以增强气流中可氧化物质的去除 治疗。

    EFFLUENT GAS STREAM TREATMENT SYSTEM HAVING UTILITY FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    9.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM HAVING UTILITY FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 有权
    具有用于氧化处理半导体制造流体气体的实用性气体流处理系统

    公开(公告)号：US20070212288A1

    公开(公告)日：2007-09-13

    申请号：US11745428

    申请日：2007-05-07

    申请人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash Arya

    发明人： Mark Holst ,  Kent Carpenter ,  Scott Lane ,  Prakash Arya

    IPC分类号： B01D53/68 ,  B01D47/00

    CPC分类号： B01D47/06 ,  B01D53/14 ,  B01D53/1456 ,  B01D53/68 ,  B01D2258/0216 ,  C23C16/4412 ,  Y02C20/30

    摘要： An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

    摘要翻译： 一种废气处理系统，用于处理来自半导体制造业务的废气等气体流出物。 废气流处理系统包括预氧化处理单元，其可以例如包括洗涤器，氧化单元如电热氧化器，以及后氧化处理单元，例如湿式或干式洗涤器。 本发明的废气流处理系统可以利用集成的氧化剂，骤冷和湿式洗涤器组件，以从废气流中减少有害或不希望的组分。 可以通过高效率的入口结构来提供处理系统中气流的气体或液体覆盖。