METHOD FOR FORMING SEMICONDUCTOR DIE AND SEMICONDUCTOR DEVICE THEREOF

    公开(公告)号:US20220005733A1

    公开(公告)日:2022-01-06

    申请号:US17231214

    申请日:2021-04-15

    摘要: A method for forming a semiconductor die, includes forming an interlayer dielectric layer on a substrate having a semiconductor die region, a seal-ring region, and a scribe line region, forming a metal pad and a test pad on the interlayer dielectric layer, forming a passivation dielectric layer on the interlayer dielectric layer, the metal pad, and the test pad, first etching the passivation dielectric layer and the interlayer dielectric layer existing between the seal-ring region and the scribe line region to a predetermined depth using a plasma etching process, second etching the passivation dielectric layer to expose the metal pad and the test pad, forming a bump on the metal pad, and dicing the substrate while removing the scribe line region by mechanical sawing.

    TEST SOCKET OF FLEXIBLE SEMICONDUCTOR CHIP PACKAGE AND BENDING TEST METHOD USING THE SAME

    公开(公告)号:US20190079114A1

    公开(公告)日:2019-03-14

    申请号:US15992543

    申请日:2018-05-30

    IPC分类号: G01R1/04

    摘要: A test socket of a flexible semiconductor chip package includes a first bending jig having a convex contour, a second bending jig having a concave contour, and a semiconductor chip package. The second bending jig is disposed to matingly engage the first bending jig. The semiconductor chip package is disposed between the first bending jig and the second bending jig, and includes a flexible tape and a semiconductor chip. The semiconductor chip is disposed on a surface of the flexible tape. Each of the first and second bending jigs has a horizontal length longer than a length of the semiconductor chip and less than a length of the flexible tape.

    METHOD OF FORMING AND PACKAGING SEMICONDUCTOR DIE

    公开(公告)号:US20200312715A1

    公开(公告)日:2020-10-01

    申请号:US16526020

    申请日:2019-07-30

    摘要: A manufacturing and packaging method for a semiconductor die is provided. The method prepares a wafer which has a seal-ring region, forms a first interlayer insulating film on the wafer, forms a metal wiring in the first interlayer insulating film, forms a second interlayer insulating film on the first interlayer insulating film, forms metal pads on the second interlayer insulating film, forms a passivation layer on the metal pads, removes a portion of the passivation layer in a region adjacent to the seal-ring region to expose the second interlayer insulating film, etches a portion of the second interlayer insulating film, forms a bump on the metal pads, removes the first interlayer insulating film and the second interlayer insulating film in the region adjacent to the seal-ring region by a laser grooving process, and dices the wafer into a first semiconductor die and a second semiconductor die.

    SEMICONDUCTOR PACKAGE WITH INNER LEAD PATTERN GROUP AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR PACKAGE

    公开(公告)号:US20200286817A1

    公开(公告)日:2020-09-10

    申请号:US16503897

    申请日:2019-07-05

    摘要: A semiconductor package includes a first metal interconnection disposed in a semiconductor chip, a first bump group configured to be connected to the first metal interconnection, a first inner lead pattern group configured to be connected to the first bump group, a second metal interconnection disposed in the semiconductor chip, a second bump group configured to be connected to the second metal interconnection; and a second inner lead pattern group configured to be connected to the second bump group, wherein a density of the first metal interconnection is greater than a density of the second metal interconnection, such that a first pitch of the first lead pattern group is greater than a second pitch of the second lead pattern group.