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公开(公告)号：US20150011095A1
公开(公告)日：2015-01-08
申请号：US13934594
申请日：2013-07-03
IPC分类号： H01L21/67
CPC分类号： C23C16/52 , C23C16/4412 , C23C16/455 , C23C16/45523 , C23C16/45525 , C23C16/45527 , C23C16/45544 , C23C16/45565 , C23C16/50 , H01L21/02274 , H01L21/0228 , H01L21/67017
摘要： A chemical deposition apparatus having conductance control, which includes a showerhead module having a faceplate and a backing plate, the showerhead module including a plurality of inlets which deliver reactor chemistries to a cavity and exhaust outlets which remove reactor chemistries, a pedestal module configured to support a substrate and which moves vertically to close the cavity between the pedestal module and an outer portion of the faceplate, and at least one conductance control assembly, which is in fluid communication with the cavity via the exhaust outlets. The at least one conductance control assembly selected from one or more of the following: a ball valve assembly, a fluidic valve, magnetically coupled rotary plates, and/or a linear based magnetic system.
摘要翻译： 一种具有电导控制的化学沉积设备，其包括具有面板和背板的喷头模块，所述喷头模块包括多个将反应器化学物质输送到空腔的入口以及排除反应器化学物质的排气出口，基座模块被配置为支撑 基板并且其垂直移动以关闭基座模块和面板的外部之间的空腔，以及至少一个电导控制组件，其经由排气出口与空腔流体连通。 所述至少一个电导控制组件选自以下中的一个或多个：球阀组件，流体阀，磁耦合旋转板和/或线性磁性系统。
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公开(公告)号：US11111581B2
公开(公告)日：2021-09-07
申请号：US16410057
申请日：2019-05-13
发明人： Chunguang Xia , Ramesh Chandrasekharan , Douglas Keil , Edward J. Augustyniak , Karl Frederick Leeser
IPC分类号： C23C16/455 , C23C16/44 , C23C16/509 , H01J37/32
摘要： A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.
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公开(公告)号：US10287683B2
公开(公告)日：2019-05-14
申请号：US15177548
申请日：2016-06-09
发明人： Chunguang Xia , Ramesh Chandrasekharan , Douglas Keil , Edward J. Augustyniak , Karl Frederick Leeser
IPC分类号： C23C16/455 , C23C16/44 , C23C16/509 , H01J37/32
摘要： A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.
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公开(公告)号：US20170009348A1
公开(公告)日：2017-01-12
申请号：US15273100
申请日：2016-09-22
IPC分类号： C23C16/52 , C23C16/50 , C23C16/455 , H01L21/02 , C23C16/44
摘要： A chemical deposition apparatus having conductance control, which includes a showerhead module having a faceplate and a backing plate, the showerhead module including a plurality of inlets which deliver reactor chemistries to a cavity and exhaust outlets which remove reactor chemistries, a pedestal module configured to support a substrate and which moves vertically to close the cavity between the pedestal module and an outer portion of the faceplate, and at least one conductance control assembly, which is in fluid communication with the cavity via the exhaust outlets. The at least one conductance control assembly selected from one or more of the following: a ball valve assembly, a fluidic valve, magnetically coupled rotary plates, and/or a linear based magnetic system.
摘要翻译： 一种具有电导控制的化学沉积设备，其包括具有面板和背板的喷头模块，所述喷头模块包括多个将反应器化学物质输送到空腔的入口以及排除反应器化学物质的排气出口，基座模块被配置为支撑 基板并且其垂直移动以关闭基座模块和面板的外部之间的空腔，以及至少一个电导控制组件，其经由排气出口与空腔流体连通。 所述至少一个电导控制组件选自以下中的一个或多个：球阀组件，流体阀，磁耦合旋转板和/或线性磁性系统。
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公开(公告)号：US09490149B2
公开(公告)日：2016-11-08
申请号：US13934594
申请日：2013-07-03
IPC分类号： H01L21/67 , H01L21/02 , C23C16/44 , C23C16/455 , C23C16/52
CPC分类号： C23C16/52 , C23C16/4412 , C23C16/455 , C23C16/45523 , C23C16/45525 , C23C16/45527 , C23C16/45544 , C23C16/45565 , C23C16/50 , H01L21/02274 , H01L21/0228 , H01L21/67017
摘要： A chemical deposition apparatus having conductance control, which includes a showerhead module having a faceplate and a backing plate, the showerhead module including a plurality of inlets which deliver reactor chemistries to a cavity and exhaust outlets which remove reactor chemistries, a pedestal module configured to support a substrate and which moves vertically to close the cavity between the pedestal module and an outer portion of the faceplate, and at least one conductance control assembly, which is in fluid communication with the cavity via the exhaust outlets. The at least one conductance control assembly selected from one or more of the following: a ball valve assembly, a fluidic valve, magnetically coupled rotary plates, and/or a linear based magnetic system.
摘要翻译： 一种具有电导控制的化学沉积设备，其包括具有面板和背板的喷头模块，所述喷头模块包括多个将反应器化学物质输送到空腔的入口以及排除反应器化学物质的排气出口，基座模块被配置为支撑 基板并且其垂直移动以关闭基座模块和面板的外部之间的空腔，以及至少一个电导控制组件，其经由排气出口与空腔流体连通。 所述至少一个电导控制组件选自以下中的一个或多个：球阀组件，流体阀，磁耦合旋转板和/或线性磁性系统。
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