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1.发明公开公开(公告)号：US20240153416A1
公开(公告)日：2024-05-09
申请号：US18411804
申请日：2024-01-12
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G01S3/787 , G02B30/27 , H04N13/351
CPC classification number: G09G3/003 , G01S3/787 , G02B30/27 , H04N13/351 , H04N13/282
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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公开(公告)号：US11215556B2
公开(公告)日：2022-01-04
申请号：US16784055
申请日：2020-02-06
Inventor： Hui Jun Park , Kyeo Reh Lee , Seung Woo Shin , Yongkeun Park
Abstract: An optical detection system includes a sample portion accommodating a sample, a wave source emitting waves to the sample portion, an optical portion provided on a path of an output wave output from the sample portion, and comprising a first spatial light modulator that modulates part of the output wave to a first wave and a second spatial light modulator that modulates part of the output wave to a second wave, a lens portion focusing the first wave and the second wave output from the optical portion, and a detection portion detecting a focused wave that is focused by the lens portion, in which the first spatial light modulator and the second spatial light modulator modulate the output wave such that the first wave and the second wave have destructive interference with respect to the sample under an already known condition.
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公开(公告)号：US20150002844A1
公开(公告)日：2015-01-01
申请号：US14137967
申请日：2013-12-20
Inventor： Yongkeun Park , Jung-Hoon Park , Yong-Hoon Cho , Chunghyun Park
IPC: G01N21/49
CPC classification number: G01N21/4788 , G01N21/45 , G01N21/49 , G01N2021/479 , G01N2201/0675 , G01Q60/18 , G01Q60/22
Abstract: An apparatus for manipulating surface near-field light resulting from light emitted from a light source that passes through a scattering layer is disclosed. Also, a method of finding a phase of incident light to cause constructive interference at a target spot using light scattering to manipulate the surface near-field.
Abstract translation: 公开了一种用于操纵从通过散射层的光源发射的光产生的表面近场光的装置。 此外，发现入射光的相位以使用光散射在目标点造成建设性干扰以操纵表面近场的方法。
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公开(公告)号：US11821834B2
公开(公告)日：2023-11-21
申请号：US17753479
申请日：2021-01-07
Inventor： Yongkeun Park , Seungwoo Shin
CPC classification number: G01N21/23 , G01B9/02 , G01N21/41 , G01N21/45 , G01N2021/1787
Abstract: A method and apparatus for measuring a 3-D refractive index tensor are presented. The method for measuring a 3-D refractive index tensor according to an embodiment comprises the steps of: controlling incident light of a plane wave with respect to at least one angle and polarization; and measuring, in a polarization-dependent manner, the 2-D diffracted light of a specimen with respect to the incident light incident at the at least one angle and polarization, wherein the birefringence value and the 3-D structure of an alignment direction of molecules in the specimen having birefringence may be measured.
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公开(公告)号：US11132935B2
公开(公告)日：2021-09-28
申请号：US16574856
申请日：2019-09-18
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
Abstract: Provided are correction pattern obtaining apparatuses and methods of obtaining a correction pattern by using the correction pattern obtaining apparatuses. The correction pattern obtaining apparatus includes a flat panel display having an optical element that receives one or more input test patterns, a detector that measures intensity of light emitted from the flat panel display corresponding to each of the one or more input test patterns and a processor that determines a correction pattern comprising one or more of the one or more test patterns at a given ratio based on the measured intensity of light corresponding to each of the one or more input test patterns.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20200273388A1
公开(公告)日：2020-08-27
申请号：US16579231
申请日：2019-09-23
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G02B27/22 , H04N13/351 , G01S3/787
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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7.发明授权公开(公告)号：US11915627B2
公开(公告)日：2024-02-27
申请号：US16579231
申请日：2019-09-23
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
IPC: G09G3/00 , G01S3/787 , H04N13/351 , G02B30/27 , H04N13/282
CPC classification number: G09G3/003 , G01S3/787 , G02B30/27 , H04N13/351 , H04N13/282
Abstract: A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.
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公开(公告)号：US20200173919A1
公开(公告)日：2020-06-04
申请号：US16784055
申请日：2020-02-06
Inventor： Hui Jun Park , Kyeo Reh Lee , Seung Woo Shin , Yongkeun Park
Abstract: An optical detection system includes a sample portion accommodating a sample, a wave source emitting waves to the sample portion, an optical portion provided on a path of an output wave output from the sample portion, and comprising a first spatial light modulator that modulates part of the output wave to a first wave and a second spatial light modulator that modulates part of the output wave to a second wave, a lens portion focusing the first wave and the second wave output from the optical portion, and a detection portion detecting a focused wave that is focused by the lens portion, in which the first spatial light modulator and the second spatial light modulator modulate the output wave such that the first wave and the second wave have destructive interference with respect to the sample under an already known condition.
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公开(公告)号：US10852246B2
公开(公告)日：2020-12-01
申请号：US16305982
申请日：2017-06-01
Inventor： Young Dug Kim , Jongchan Park , Yongkeun Park
IPC: G01N21/95 , G01N21/47 , G02B26/12 , G01N21/956 , G02B27/48
Abstract: According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.
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公开(公告)号：US20200294442A1
公开(公告)日：2020-09-17
申请号：US16574856
申请日：2019-09-18
Inventor： Wontaek Seo , Yongkeun Park , Hoon Song , Jungkwuen An , Jongchan Park
Abstract: Provided are correction pattern obtaining apparatuses and methods of obtaining a correction pattern by using the correction pattern obtaining apparatuses. The correction pattern obtaining apparatus includes a flat panel display having an optical element that receives one or more input test patterns, a detector that measures intensity of light emitted from the flat panel display corresponding to each of the one or more input test patterns and a processor that determines a correction pattern comprising one or more of the one or more test patterns at a given ratio based on the measured intensity of light corresponding to each of the one or more input test patterns.
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