SEMICONDUCTOR MEMORY DEVICE
    1.
    发明申请

    公开(公告)号:US20210280587A1

    公开(公告)日:2021-09-09

    申请号:US16992265

    申请日:2020-08-13

    摘要: According to one embodiment, a semiconductor memory device includes, on a substrate, a memory region 600 and a peripheral circuit region 500 in which an MOS transistor 100 is formed. The MOS transistor 100 includes a drain region 120 and a source region 130 disposed in a first direction parallel to a surface of the substrate. On a surface of the drain region 120, a drain electrode 121 is formed to be connected with a contact plug 122. Further, on a surface of the source region 130, a source electrode 131 is formed to be connected with a contact plug 132. When viewed in the first direction, the drain electrode 121 has a region that does not overlap with the source electrode 131, and the source electrode 131 has a region that does not overlap with the drain electrode 121.