公开(公告)号：US5600673A

公开(公告)日：1997-02-04

申请号：US566082

申请日：1995-12-01

申请人： Kimiyoshi Kimura ,  Kenichi Shiraishi ,  Souichi Shinjo

发明人： Kimiyoshi Kimura ,  Kenichi Shiraishi ,  Souichi Shinjo

IPC分类号： H04L27/18 ,  H04L27/00 ,  H04L27/22 ,  H04B3/46

CPC分类号： H04L27/2067 ,  H04L27/0012 ,  H04L27/2035

摘要： A circuit for discriminating the modulation type of a received signal capable of discriminating the modulation type at high speed. This circuit includes: a clock recovery circuit for recovering a data clock from received data; a phase difference detector for detecting a phase difference between the data clock recovered by the clock recovery circuit and the received data; a deviation calculation circuit for calculating a deviation between the phase difference detected by the phase difference detector and a deviation reference value preset in accordance with a modulation type; a squaring circuit for squaring the deviation calculated by the deviation calculation circuit; an average value calculation circuit for calculating an average value of a predetermined plurality number of consecutive ones of the square output calculated by the squaring circuit; and a comparator for comparing the average value calculated by the average value calculation circuit with a predetermined decision reference value and outputting a discrimination signal in accordance with the comparison results.

摘要翻译： 用于鉴别能够高速识别调制类型的接收信号的调制类型的电路。 该电路包括：时钟恢复电路，用于从接收的数据中恢复数据时钟; 相位差检测器，用于检测由时钟恢复电路恢复的数据时钟与接收的数据之间的相位差; 偏差计算电路，用于计算由相位差检测器检测的相位差与根据调制类型预设的偏差参考值之间的偏差; 用于对由偏差计算电路计算的偏差进行平方的平方电路; 平均值计算电路，用于计算由平方电路计算出的平方输出的预定多个连续个数的平均值; 以及比较器，用于将由平均值计算电路计算的平均值与预定的判定参考值进行比较，并根据比较结果输出鉴别信号。

公开(公告)号：US5216391A

公开(公告)日：1993-06-01

申请号：US872283

申请日：1992-04-22

申请人： Kenichi Shiraishi ,  Souichi Shinjo ,  Shunichi Tada

发明人： Kenichi Shiraishi ,  Souichi Shinjo ,  Shunichi Tada

IPC分类号： H04L27/20

CPC分类号： H04L27/2014

摘要： An MSK modulator providing a high precision digital phase adjustment with a simple circuit structure. A sample data of a sine wave or cosine wave is read from a memory at an address calculated from an initial address value. The initial address value is set in accordance with the amount of phase to be adjusted. A predetermined number of sample data read from the memory is held, outputted in a predetermined order, and converted into an analog signal. The phase of the converted analog signal is adjusted, and thereafter multiplied by an input baseband signal. The multiplied result is outputted as a modulation signal.

摘要翻译： MSK调制器采用简单的电路结构提供高精度数字相位调整。 从存储器以从初始地址值计算的地址读取正弦波或余弦波的采样数据。 初始地址值根据要调整的相位量设定。 保持从存储器读取的预定数量的采样数据，以预定顺序输出，并转换为模拟信号。 转换的模拟信号的相位被调整，然后乘以输入的基带信号。 相乘结果作为调制信号输出。

公开(公告)号：US08780327B2

公开(公告)日：2014-07-15

申请号：US13064867

申请日：2011-04-21

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。

公开(公告)号：US08384880B2

公开(公告)日：2013-02-26

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58 ,  G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US08125612B2

公开(公告)日：2012-02-28

申请号：US11603078

申请日：2006-11-22

申请人： Naoyuki Kobayashi ,  Yasushi Mizuno ,  Kenichi Shiraishi

发明人： Naoyuki Kobayashi ,  Yasushi Mizuno ,  Kenichi Shiraishi

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US07995187B2

公开(公告)日：2011-08-09

申请号：US11767425

申请日：2007-06-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/52 ,  G03B27/42

摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.

公开(公告)号：US20100134772A1

公开(公告)日：2010-06-03

申请号：US12656456

申请日：2010-01-29

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090225286A1

公开(公告)日：2009-09-10

申请号：US11630110

申请日：2005-06-21

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090153813A1

公开(公告)日：2009-06-18

申请号：US11883319

申请日：2007-01-27

申请人： Kenichi Shiraishi

发明人： Kenichi Shiraishi

IPC分类号： G03B27/52

CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70425

摘要： An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.

摘要翻译： 根据基板（P）相对于投影光学系统的移动状态确定曝光条件，使得图案图像以期望的投影状态投影在基板（P）上，并且基板（P）暴露 在确定的暴露条件下。

公开(公告)号：US20080252865A1

公开(公告)日：2008-10-16

申请号：US12155742

申请日：2008-06-09

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸渍区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染而引起的曝光精度和测量精度的劣化。