Multi-Spot Defect Inspection System
    2.
    发明申请
    Multi-Spot Defect Inspection System 有权
    多点缺陷检测系统

    公开(公告)号:US20140268118A1

    公开(公告)日:2014-09-18

    申请号:US13834662

    申请日:2013-03-15

    CPC classification number: G01N21/9501 G01N21/956

    Abstract: The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.

    Abstract translation: 本公开涉及一种用于通过基本上同时使用多个照明光束扫描样品表面上的多个点来检查纺丝样品的系统和方法。 通过至少一个检测器阵列收集从样品表面上的各个点反射,散射或辐射的照射部分。 与样品的至少一个缺陷相关联的信息由与检测器阵列通信的至少一个计算系统确定。 根据各种实施例,控制扫描间距,光斑尺寸,光点分离和旋转速率中的至少一个以补偿由于切点分离引起的俯仰误差。

    Air scattering standard for light scattering based optical instruments and tools

    公开(公告)号:US11016024B2

    公开(公告)日:2021-05-25

    申请号:US16279395

    申请日:2019-02-19

    Abstract: An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.

    Multi-spot defect inspection system
    5.
    发明授权
    Multi-spot defect inspection system 有权
    多点缺陷检测系统

    公开(公告)号:US09182358B2

    公开(公告)日:2015-11-10

    申请号:US13834662

    申请日:2013-03-15

    CPC classification number: G01N21/9501 G01N21/956

    Abstract: The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.

    Abstract translation: 本公开涉及一种用于通过基本上同时使用多个照明光束扫描样品表面上的多个点来检查纺丝样品的系统和方法。 通过至少一个检测器阵列收集从样品表面上的各个点反射,散射或辐射的照射部分。 与样品的至少一个缺陷相关联的信息由与检测器阵列通信的至少一个计算系统确定。 根据各种实施例,控制扫描间距,光斑尺寸,光点分离和旋转速率中的至少一个以补偿由于切点分离引起的俯仰误差。

    Illumination Energy Management in Surface Inspection
    6.
    发明申请
    Illumination Energy Management in Surface Inspection 有权
    表面检查照明能源管理

    公开(公告)号:US20140118729A1

    公开(公告)日:2014-05-01

    申请号:US13662626

    申请日:2012-10-29

    CPC classification number: G01N21/8806 F21V23/003 G01N21/9501 G01N2021/8835

    Abstract: The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.

    Abstract translation: 本公开涉及一种管理照射能量的系统和方法,所述照明能量施加到被扫描的晶片的照明部分,以减轻照射诱发的损伤,而不会不必要地损害检查系统的信噪比。 可以以选定的旋转频率旋转晶片,以利用检查系统扫描晶片缺陷。 照射能量可以在晶片的至少一个扫描区域上作为照射部分离晶片中心的径向距离和晶片的选定旋转频率的函数而变化。 照明能量可以进一步在晶片的一个或多个扫描区域上恒定地超过距离晶片中心的选定距离。

    Illumination energy management in surface inspection
    9.
    发明授权
    Illumination energy management in surface inspection 有权
    表面检查中的照明能量管理

    公开(公告)号:US08786850B2

    公开(公告)日:2014-07-22

    申请号:US13662626

    申请日:2012-10-29

    CPC classification number: G01N21/8806 F21V23/003 G01N21/9501 G01N2021/8835

    Abstract: The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.

    Abstract translation: 本公开涉及一种管理照射能量的系统和方法,所述照明能量施加到被扫描的晶片的照明部分,以减轻照射诱发的损伤,而不会不必要地损害检查系统的信噪比。 可以以选定的旋转频率旋转晶片,以利用检查系统扫描晶片缺陷。 照射能量可以在晶片的至少一个扫描区域上作为照射部分离晶片中心的径向距离和晶片的选定旋转频率的函数而变化。 照明能量可以进一步在晶片的一个或多个扫描区域上恒定地超过距离晶片中心的选定距离。

    Air Scattering Standard for Light Scattering Based Optical Instruments and Tools

    公开(公告)号:US20200264099A1

    公开(公告)日:2020-08-20

    申请号:US16279395

    申请日:2019-02-19

    Abstract: An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.

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