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公开(公告)号：US20180038803A1
公开(公告)日：2018-02-08
申请号：US15230330
申请日：2016-08-05
Applicant: KLA-Tencor Corporation
Inventor： Steve (Yifeng) Cui , Chunsheng Huang , Chunhai Wang , Christian Wolters , Bret Whiteside , Anatoly G. Romanovsky , Chuanyong Huang , Donald Warren Pettibone
CPC classification number: G01N21/9501 , G01N21/956
Abstract: Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced.
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公开(公告)号：US09726615B2
公开(公告)日：2017-08-08
申请号：US14804296
申请日：2015-07-20
Applicant: KLA-Tencor Corporation
Inventor： Chuanyong Huang , Qing Li , Donald Pettibone , Buzz Graves
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/8825
Abstract: An inspection apparatus for simultaneous dark field (DF) and differential interference contrast (DIC) inspection includes an illumination source and a sample stage configured to secure a sample. The inspection apparatus includes a first sensor, a second sensor and an optical sub-system. The optical sub-system includes an objective, one or more optical elements arranged to direct, through the objective, illumination from the one or more illumination sources to a surface of the sample. The objective is configured to collect a signal from the surface of the sample, wherein the collected signal includes a scattering-based signal and/or a phase-based signal from the sample. The inspection apparatus includes one or more separation optical elements arranged to spatially separate the collected signal into a DF signal and a DIC signal by directing the DF signal and the DIC signal along a DF path and DIC path respectively.
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公开(公告)号：US10324045B2
公开(公告)日：2019-06-18
申请号：US15230330
申请日：2016-08-05
Applicant: KLA-Tencor Corporation
Inventor： Steve (Yifeng) Cui , Chunsheng Huang , Chunhai Wang , Christian Wolters , Bret Whiteside , Anatoly G. Romanovsky , Chuanyong Huang , Donald Warren Pettibone
IPC: G01N21/88 , G01N21/00 , G01N21/95 , G01N21/956
Abstract: Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced.
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Patent Agency Ranking
公开(公告)号：US20190137411A1
公开(公告)日：2019-05-09
申请号：US15828938
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
Abstract: Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.
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公开(公告)号：US10739276B2
公开(公告)日：2020-08-11
申请号：US15828938
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
Abstract: Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.
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公开(公告)号：US10088345B1
公开(公告)日：2018-10-02
申请号：US13693769
申请日：2012-12-04
Applicant: KLA-Tencor Corporation
Inventor： Chuanyong Huang , Raymond Chu , Gordana Neskovic , Dieter Wilk , Christian Wolters , Tim Mahatdejkul
Abstract: The present disclosure is directed to a method for designing an aperture in a mask for inspecting a wafer. The method includes the steps of scanning a collection plane of the wafer at a plurality of points and collecting data for at least a part of the wafer. The method also includes the step of mapping the data. A further step of the method includes configuring the aperture based on the mapped data.
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公开(公告)号：US09970873B1
公开(公告)日：2018-05-15
申请号：US14939959
申请日：2015-11-12
Applicant: KLA-Tencor Corporation
Inventor： Donald Pettibone , Chuanyong Huang , Kurt Haller
CPC classification number: G01N21/643 , G01N21/9501 , G01N2021/6439
Abstract: A luminescent tag based defect detection system comprises a luminescent tag attachment assembly, an illumination source, one or more detectors, and a set of optical elements. The luminescent tag attachment assembly exposes a sample to one or more luminescent tag materials selectively attached to one or more defects on the sample. The illumination source generates illumination including one or more wavelengths corresponding to the one or more absorption spectra associated with the one or more luminescent tags. At least a portion of the set of optical elements directs illumination from the illumination source to the sample, and at least a portion of the set of optical elements directs illumination emitted from the one or more luminescent tag materials to the one or more detectors. A luminescent tag based defect detection system may also include a luminescent tag removal assembly to remove the luminescent tags after detection.
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8.发明申请公开(公告)号：US20160025645A1
公开(公告)日：2016-01-28
申请号：US14804296
申请日：2015-07-20
Applicant: KLA-Tencor Corporation
Inventor： Chuanyong Huang , Qing Li , Donald Pettibone , Buzz Graves
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/8825
Abstract: An inspection apparatus for simultaneous dark field (DF) and differential interference contrast (DIC) inspection includes an illumination source and a sample stage configured to secure a sample. The inspection apparatus includes a first sensor, a second sensor and an optical sub-system. The optical sub-system includes an objective, one or more optical elements arranged to direct, through the objective, illumination from the one or more illumination sources to a surface of the sample. The objective is configured to collect a signal from the surface of the sample, wherein the collected signal includes a scattering-based signal and/or a phase-based signal from the sample. The inspection apparatus includes one or more separation optical elements arranged to spatially separate the collected signal into a DF signal and a DIC signal by directing the DF signal and the DIC signal along a DF path and DIC path respectively.
Abstract translation: 用于同时暗场（DF）和差分干涉对比（DIC）检查的检查装置包括照明源和被配置为固定样品的样品台。 检查装置包括第一传感器，第二传感器和光子系统。 光学子系统包括物镜，一个或多个光学元件，被布置成通过物镜引导从一个或多个照明源到样品表面的照明。 该目的被配置为从样品的表面收集信号，其中所收集的信号包括来自样品的基于散射的信号和/或基于相位的信号。 检查装置包括一个或多个分离光学元件，其被布置为通过分别沿DF路径和DIC路径引导DF信号和DIC信号来将收集的信号空间分离成DF信号和DIC信号。
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